Method of planarizing thin film layers deposited over a common circuit base
First Claim
1. A method for forming a high density interconnect scheme on a common circuit base to connect a first integrated circuit to a second integrated circuit and/or to support components, said method comprising:
- (a) providing a common circuit base having first and second patterned conductive layers formed thereon and having an upper surface, said common circuit base also having at least one trench formed on said upper surface between raised features of said first conductive layer;
(b) forming a first layer of a dielectric film over said common circuit base and over said raised features and said trenches;
(c) patterning said first layer to remove portions of said first layer formed over said raised features;
(d) forming a second layer of said dielectric film over said patterned first dielectric layer;
(e) performing additional film deposition and film patterning steps to complete the layout of a thin film interconnect structure over said common circuit base; and
(f) attaching an integrated circuit die to said common circuit base and electrically connecting said integrated circuit die to said thin film interconnect structure.
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Accused Products
Abstract
A method for forming a planarized thin film dielectric film on a surface of a common circuit base upon which one or more integrated circuits are to be attached. The common circuit base includes raised features formed over its surface such that the raised features define a trench area between them. The method includes the steps of forming a first layer of the dielectric film over the common circuit base and over the raised features and the trench, then patterning the newly formed layer to remove portions of the layer formed over the raised features and expose the raised features. After the layer is patterned, formation of the dielectric film is completed by forming a second layer of the dielectric film over the patterned first layer. Additional film deposition and film patterning steps are performed to complete the layout of a thin film interconnect structure over said common circuit base, and an integrated circuit die is attached to the common circuit base and electrically connecting to the thin film interconnect structure. In a preferred embodiment, the first and second layers of the dielectric film are both formed from a photo-definable material and the patterning step includes exposing the first layer to light through a patterned mask corresponding to the raised features and developing the exposed layer with a developing solution to etch away portions of the first layer formed over the raised features.
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Citations
21 Claims
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1. A method for forming a high density interconnect scheme on a common circuit base to connect a first integrated circuit to a second integrated circuit and/or to support components, said method comprising:
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(a) providing a common circuit base having first and second patterned conductive layers formed thereon and having an upper surface, said common circuit base also having at least one trench formed on said upper surface between raised features of said first conductive layer; (b) forming a first layer of a dielectric film over said common circuit base and over said raised features and said trenches; (c) patterning said first layer to remove portions of said first layer formed over said raised features; (d) forming a second layer of said dielectric film over said patterned first dielectric layer; (e) performing additional film deposition and film patterning steps to complete the layout of a thin film interconnect structure over said common circuit base; and (f) attaching an integrated circuit die to said common circuit base and electrically connecting said integrated circuit die to said thin film interconnect structure. - View Dependent Claims (2, 3)
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4. A method for forming a planarized dielectric film on a surface of a common circuit base having raised features formed on said surface and defining a trench between said raised features, said method comprising:
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(a) forming a first layer of said dielectric film over said common circuit base and over said raised features and said trench; (b) patterning said first layer to remove portions of said layer formed over said raised features; (c) forming a second layer of said dielectric film over said patterned first dielectric layer. - View Dependent Claims (5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A method for forming a planarized dielectric film on a surface of a common circuit base having raised features formed on said surface and defining a trench between said raised features, said method comprising:
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(a) forming a first layer of said dielectric film over said common circuit base and over said raised features and said trench, wherein said first layer of said dielectric film is a photo-definable material that comprises a polymer dielectric and a solvent; (b) thereafter, baking said first layer to remove at least some of said solvent material from said first dielectric layer; (c) thereafter, exposing said first dielectric layer to patterned light; (d) thereafter, developing said exposed first dielectric layer to etch away portions of said first dielectric layer formed over said raised features; (e) thereafter, curing said developed first dielectric layer; and (f) thereafter, forming a second layer of said dielectric film over said developed first dielectric layer. - View Dependent Claims (19, 20, 21)
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Specification