×

Vapor-phase film growth apparatus and gas ejection head

  • US 6,132,512 A
  • Filed: 01/08/1998
  • Issued: 10/17/2000
  • Est. Priority Date: 01/08/1997
  • Status: Expired due to Fees
First Claim
Patent Images

1. A gas ejection head comprising:

  • a planar nozzle head body including a plurality of nozzle orifices, at least one of said nozzle orifices having a minimum cross-sectional area Fc (m2) satisfying the following expression;

    
    
    space="preserve" listing-type="equation">F.sub.c ≦

    m.sub.c /[{2/(k+1)}.sup.1/(k-1) {k/(k+1)}.sup.1/2 {2(p.sub.1 /v.sub.1)}.sup.1/2 ]wherein;

    mc =the mass flow (kg/s) per orifice;

    k the ratio of specific heats (a constant dependant on the gas);

    p1 =the pressure (Pa) of the gas at the gas inlet side of the orifice; and

    v1 =the specific volume (m3 /kg) of the gas at the gas inlet side of the nozzle orifice.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×