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Method and apparatus for monitoring plasma processing operations

  • US 6,134,005 A
  • Filed: 04/23/1998
  • Issued: 10/17/2000
  • Est. Priority Date: 04/23/1998
  • Status: Expired due to Fees
First Claim
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1. A plasma processing system, comprising:

  • a processing chamber comprising a window, wherein said window comprises an inner surface which is exposed to a plasma process conducted within said chamber and an outer surface which is isolated from said plasma process;

    a plasma generator in said processing chamber, wherein said plasma process may be run in said processing chamber when said plasma generator is activated;

    a first spectrometer assembly disposed outside of said processing chamber;

    a first fiber optic cable assembly operatively interconnecting said first spectrometer assembly and said window;

    a calibration light source disposed outside of said processing chamber and comprising a calibration light;

    a second fiber optic cable assembly operatively interconnecting said calibration light source and said window; and

    a comparator operatively interconnected with said first spectrometer assembly, wherein a first input to said comparator is data relating said calibration light sent to said window by said calibration light source through said second fiber optic cable assembly and wherein a second input to said comparator is data relating to a first portion of said calibration light reflected by said inner surface of said window and provided to said first spectrometer assembly through said first fiber optic cable assembly.

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