×

Process for co-deposition with electroless nickel

  • US 6,156,390 A
  • Filed: 04/01/1998
  • Issued: 12/05/2000
  • Est. Priority Date: 04/01/1998
  • Status: Expired due to Term
First Claim
Patent Images

1. A process for the co-deposition of fluorinated carbon and diamond material with electroless metal comprising the steps of:

  • (a) introducing a workpiece into a plating bath containing a metal salt serving as a source of electroless metal for plating, a fluorinated carbon, finely divided diamond material having an average particle size less than 10 nm wherein the finely divided diamond material is prepared by the detonation of a carbon-containing substance with a negative balance in a closed volume in an atmosphere inert to carbon and a surfactant combination comprising a non-ionic wetting agent and a cationic wetting agent, and(b) initiating an electroless plating process to form a plated workpiece including co-deposit of fluorinated carbon and diamond material substantially uniformly dispersed in a plated metal matrix.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×