Method and apparatus for monitoring plasma processing operations
First Claim
1. A plasma processing system, comprising:
- a processing chamber comprising a window, wherein said window comprises an inner surface which is exposed to a plasma process conducted within said chamber and an outer surface which is isolated from said plasma process;
a plasma generator in said processing chamber, wherein said plasma process may be run in said processing chamber when said plasma generator is activated;
a first spectrometer assembly disposed outside of said processing chamber;
a first fiber optic cable assembly operatively interconnecting said first spectrometer assembly and said window;
a calibration light source disposed outside of said processing chamber and comprising a calibration light;
a second fiber optic cable assembly operatively interconnecting said calibration light source and said window; and
a comparator operatively interconnected with said first spectrometer assembly, wherein a first input to said comparator is data relating said calibration light sent to said window by said calibration light source through said second fiber optic cable assembly and wherein a second input to said comparator is data relating to a first portion of said calibration light reflected by said inner surface of said window and provided to said first spectrometer assembly through said first fiber optic cable assembly.
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Accused Products
Abstract
The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.
47 Citations
50 Claims
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1. A plasma processing system, comprising:
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a processing chamber comprising a window, wherein said window comprises an inner surface which is exposed to a plasma process conducted within said chamber and an outer surface which is isolated from said plasma process; a plasma generator in said processing chamber, wherein said plasma process may be run in said processing chamber when said plasma generator is activated; a first spectrometer assembly disposed outside of said processing chamber; a first fiber optic cable assembly operatively interconnecting said first spectrometer assembly and said window; a calibration light source disposed outside of said processing chamber and comprising a calibration light; a second fiber optic cable assembly operatively interconnecting said calibration light source and said window; and a comparator operatively interconnected with said first spectrometer assembly, wherein a first input to said comparator is data relating said calibration light sent to said window by said calibration light source through said second fiber optic cable assembly and wherein a second input to said comparator is data relating to a first portion of said calibration light reflected by said inner surface of said window and provided to said first spectrometer assembly through said first fiber optic cable assembly. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A plasma processing system, comprising:
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a processing chamber comprising a window, wherein said window comprises an inner surface which is exposed to a plasma process conducted within said chamber and an outer surface which is isolated from said plasma process; a plasma generator in said processing chamber, wherein said plasma process may be run in said processing chamber when said plasma generator is activated; a first spectrometer assembly disposed outside of said processing chamber; a first fiber optic cable assembly operatively interconnecting said first spectrometer assembly and said window; a calibration light source disposed outside of said processing chamber and comprising a calibration light; and a second fiber optic cable operatively interconnecting said calibration light source and said window, wherein said inner and outer surfaces of said window on said processing chamber are disposed other than in parallel relation to reduce interference between portions of said calibration light reflected by said inner and outer surfaces, respectively. - View Dependent Claims (20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36)
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37. A plasma processing system, comprising:
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a processing chamber comprising a window, wherein said window comprises an inner surface which is exposed to a plasma process conducted within said chamber and an outer surface which is isolated from said plasma process; means for generating a plasma within said processing chamber to conduct said plasma process within said processing chamber; means for obtaining optical emissions of said plasma within said chamber which are emitted through said window during said plasma process; means for evaluating said plasma process through output from said means for obtaining; and a calibration assembly operatively interconnected with said means for evaluating, wherein said calibration assembly comprises; means for directing a calibration light to said window; means for comparing a portion of said calibration light reflected by said window with said calibration light from said means for directing; and means for limiting said portion of said calibration light used by said means for comparing to a portion of said calibration light from said means for directing which is reflected by said inner surface of said window. - View Dependent Claims (38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50)
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Specification