Pneumatic support device with a controlled gas supply, and lithographic device provided with such a support device

• US 6,144,442 A
• Filed: 06/10/1998
• Issued: 11/07/2000
• Est. Priority Date: 10/23/1997
• Status: Expired due to Term

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASM Lithography Incorporated (ASML Holding NV), US Philips Corporation (Koninklijke Philips N.V.)
• Inventors: 'T Mannetje, Jacob J., Auer, Frank
• Primary Examiner(s): Adams, Russell
• Assistant Examiner(s): NGUYEN, HUNG
• Application Number:
  US09/090,034
• Time in Patent Office: 881 Days
• Field of Search: 355/30, 355/53, 355/67, 355/73, 355/74, 355/75, 355/77, 318/625, 318/632, 250/492.2, 356/399-401
• US Class Current: 355/73
• CPC Class Codes: F16C 32/06 with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
• CPC Class Codes: F16F 15/0232 with at least one gas spring F16F15/027 takes precedence
• CPC Class Codes: F16F 15/0275 Control of stiffness
• CPC Class Codes: G03F 7/70691 Handling of masks or workpieces
• CPC Class Codes: G03F 7/70833 Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Abstract

Support device (53) provided with a first part (69) and a second part (71) which is supported relative to the first part by means of a gas spring (73) having a pressure chamber (75). A gas supply (117), which compensates for gas leakage from the pressure chamber (75) during operation, is connected to an intermediate space (119) which is in communication with the pressure chamber (75) via a pneumatic restriction (121). The gas pressure present in the intermediate space (119) is held as constant as possible during operation by means of a control loop (123), to prevent transmission of pressure fluctuations which are present in the gas supply (117) to the pressure chamber (75) as much as possible. Such pressure fluctuations are undesirable in the pressure chamber because they cause mechanical vibrations in the second part of the support device and the device to be supported. The support device is used in a lithographic device for the support of a frame (39) with respect to a base (37), the frame (39) supporting a focusing unit (5).

Claims

1. A support device comprising a first support part, a second support part, a gas spring with a pressure chamber for supporting the second support part relative to the first support part parallel to a support direction, an intermediate space which is connected to the pressure chamber via a pneumatic restriction, a gas supply connected to the intermediate space, and means for controlling a gas pressure prevailing in said intermediate space.

2. A support device as claimed in claim 1, characterized in that the intermediate space comprises a connection channel which connects the gas supply to the pneumatic restriction.

3. A support device as claimed in claim 1, characterized in that the means for controlling the gas pressure prevailing in the intermediate space are provided with a pressure sensor for measuring said gas pressure, a controllable gas valve positioned between the gas supply and the intermediate space, and an electric controller for controlling the gas valve as a function of the gas pressure measured by the pressure sensor.

4. A support device as claimed in claim 1, characterized in that the pressure chamber is bounded by a cylindrical inner wall of an intermediate part of the support device and by a piston which is displaceable in the intermediate part parallel to the support direction and which is supported perpendicularly to the support direction relative to the intermediate part by a static gas bearing which is present between the inner wall of the intermediate part and an outer wall of the piston, while the intermediate part is supported parallel to the support direction by the first support part and the piston is fastened to the second support part, the static gas bearing being provided with a gas supply channel which is connected to the pressure chamber.

5. A support device as claimed in claim 4, characterized in that the intermediate part is supported relative to the first support part parallel to the support direction by means of a further static gas bearing by which the intermediate part is guided over a support surface of the first support part so as to be displaceable perpendicularly to the support direction, the further static gas bearing being provided with a further gas supply channel which is connected to the pressure chamber.

6. A lithographic device provided with a radiation source, a mask holder, a focusing unit with a main axis, a positioning device with a substrate holder which is displaceable relative to the focusing unit parellel to an X-direction which is perpendicular to the main axis and parallel to a Y-direction which is perpendicular to the X-direction and perpendicular to the main axis, a frame which supports at least the focusing unit parallel to a support direction, and a base which supports the frame by means of at least three support devices which each exert a support force on the frame which is directed parallel to the support direction, characterized in that each support device is a support device as claimed in claim 1.

7. A support device as in claim 1 wherein said pneumatic restriction is a permanently open passage which transmits high-frequency pressure fluctuations in the intermediate space to the pressure chamber only with strong damping, said high frequency pressure fluctuations having a frequency greater than 0.5 Hz.

8. A support device as in claim 7 wherein said high frequency pressure fluctuations have a frequency greater than 1.0 Hz.