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Electrostatic chuck

  • US 6,134,096 A
  • Filed: 05/18/1999
  • Issued: 10/17/2000
  • Est. Priority Date: 09/06/1995
  • Status: Expired due to Term
First Claim
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1. An electrostatic chuck for attracting an object to be treated, comprising:

  • a substrate;

    an insulating dielectric single layer comprising a ceramic material with a porosity level of not more than 3%; and

    at least one electrode being formed on and in contact with a top surface of said substrate and the insulating dielectric single layer being formed on and in contact with a top surface of said at least one electrode;

    whereinsaid object is attracted onto said at least one electrode via the insulating dielectric layer;

    said insulating dielectric single layer having an average thickness of 1 to 3 mm; and

    said insulating dielectric layer is a ceramic material selected from the group consisting of silicon nitride, aluminum nitride, boron nitride, sialon, silicon carbide and alumina-silicon nitride material, said electrostatic chuck having a leaked current value of 0.0017 to 0.0100 mA/cm2.

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