White light-emitting diode and method of manufacturing the same
First Claim
1. A white light-emitting diode comprising:
- a substrate;
a first layer of n-type semiconductor formed on the substrate and being divided into a first section and a second section;
a second layer of n-type semiconductor formed on the first section of the first layer of n-type semiconductor;
a p-type semiconductor formed on the second layer of n-type semiconductor;
a first electrode partially formed on the p-type semiconductor;
a second electrode partially formed on the second section of the first layer of n-type semiconductor, such that when a current flows between the first electrode and the second electrode, a spectrum generated by an interface of the second layer of n-type semiconductor and the p-type semiconductor includes at least two peaks that can combine to produce white light.
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Accused Products
Abstract
A white light-emitting diode and a method of fabricating the same diode are disclosed. The white light-emitting diode is fabricated by epitaxy, which can produce two peaks in the spectrum at the P-N junction by appropriately adjusting epitaxial parameters such as temperature, pressure, NH3 flux and the ratio of H2 to N2 or the concentration of dopant, such as Mg or Si. The diode can thus radiate white light by adjusting the wavelength and the intensity of the principal peak in the two peaks. Further, quantum well structure can be formed in the diode. By appropriately adjusting the epitaxial parameters, the spectrum of the quantum well structures may have more than one peak. Therefore, white light can be generated by combining the light with wavelengths at two or three different peaks. The white LED can radiate white light itself and need not involve combining many LEDs, so that the cost and the difficulty of fabricating the white LED lamp can be reduced. Moreover, the white LED can radiate white light itself, and does not need to excite fluorescent material to radiate white light. Accordingly, the lifetime of the white LED lamp is not limited by the relatively short lifetime of fluorescent material.
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Citations
43 Claims
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1. A white light-emitting diode comprising:
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a substrate; a first layer of n-type semiconductor formed on the substrate and being divided into a first section and a second section; a second layer of n-type semiconductor formed on the first section of the first layer of n-type semiconductor; a p-type semiconductor formed on the second layer of n-type semiconductor; a first electrode partially formed on the p-type semiconductor; a second electrode partially formed on the second section of the first layer of n-type semiconductor, such that when a current flows between the first electrode and the second electrode, a spectrum generated by an interface of the second layer of n-type semiconductor and the p-type semiconductor includes at least two peaks that can combine to produce white light. - View Dependent Claims (2, 3)
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4. A white light-emitting diode comprising:
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a substrate; a buffer layer formed on the substrate and being divided into a first section and a second section; a first n-type semiconductor formed on the first section of the buffer layer; a second n-type semiconductor formed on the first n-type semiconductor; a first p-type semiconductor formed on the second n-type semiconductor; a second p-type semiconductor partially formed on the first n-type semiconductor; a first electrode formed on the second p-type semiconductor; and a second electrode partially formed on the second section of the buffer layer. - View Dependent Claims (5, 6, 7, 8, 9)
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10. A white light-emitting diode comprising:
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a substrate; a buffer layer formed on the substrate and being divided into a first section and a second section; an n-type semiconductor formed on the first section of the buffer layer; a first quantum well structure formed on the n-type semiconductor, which can emit a light having a wavelength of about 550 to 620 nm; a second quantum well structure formed on the first quantum well structure, which can emit a light having a wavelength of about 370 to 500 nm; a first p-type semiconductor formed on the second quantum well structure; a second p-type semiconductor partially formed on the first p-type semiconductor; a first electrode formed on the second p-type semiconductor; and a second electrode partially formed on the second section of the buffer layer. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
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26. A white light-emitting diode comprising:
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a substrate; a buffer layer formed on the substrate and being divided into a first section and a second section; an n-type semiconductor formed on the first section of the buffer layer; a first InGaN quantum well structure formed on the n-type semiconductor, which can emit a light having a wavelength of about 570 to 650 nm; a second InGaN quantum well structure formed on the first InGaN quantum well structure, which can emit a light having a wavelength of about 500 to 555 nm; a third InGaN quantum well structure formed on the second InGaN quantum well structure, which can emit a light having a wavelength of about 370 to 500 nm; a first p-type semiconductor formed on the third InGaN quantum well structure; a second p-type semiconductor partially formed on the first p-type semiconductor; a first electrode formed on the second p-type semiconductor; and a second electrode partially formed on the second section of the buffer layer. - View Dependent Claims (27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37)
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38. A white light-emitting diode comprising:
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a substrate; a buffer layer formed on the substrate and being divided into a first section and a second section; an n-type semiconductor formed on the first section of the buffer layer; a plurality of InGaN quantum well structures formed on the n-type semiconductor, in which an InGaN quantum well structure that emits light of a longer wavelength is grown first on the n-type semiconductor, then sequentially growing InGaN quantum well structures that emit light of a relatively shorter wavelength; a first p-type semiconductor formed on the plurality of InGaN quantum well structures; a second p-type semiconductor partially formed on the first p-type semiconductor; a first electrode formed on the second p-type semiconductor; and a second electrode partially formed on the second section of the buffer layer. - View Dependent Claims (39, 40, 41, 42, 43)
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Specification