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Reduction of masking and doping steps in a method of fabricating a liquid crystal display

  • US 6,140,162 A
  • Filed: 12/16/1998
  • Issued: 10/31/2000
  • Est. Priority Date: 06/19/1998
  • Status: Expired due to Term
First Claim
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1. A method of fabricating a liquid crystal display, comprising the steps of:

  • providing an insulated substrate;

    forming a common semiconductive layer defining a source region, an off-set region, a channel region, a drain region and a first storage electrode on the insulated substrate;

    doping said source region, said drain region and said first storage electrode with impurities selectively and heavily;

    forming a gate electrode on said channel region and a second storage electrode on said first storage electrode wherein said gate electrode has a gate insulating layer disposed thereunder and said second storage electrode has a storage capacitor insulating layer disposed thereunder;

    forming an insulating interlayer covering an exposed surface of said insulated substrate including said gate electrode and said first storage electrode;

    forming contact holes exposing each of said source region and said drain region;

    forming a source wire connected to said source region and a drain wire connected to said drain region;

    forming a passivation layer covering an exposed surface of said substrate which includes covering said source wire and said drain wire;

    forming a contact hole exposing said drain wire; and

    forming a pixel electrode connected to said drain wire.

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