Apparatus and method for preventing the premature mixture of reactant gases in CVD and PECVD reactions

• US 6,161,500 A
• Filed: 09/30/1997
• Issued: 12/19/2000
• Est. Priority Date: 09/30/1997
• Status: Expired due to Fees

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Foster, Robert F., Kopacz, Stanislaw, Ameen, Michael S., LeBlanc, Rene Emile, Hillman, Joseph Todd, Webb, Douglas Arthur, Rowan, Robert Clark Jr., Leusink, Gerrit Jan
• Primary Examiner(s): Mills, Gregory
• Assistant Examiner(s): Zervigon, Rudy
• Application Number:
  US08/940,779
• Time in Patent Office: 1,176 Days
• Field of Search: 118/724, 118/725, 118/723 E, 118/723 I, 427/248.1, 219/75
• US Class Current: 118/723.00E
• CPC Class Codes: C23C 16/45514 Mixing in close vicinity to the substrate
• CPC Class Codes: C23C 16/45565 Shower nozzles
• CPC Class Codes: C23C 16/45574 Nozzles for more than one gas
• CPC Class Codes: C23C 16/5096 Flat-bed apparatus

Abstract

A method and apparatus for depositing a film by chemical vapor deposition comprises a showerhead for dispersing reactant gases into the processing space wherein the showerhead has a first space therein operable for receiving and dispersing the first reacting gas, and has a second space therein, generally isolated from the first space, and operable for receiving and dispersing the second reactant gas separate from the first gas dispersion for maintaining segregation of reactant gases and generally preventing premature mixture of the gases prior to their introduction into the processing space to prevent premature deposition in the system.

Claims

1. An apparatus for depositing a film on a substrate by chemical vapor deposition comprising:

a reaction chamber with a processing space therein for receiving a substrate;

a gas delivery system for delivering first and second reactant gases to the processing space for producing a chemical reaction in the processing space and yielding a deposited material film on a substrate therein;

a generally planar showerhead having a face surface and coupled to said gas delivery system for dispersing the reactant gases into the processing space, the showerhead having a first space therein operable for receiving and dispersing a first reactant gas, and having a second space therein, generally isolated from the first space, and operable for receiving and dispersing a second reactant gas separate from the first gas dispersion for maintaining segregation of reactant gases and generally preventing the premature mixture of the gases prior to their introduction into the processing space;

the second space comprising a generally cylindrical, planar space, the planar second space symmetry axis being generally coaxial with the axis of symmetry of the showerhead and having an axis of symmetry which is generally perpendicular to the generally planar showerhead, the planar second space further being open over a majority of the showerhead face surface for distributing a second reactant gas over a majority of the face surface, gas-dispersing passages each communicating between the planar second space and the showerhead face surface;

the first space comprising a plurality of elongated gas distribution passages extending through the showerhead from a peripheral area and coupling to said peripheral area for receiving a first reactant gas, the passages being generally horizontally co-planar and extending generally side-by-side with adjacent passages along significant portions of their length, gas-dispersing passages each communicating between the elongated passages and the showerhead face surface;

the first and second spaces operable for dispensing the reactant gases over generally the entire face surface of the showerhead for uniform distribution of the reactant gases proximate a substrate;

whereby the deposition of film material prior to entry of reactant gas into the processing space is reduced.

2. The apparatus of claim 1 wherein each gas-dispersing passage is positioned in spaced relationship around the face surface of the showerhead for uniformly dispersing the gas.

3. The apparatus of claim 1 wherein said first space is oriented in a stacked formation in the showerhead with said planar second space positioned generally over the top of said first space.

4. The apparatus of claim 1 wherein the gas-dispersing passages are arranged generally along the length of said elongated gas distribution passage for uniformly dispersing a first gas.

5. The apparatus of claim 1 wherein each of said elongated gas distribution passages extends from a side of the showerhead to an opposite side of said showerhead for uniformly dispersing a first gas.

6. The apparatus of claim 1 wherein each of said elongated gas distribution passages communicates at an end thereof with said gas delivery system.

7. The apparatus of claim 1 further comprising at least one coupler for coupling the first gas distribution passages to the gas delivery system and simultaneously distributing a first gas to an end of each of said elongated gas distribution passages.

8. The apparatus of claim 7 further comprising another coupler for coupling to an opposite end of each of the elongated passages for providing a first gas to the elongated passages from both ends thereof.

9. The apparatus of claim 1 wherein said peripheral area includes a peripheral channel for distributing a first gas around the periphery of the showerhead.

10. The apparatus of claim 1 wherein the gas distribution passages are in the form of a plurality of gas distribution fingers extending around the showerhead from a periphery thereof for distributing a first gas around the showerhead.

11. The apparatus of claim 10 wherein said peripheral area includes a peripheral channel formed there around, the distribution fingers being operably coupled to said channel for distributing a first gas.

12. The apparatus claim 1 further comprising a gas inlet port coupled to said second space proximate a center of the showerhead for introducing a second gas into the second space.

13. The apparatus of claim 1 further comprising a gas inlet port coupled to said first space proximate a center of the showerhead and a diametrical passage coupled to the inlet port for directing a first gas to a periphery of the showerhead.

14. The apparatus of claim 1 further comprising an RF power supply for delivering RF energy, the showerhead including a stem operably coupled to said power supply for biasing the showerhead to create a plasma in the reaction chamber from at least one of said reactant gases.

15. The apparatus of claim 14 wherein said gas delivery system comprises a plasma suppressor coupled between said showerhead and a supply of reactant gas, said suppressor having a passage directing gas from said supply to said showerhead and suppressing plasma created in said reaction chamber to generally prevent plasma from moving toward said gas supply.

16. The apparatus of claim 15 wherein said plasma suppressor includes a ceramic body surrounding the passage to electrically isolate said showerhead from the gas supply.

23. The apparatus of claim 1 further comprising at least one coupler for coupling the first gas distribution passages to the gas delivery system and simultaneously distributing a first gas to an end of each of said elongated gas distribution passages.

24. The apparatus of claim 23 further comprising another coupler for coupling to an opposite end of each of the elongated gas distribution passages for providing a first gas to the elongated gas distribution passages from both ends thereof.

17. A gas dispersing apparatus for dispersing a plurality of reactant gases into a processing space of a reaction chamber for producing a chemical reaction in the processing space and yielding a deposited material film on a substrate, the apparatus comprising:

a generally planar showerhead having a face surface and being configured for being coupled to a gas delivery system to receive a plurality of reactant gases, the showerhead comprising a first space therein operable for receiving and dispersing a first reactant gas, and having a second space therein, generally isolated from the first space, and operable for receiving and dispersing a second reactant gas separate from the first gas dispersion for maintaining segregation of reactant gases and generally preventing the premature mixture of gases prior to their introduction into the processing space;

the second space comprising a generally cylindrical, planar space, the planar second space symmetry axis being generally coaxial with the axis of symmetry of the showerhead and having an axis of symmetry which is generally perpendicular to the generally planar showerhead, the planar second space further being open over a majority of the showerhead face surface for distributing a second reactant gas over a majority of the face surface, gas-dispersing passages each communicating between the planar second space and the showerhead face surface;

the first space comprising a plurality of elongated gas distribution passages extending through the showerhead from a peripheral area and coupling to said peripheral area for receiving a first reactant gas, the passages being generally horizontally co-planar and extending generally side-by-side with adjacent passages along significant portions of their length, gas-dispersing passages each communicating between the elongated passages and the showerhead face surface;

the first and second spaces operable for dispersing the reactant gases over generally the entire face surface of the showerhead for uniform distribution of the reactant gases proximate a substrate.

18. The apparatus of claim 17 wherein each gas-dispersing passage is positioned in spaced relationship around the face surface of the showerhead for uniformly dispersing the gas.

19. The apparatus of claim 17 wherein said first space is oriented in a stacked formation in the showerhead with said second space positioned generally over the top of said first space.

20. The apparatus of claim 17 wherein the gas-dispersing passages are arranged generally along the length of said elongated gas distribution passage for uniformly dispersing a first gas from the showerhead.

21. The apparatus of claim 17 wherein each of said elongated gas distribution passages extends from a side of the showerhead to an opposite side of said showerhead for uniformly dispersing a first gas.

22. The apparatus of claim 17 wherein each of said elongated passages is configured to communicate at an end thereof with a gas delivery system.

25. The apparatus of claim 17 wherein said peripheral area includes a peripheral channel for distributing a first gas around the periphery of the showerhead.

26. The apparatus of claim 17 wherein the gas distribution passages are in the form of a plurality of gas distribution fingers extending around the showerhead from a periphery thereof for distributing a first gas around the showerhead.

27. The apparatus of claim 26 peripheral area includes a peripheral channel formed there around, the distribution fingers being operably coupled to said channel for distributing a first gas.

28. The apparatus of claim 17 further comprising a gas inlet port coupled to said second space proximate a center of the showerhead for introducing a second gas into the second space.

29. The apparatus of claim 17 further comprising a gas inlet port coupled to said first space proximate a center of the showerhead and a diametrical passage coupled to the inlet port for directing a first gas to a periphery of the showerhead.

30. The apparatus of claim 17 wherein said showerhead further comprises a stem configured for operably coupling to said an RF power supply for biasing the showerhead with RF energy.