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Four-mirror extreme ultraviolet (EUV) lithography projection system

  • US 6,142,641 A
  • Filed: 06/18/1998
  • Issued: 11/07/2000
  • Est. Priority Date: 06/18/1998
  • Status: Expired due to Fees
First Claim
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1. A system for transferring a pattern on a reticle to a substrate, the reticle illuminated with light, the system comprising:

  • a dominantly hyperbolic convex mirror positioned to receive the light from the reticle, and reflecting the received light;

    a dominantly elliptical concave mirror positioned to receive the light reflected from the hyperbolic mirror, and reflecting the light received from the hyperbolic mirror;

    a first substantially spherical convex mirror positioned to receive the light reflected from the elliptical mirror, and reflecting the light received from the elliptical mirror; and

    a second approximately spherical concave mirror positioned to receive the light reflected from the first spherical mirror, and reflecting the light to the substrate.

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