Electrostatic chuck
First Claim
1. An electrostatic chuck for attracting an object to be treated, comprising:
- a substrate;
an insulating dielectric single layer comprising a ceramic material with a porosity level of not more than 3%; and
at least one electrode being formed on and in contact with a top surface of said substrate and the insulating dielectric single layer being formed on and in contact with a top surface of said at least one electrode;
whereinsaid object is attracted onto said at least one electrode via the insulating dielectric layer;
said insulating dielectric single layer having an average thickness of 1 to 3 mm; and
said insulating dielectric layer is a ceramic material selected from the group consisting of silicon nitride, aluminum nitride, boron nitride, sialon, silicon carbide and alumina-silicon nitride material, said electrostatic chuck having a leaked current value of 0.0017 to 0.0100 mA/cm2.
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Accused Products
Abstract
An electrostatic chuck for attracting an object for treatment. The electrostatic chuck includes a substrate, an insulating dielectric layer and at least one electrode located between the substrate and the insulating dielectric layer. The object is attracted onto the electrode via the insulating dielectric layer. The insulating dielectric layer is between 0.5 mm and 5.0 mm thick, and utilizes a gas-introducing hole to form a gas-diffusing depression on the side of an attractive surface, allowing for more uniform heat conduction. The gas-diffusing depression is between 100 um and 5.0 mm deep. The distance between the bottom surface of the gas-diffusing depression and an electrode may range from 500 μm to 5 mm.
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Citations
12 Claims
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1. An electrostatic chuck for attracting an object to be treated, comprising:
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a substrate; an insulating dielectric single layer comprising a ceramic material with a porosity level of not more than 3%; and at least one electrode being formed on and in contact with a top surface of said substrate and the insulating dielectric single layer being formed on and in contact with a top surface of said at least one electrode;
whereinsaid object is attracted onto said at least one electrode via the insulating dielectric layer; said insulating dielectric single layer having an average thickness of 1 to 3 mm; and said insulating dielectric layer is a ceramic material selected from the group consisting of silicon nitride, aluminum nitride, boron nitride, sialon, silicon carbide and alumina-silicon nitride material, said electrostatic chuck having a leaked current value of 0.0017 to 0.0100 mA/cm2. - View Dependent Claims (2, 3, 4)
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5. An electrostatic chuck for attracting an object to be treated, comprising:
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a substrate, an insulating dielectric single layer having an average thickness of 1 to 3 mm, and at least one electrode provided on and in contact with a top surface of said substrate, and the insulating dielectric layer being provided on and in contact with a top surface of said at least one electrode, wherein said object to be treated is attracted onto said at least one electrode via the insulating dielectric single layer, a gas-introducing hole being provided at least in said insulating dielectric single layer while being opened to an attracting surface of said insulating dielectric single layer, further including at least one gas-diffusing depression being formed in said insulating dielectric single layer on a side of the attracting surface, and a depth of the gas-diffusing depression is not less than 100 μ
m and not more than 5.0 mm, said electrostatic chuck having a leaked current value of 0.0017 to 0.0100 mA/cm2. - View Dependent Claims (6, 7, 8, 9, 10, 11, 12)
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Specification