Method for measuring electromigration-induced resistance changes

• US 6,136,619 A
• Filed: 10/02/1998
• Issued: 10/24/2000
• Est. Priority Date: 10/03/1997
• Status: Expired due to Fees

• Current Assignee: Interuniversitair Micro-Electronica Centrum VZW (IMEC International)
• Original Assignee: Interuniversitair Micro-Electronica Centrum VZW (IMEC International)
• Inventors: Olmen, Jan Van, Goldoni, Alessandro, Schepper, Luc De, Ceuninck, Ward De
• Primary Examiner(s): Nelms, David
• Assistant Examiner(s): Wilson, Christian D.
• Application Number:
  US09/165,486
• Time in Patent Office: 753 Days
• Field of Search: 438/14, 438/17, 438/18, 438/468, 324/522, 324/523, 324/525
• US Class Current: 438/18
• CPC Class Codes: G01R 31/2858 Measuring of material aspects, e.g. electro-migration [EM], hot carrier injection

Abstract

A method for measuring resistance changes is described to study electromigration induced failures in conductive patterns. This method can provide a basis for lifetime predictions based on low value failure criteria, i.e. small resistance changes in the conductive patterns in a limited period of time. Two essentially identical so-called test and reference structures are placed close to each other on the same substrate and submitted to at least one sequence of a stress period and a measurement period. During a stress period, a DC current with a high current density is applied to the test structure thereby enhancing electromigration, while substantially simultaneous an AC current is applied to the reference structure leading to the same amount of power dissipation in said reference structure as the amount of power dissipation in said test structure, introduced by said DC stress current. The method of the present invention makes it possible to distinguish in a very accurate way between resistance changes induced by electromigration and resistance changes induced by other disturbances.

Claims

1. A method for determining resistance changes induced by electromigration in a conductive pattern, comprising at least one sequence of the steps of:

applying substantially simultaneous a first unidirectional current to a first conductive pattern and a second alternating symmetric current to a second conductive pattern, said first and said second conductive pattern being essentially identical and placed on the same substrate, said first current and said second current thereby leading to substantially the same amount of power dissipation in said first conductive structure and said second conductive structure respectively;

measuring the resistance changes of said first conductive pattern and said second conductive pattern by applying substantially simultaneous a third alternating current to said first conductive pattern and a fourth alternating current to said second conductive pattern, said third current and said fourth current thereby leading to substantially the same amount of power dissipation in said first conductive structure and said second conductive structure respectively.

2. A method as recited in claim 1 wherein said first current and said third current lead to substantially the same amount of power dissipation in said first conductive structure.

3. A method as recited in claim 1 wherein the average current of said second and said third and said fourth current is zero.

4. A method as recited in claim 1 wherein said first and said second conductive pattern have the same dimensions, the same layout, the same intrinsic resistance and are composed of the same materials.

5. A method as recited in claim 1 wherein said substrate is either one of a slice of an insulating material or at least a part of a semiconductor wafer being covered with an insulating layer.

6. A method as recited in claim 1 wherein said conductive pattern is a single conductive stripe comprising at least one conductive layer.

7. A method as recited in claim 6 wherein said conductive layer is selected from the group of aluminum, copper, gold, an aluminum alloy, a copper alloy.

8. A method as recited in claim 1 wherein said first, said second, said third and said fourth current are originating from one DC current generated out of a single DC current source.

9. A method as recited in claim 8 wherein said one DC current, being generated by a single DC source, is applied to a first and a second MOSFET switch, said first MOSFET switch comprising four essentially identical MOSFET'"'"'s and said first conductive pattern, said second MOSFET switch comprising four essentially identical MOSFET'"'"'s and said second conductive pattern, said first MOSFET switch and said second MOSFET switch being connected in series and further comprising means for controlling said switches.

10. A method as recited in claim 9 wherein said MOSFET'"'"'s have the same dimensions and are characterised by the same electrical parameters.