Plasma processing method and apparatus
First Claim
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1. A plasma processing apparatus comprising:
- a microwave source;
a microwave waveguide for transmitting microwaves radiated from said microwave source;
a ring-shaped cavity resonator for resonating the microwaves transmitted by said microwave waveguide;
a processing chamber including a sample stand for placing thereon a substrate to be treated; and
microwave electromagnetic field radiating means for radiating a microwave electromagnetic field from said ring-shaped cavity resonator through a microwave introduction window into said precessing chamber, to generate a ring-shaped plasma in a region opposed to said substrate.
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Abstract
In a plasma processing method and apparatus, microwaves are radiated from a slot antenna set at the bottom of a resonator, a plasma is generated using the microwave and a sample is processed by the plasma. A plasma having a ring-form is generated by the microwaves radiated from the slot antennas, which are disposed at an angle which is neither in parallel to nor perpendicular to a surface current flowing on a slot antenna plate. Thereby, the sample is uniformly processed.
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Citations
8 Claims
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1. A plasma processing apparatus comprising:
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a microwave source; a microwave waveguide for transmitting microwaves radiated from said microwave source; a ring-shaped cavity resonator for resonating the microwaves transmitted by said microwave waveguide; a processing chamber including a sample stand for placing thereon a substrate to be treated; and microwave electromagnetic field radiating means for radiating a microwave electromagnetic field from said ring-shaped cavity resonator through a microwave introduction window into said precessing chamber, to generate a ring-shaped plasma in a region opposed to said substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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Specification