Optical measurement system using polarized light

• US 6,134,011 A
• Filed: 09/15/1998
• Issued: 10/17/2000
• Est. Priority Date: 09/22/1997
• Status: Expired due to Term

• Current Assignee: HDI Instrumentation, Inc.
• Original Assignee: HDI Instrumentation, Inc.
• Inventors: Klein, David L., Vurens, Gerard H.
• Primary Examiner(s): Pham, Hoa Q.
• Application Number:
  US09/153,646
• Time in Patent Office: 763 Days
• Field of Search: 356/364-369, 356/381, 356/382, 356/236, 250/225
• US Class Current: 356/369
• CPC Class Codes: G01J 4/04 Polarimeters using electric detection means G01J4/02 takes precedence
• CPC Class Codes: G01N 21/211 Ellipsometry optical thickness measurement G01B11/06

Abstract

An optical measurement system for evaluating the surface of a substrate or the thickness and optical characteristics of a thin film layer overlying the substrate includes an intensity stabilized light source configured to generate a stabilized light beam, a polarizing element for polarizing the light beam emanating from the light source, and a detection system for measuring the light reflected from the substrate The measurement system includes a polarizing beam-splitter for splitting the light reflected from the substrate into s-polarized light and p-polarized light. The measurement system further includes two optical sensors for separately measuring the amplitude of the s-polarized light and the intensity of the p-polarized light and a third detector for measuring either the phase difference between the s-polarized light and the p-polarized light or the reflection angle of the light reflected from the substrate. A control system analyzes the measured amplitude of the s-polarized light and the p-polarized and either the phase-difference or the reflection angle to determine changes in the topography of substrate or changes in the thickness or optical characteristics of the thin film layer.

Claims

1. An optical measurement system for evaluating a substrate, the system comprising:

an intensity stabilized light source configured to generate a stabilized light beam,

a polarizing element for polarizing the light beam emanating from the light source to provide a polarized light beam,

an optical system for directing the polarized light beam to a particular location on the substrate,

a controllable translatable assembly for moving the polarized light beam across at least a portion of the substrate such that the polarized light beam impinges upon multiple locations on the substrate,

a position indicating means for determining the particular location on the substrate upon which the polarized light beam impinges,

a detection system configured to evaluate light reflected from the particular locations on the substrate upon which the polarized light beam impinges, the detection system including

a polarization analyzing element for separating the light from the particular locations on the substrate into s-polarized light and p-polarized light,

a first optical sensor measuring amplitude of the s-polarized light,

a second optical sensor measuring amplitude of the p-polarized light, and

a third optical sensor measuring reflection angle of the reflected light relative to the substrate, and

a control system for compiling a data set correlating the measured amplitude of the s-polarized light, the p-polarized light, and the measured reflection angle with the particular location on the substrate upon which the polarized light beam impinges for determining changes in the substrate.

2. The optical measurement system of claim 1, wherein a light source feedback system controls and stabilizes the intensity of the light beam.

3. The optical measurement system of claim 2, wherein the light source feedback system includes

a photo-diode for measuring the intensity of the light beam and generating an output signal based on the measured intensity, and

a light source controller coupled to the light source and the photo-diode, the light source controller controlling and stabilizing the light beam based on the output signal received from the photo-diode.

4. The optical measurement system of claim 1, further comprising a non-polarizing beam splitter for directing a portion of the light beam to the photo-diode.

5. The optical measurement system of claim 1, further comprising a system for measuring scattered light reflected from the substrate.

6. The optical measurement system of claim, 5, wherein the system for collecting and measuring scattered light includes an integrating sphere.

7. The optical measurement system of claim 1, wherein the detection system further includes a non-polarizing beam splitter directing a portion of the reflected light beam to the third optical sensor.

8. The optical measurement system of claim 1, wherein the third optical sensor is a quadrant photo-detector.

9. The optical measurement system of claim 1, wherein the detection system further includes a fourth optical sensor measuring phase difference between the s-polarized light and the p-polarized light.

10. The optical measurement system of claim 1, wherein the polarization analyzing element is a polarizing beam-splitter.

11. The optical measurement of claim 1, further comprising a light source monitoring system for monitoring the intensity of the light beam.

12. A method of evaluating a substrate comprising the steps of generating an intensity stabilized light beam;

polarizing the light beam to form a polarized light beam,

directing the polarized light beam to a particular location on the substrate,

separating the polarized light beam after reflection from the particular location on the substrate into two orthogonally polarized light beams,

measuring the amplitude of each of the orthogonally polarized light beams,

measuring the reflection angle of the reflected light relative to the substrate, and

analyzing the measured amplitude of each of the two orthogonally polarized light beams and the measured reflection angle of reflected light beam to determine changes in the substrate.

13. The method of claim 12, further comprising the steps of

monitoring the intensity of the light beam, and

controlling and stabilizing the intensity of the light beam based on the monitored light intensity.

14. The method of claim 12, further comprising the step of measuring scattered light reflected from the substrate and wherein the step of analyzing includes analyzing the measured scattered light to determine changes in the substrate.

15. The method of claim 12, further comprising the step of measuring the phase difference between the two orthogonally polarized light beams and wherein the step of analyzing includes analyzing the measured phase difference to determine changes in the substrate.