System and method for analyzing topological features on a surface

• US 6,137,570 A
• Filed: 06/30/1998
• Issued: 10/24/2000
• Est. Priority Date: 06/30/1998
• Status: Expired due to Term

• Current Assignee: KLA-Tencor Corporation
• Original Assignee: KLA-Tencor Corporation
• Inventors: Brown, David L., Chuang, Yung-Ho, Armstrong, J. Joseph, Lin, Jason Z., Tsai, Bin-Ming Benjamin
• Primary Examiner(s): Font, Frank G.
• Assistant Examiner(s): Punnoose, Roy M.
• Application Number:
  US09/107,391
• Time in Patent Office: 847 Days
• Field of Search: 356/237.1, 356/237.2, 356/237.5, 356/237.3, 356/237.4, 250/559.04
• US Class Current: 356/237.5
• CPC Class Codes: G01N 21/4788 Diffraction for sizing particles G01N15/0205
• CPC Class Codes: G01N 21/9501 Semiconductor wafers manufacturing processes per se of semiconductor devices implementing a measuring step H01L22/10
• CPC Class Codes: G01N 21/95607 using a comparative method
• CPC Class Codes: G01N 21/95623 using a spatial filtering method per se G02B
• CPC Class Codes: G01N 21/95692 Patterns showing hole parts, e.g. honeycomb filtering structures
• CPC Class Codes: G03F 7/7065 Defects, e.g. optical inspection of patterned layer for defects

Abstract

Disclosed is a method and apparatus for using far field scattered and diffracted light to determine whether a collection of topological features on a surface (e.g., a semiconductor wafer) conforms to an expected condition or quality. This determination is made by comparing the far field diffraction pattern of a surface under consideration with a corresponding diffraction pattern (a "baseline"). If the baseline diffraction pattern and far field diffraction pattern varies by more than a prescribed amount or in characteristic ways, it is inferred that the surface features are defective. The method may be implemented as a die-to-die comparison of far field diffraction patterns of two dies on a semiconductor wafer. The portion of the far field scattered and diffracted light sensitive to a relevant condition or quality can also be reimaged to obtain an improved signal-to-noise ratio.

Claims

1. A method for analyzing the condition of a surface of an electronic device, the surface having a defined pattern, the method comprising:

(a) illuminating a first region of the surface such that light is scattered and diffracted off of features of the surface;

(b) detecting light scattered and diffracted from the first region surface;

(c) comparing the diffracted light detected to a baseline diffraction pattern of light diffracted from a baseline region having a condition corresponding to an expected condition of the first region; and

(d) determining whether the detected light diffracted from the first region significantly deviates from the baseline diffraction pattern.

2. The method of claim 1, wherein the light diffracted from the first region of the surface forms a far field diffraction pattern that is detected.

3. The method of claim 1, wherein the light diffracted from the first region of the surface forms a far field diffraction pattern of which only a single point of light is imaged.

4. The method of claim 1, wherein the illuminating is performed using a monochromatic coherent light source.

5. The method of claim 4, wherein the monochromatic coherent light source is a laser.

6. The method of claim 1, wherein the surface is a semiconductor wafer surface, the first region is a first die or zone on the semiconductor wafer, and the second region is a second die or zone on the semiconductor wafer.

7. The method of claim 1, wherein the baseline diffraction pattern is diffraction data taken from a surface having the expected condition of the first region.

8. The method of claim 1, further comprising selecting the baseline image from a database of images, the database of images comprising diffraction patterns of regions which vary from a nominal image for the first region.

9. The method of claim 1, further comprising:

filtering or polarizing far field light before detecting light diffracted from the first region of the surface.

24. The apparatus of claim 1, further comprising a Fourier filter oriented to block one or more regions of the diffraction pattern from the substrate surface.

25. The apparatus of claim 1, further comprising optics comprising a microscope for providing views of the substrate surface.

26. The apparatus of claim 1, wherein the apparatus is configured to image only a portion of the diffracted light, which portion is sensitive to a particular surface condition.

10. A method for inspecting a plurality of openings in a film on a substrate, comprising:

illuminating a first portion of said openings;

detecting far field diffracted light produced by said illumination of said first portion;

illuminating a second portion of said openings, said second portion of said openings having a pattern which is substantially identical to said first portion;

detecting far field diffracted light produced by said illumination of said second portion; and

comparing signals detected from illumination of said first portion with signals detected from illumination of said second portion, thereby determining whether variations exist in said openings.

11. The method of claim 10, wherein the film is a dielectric layer on a semiconductor wafer.

12. The method of claim 11, wherein the openings are vias or contact holes in the dielectric layer.

13. The method of claim 10, wherein the first portion is a first die on a semiconductor wafer and wherein the second portion is a second die on the semiconductor wafer.

14. The method of claim 10, wherein detecting far field diffracted light produced by the illumination of the first portion or the second portion comprises detecting the diffracted light proximate a Fourier plane.

15. The method of claim 10, wherein detecting far field diffracted light produced by the illumination of the first portion or the second portion comprises detecting multiple orders of diffracted illumination.

16. An apparatus for evaluating the condition of topological features on a substrate surface, the apparatus comprising:

a light source arranged to direct light onto the substrate surface such that the light is diffracted by the substrate surface;

a sensor configured to capture and transmit a diffraction pattern of the light diffracted by the substrate surface; and

a computer configured to compare the diffraction pattern from the substrate surface with a baseline diffraction pattern of light diffracted from a baseline surface having a condition corresponding to an expected condition of the substrate surface.

17. The apparatus of claim 16, further comprising optics aligned to capture light diffracted from the substrate surface and direct it onto the sensor.

18. The apparatus of claim 16, further comprising:

a memory device for storing the baseline diffraction pattern, the memory device being coupled to the computer or being a component of the computer.

19. The apparatus of claim 18, wherein the memory device is a database storing a plurality of baseline diffraction patterns for multiple expected conditions of the substrate surface.

20. The apparatus of claim 16, wherein the light source is a coherent light source.

21. The apparatus of claim 20, wherein the light source is a laser.

22. The apparatus of claim 16, wherein the sensor is a camera.

23. The apparatus of claim 16, wherein the sensor is a charge coupled device or a photodiode array.

27. A method for analyzing the condition of a surface of an electronic device, the surface having a defined pattern, the method comprising:

(a) illuminating a first region of the surface such that light is diffracted off of features the surface;

(b) filtering diffracted light to block one or more portions of a diffraction pattern from the substrate surface which portions contain little or no information pertaining to a surface feature of interest, while passing diffracted light containing information relevant to the surface feature of interest;

(c) detecting the filtered diffracted light; and

(d) comparing the filtered diffracted light to a baseline diffraction pattern of light diffracted from a baseline region having a condition corresponding to an expected condition of the surface feature of interest.

28. The method of claim 27, further comprising:

(e) determining whether the detected light diffracted from the first region significantly deviates from the baseline diffraction pattern.

29. The method of claim 27, wherein the filtered diffracted light produces a spatial image which is detected.