Universal cold-cathode type ion source with closed-loop electron drifting and adjustable ionization gap

• US 6,147,354 A
• Filed: 07/02/1998
• Issued: 11/14/2000
• Est. Priority Date: 07/02/1998
• Status: Expired due to Fees

• Current Assignee: James Ritter, Leonid Velikuv, Yuri Maishev
• Original Assignee: James Ritter, Leonid Velikuv, Yuri Maishev
• Inventors: Velikuv, Leonid, Ritter, James, Maishev, Yuri
• Primary Examiner(s): Westin, Edward P.
• Assistant Examiner(s): PATTI, JOHN J
• Application Number:
  US09/109,152
• Time in Patent Office: 866 Days
• Field of Search: 250/282, 250/492.21, 250/492.22, 250/492.23, 250/423 R, 315/111.21
• US Class Current: 250/423.00R
• CPC Class Codes: H01J 27/02 Ion sources; Ion guns for examination or processing discharge tubes H01J37/08; ion sources, ion guns for particle spectrometer or separator tubes H01J49/10; ion propulsion F03H1/00
• CPC Class Codes: H01J 27/08 using arc discharge
• CPC Class Codes: H01J 27/143 Hall-effect ion sources with closed electron drift

Abstract

A universal cold-cathode type ion source with closed-loop electron drifting and with ion-beam propagation direction perpendicular to the plane of electron drifting is intended for uniformly treating stationary or moveable objects. Treatment procedures include cleaning, activation, polishing, thin-film coating, or etching. The ion source of the invention allows for adjusting beam parameters and configurations and has an adjustable dimensions of the ionization space between the anode and the cathode. In a preferred embodiment, the adjustment is carried out by moving the anode with respect to the cathode. The moveable anode is shifted in the direction of propagation of the ion beam or in the opposite direction, whereby the tubular ion beam is either converged or diverged. As a result, it becomes possible to adjust the surface area being treated and characteristics of the ion beam such as average energy of ions in the beam and composition of the beam, in case of a multiple-component working medium.

Claims

1. A universal ion beam source with a closed-loop ion-emitting slit capable of emitting an ion beam toward an object located in a position reachable by said ion beam, comprising:

hollow housing means that function as a cathode of said ion beam source;

anode means located in said hollow housing means and spaced from said cathode at an anode-cathode distance to form an ionization gap therebetween for ionization and acceleration of ions formed in said gap during operation of said ion beam source;

magnetic field generating means in mangetoconductive relationship with said anode means and said cathode for forming a closed magnetoconductive circuit passing through said anode means, said ionization gap, said cathode, and said magnetic field generating means;

a closed-loop ion-emitting slit formed in said cathode in the path of said magnetoconductive circuit, said closed-loop ion-emitting slit having predetermined geometric dimensions;

electric power supply means for maintaining said anode means under a positive charge and said cathode under a negative charge;

means for the supply of a working medium into said hollow housing of said cathode means to form an ion beam when said working medium passes through said ionization gap, said beam having a direction of propagation towards said object; and

means for moving said anode with respect to said cathode in said direction of propagation for adjusting said anode-cathode distance and thus adjusting said performance characteristics of said ion beam source.

2. The universal ion beam source of claim 1, wherein said means for moving said anode means with respect to said cathode comprise a linear displacement mechanism.

3. The universal ion beam source of claim 2, wherein said linear displacement mechanism comprises a first member which is rigidly connected to said anode means and a second member which is rigidly connected to said first member and protrudes outside said hollow housing;

said hollow housing having a sealed linear feedthrough, said second member protruding outside said hollow housing via said sealed linear feedthrough, said hollow housing having means for guiding said second member.

4. The universal ion beam source of claim 3, wherein:

said magnetic field generating means has a permanent magnet which generates a magnetic field that passes through said ion-emitting slit.

5. The universal ion beam source of claim 4, wherein:

said permanent magnet which is rigidly fixed in said hollow housing;

said anode means having a through opening into which said permanent magnet is inserted without contact with the walls of said opening for unobstructed movement with respect thereto.

6. The universal ion beam source of claim 5, further comprising:

an anode support made of a dielectric material to which said first member is rigidly attached, said second member being made in the form of at least one rod that is rigidly attached to said anode support at one end, and has a second end protruding outside said hollow housing via said feedthrough; and

a linear movement drive means connected to said second end.

7. The universal ion beam source of claim 6, wherein said second end is connected to a nut with a thread and said linear movement drive means is a screw that engages said nut.

8. A universal ion beam source with a closed-loop ion-emitting slit capable of emitting an ion beam toward an object located in a position reachable by said ion beam, comprising:

hollow housing means that function as a cathode of said ion beam source;

anode of a closed-loop configuration located in said hollow housing means and spaced from said cathode at an anode-cathode distance to form an ionization gap therebetween for ionization and acceleration of ions formed in said gap during operation of said ion beam source;

a permanent magnet fixed in said hollow housing in magnetoconductive relationship with said anode and said cathode for forming a closed magnetoconductive circuit passing through said anode means, said ionization gap, said cathode, and said magnetic field generating means;

a closed-loop ion-emitting slit substantially of the same configuration as said anode, said slit being formed in said cathode in the path of said magnetoconductive circuit;

electric power supply means for maintaining said anode under a positive charge and said cathode under a negative charge;

means for the supply of a working medium into said hollow housing of said cathode means to form an ion beam when said working medium passes through said ionization gap, said beam having a direction of propagation towards said object; and

means for moving said anode with respect to said cathode in said direction of propagation for adjusting said anode-cathode distance and thus adjusting said performance characteristics of said ion beam source, said means for moving said anode with respect to said cathode comprising a linear displacement mechanism.

9. The universal ion beam source of claim 8, wherein said linear displacement mechanism comprises a pair of rods each having one end connected to said anode and another end protruding outside through said hollow housing;

said hollow housing having a pair of sealed linear feedthrough devices, said another end of each of said rod protruding outside said hollow housing via said sealed linear feedthrough, said hollow housing having guide openings, said rods passing through said guide openings with a sliding fit.

10. The universal ion beam source of claim 9, wherein:

said anode having a through opening into which said permanent magnet is inserted without contact with the walls of said opening for unobstructed movement with respect thereto.

11. The universal ion beam source of claim 10, further comprising:

an anode support made of a dielectric material to which said first one end of each of said rods is rigidly attached.

12. The universal ion beam source of claim 11, wherein said another end of each of said rods is connected to a nut with a thread and said linear movement drive means is a screw that engages said nut.

13. A method for adjusting performance characteristics of ion beam source with an ionization gap between an anode and a cathode and with a closed-loop ion emitting slit of predetermined geometric dimensions, said ion source having a predetermined direction of propagation of an ion beam, said method comprising the steps of:

providing said ion-beam source with means for adjusting said ionization gap; and

adjusting performance characteristics of said ion beam by changing said ionization gap.

14. The method of claim 13, wherein said step of adjustment is performed by shifting said anode with respect to said cathode in said direction of propagation of an ion beam.

15. The method of claim 14, wherein said ion beam source has means for moving said anode with respect to said cathode in said direction of propagation for adjusting said ionization gap and thus adjusting said performance characteristics of said ion beam source.

16. The method of claim 15, wherein said means for moving said anode means with respect to said cathode comprise a linear displacement mechanism.