Thin film transistor and fabricating method thereof having patterned active layer
First Claim
1. A method of fabricating a thin film transistor, comprising the steps of:
- forming a source electrode and a drain electrode on a substrate;
depositing a first insulating layer on an surface of the substrate including the source and drain electrodes;
forming a patterned active layer on the first insulating layer;
exposing the source and drain electrodes by etching the first insulating layer using the patterned active layer as a mask;
depositing a second insulating layer covering an exposed surface of the substrate including the active layer and the source and drain electrodes;
forming a gate electrode on the second insulating layer over the active layer; and
forming a source region and a drain region by doping the active layer using the gate electrode as a mask.
2 Assignments
0 Petitions
Accused Products
Abstract
The present invention relates to a thin film transistor and a fabricating method thereof which is applied to a buried bus coplanar type TFT wherein the source and drain wires are located on a substrate. The present invention includes an insulated substrate, a source electrode and a drain electrode on the insulated substrate, a first insulating layer on the insulated substrate wherein the first insulating layer has a predetermined pattern, an active layer on the first insulating layer wherein the active layer has a source region, a channel region and a drain region, a second insulating layer covering the active layer, and a gate electrode on the second insulating layer over the channel region.
39 Citations
20 Claims
-
1. A method of fabricating a thin film transistor, comprising the steps of:
-
forming a source electrode and a drain electrode on a substrate; depositing a first insulating layer on an surface of the substrate including the source and drain electrodes; forming a patterned active layer on the first insulating layer; exposing the source and drain electrodes by etching the first insulating layer using the patterned active layer as a mask; depositing a second insulating layer covering an exposed surface of the substrate including the active layer and the source and drain electrodes; forming a gate electrode on the second insulating layer over the active layer; and forming a source region and a drain region by doping the active layer using the gate electrode as a mask. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
-
-
14. A method of fabricating a liquid crystal display, comprising the steps of:
-
forming a data line having a source electrode on a substrate; depositing a first insulating layer on an exposed surface of the substrate including the data line; depositing an amorphous silicon layer on the first insulating layer; forming a polycrystalline silicon layer by crystallizing the amorphous silicon layer; forming an active layer by patterning the polycrystalline silicon layer; exposing the data line by etching the first insulating layer using the active layer as a mask; depositing a second insulating layer on an exposed surface of the substrate including the active layer and the data line; forming a gate line on the insulating layer over the active layer wherein the gate line having a gate electrode and the data line cross each other; forming a source region and a drain region in the active layer by doping the active layer with impurities in use of the gate electrode as a mask; depositing a third insulating layer covering an exposed surface of the substrate including the gate line; forming contact holes exposing the source electrode and the source and drain regions in the second and third insulating layers; and forming an interconnection wire connecting the source electrode to the source region and a pixel electrode connected to the drain region. - View Dependent Claims (15, 16, 17, 18, 19, 20)
-
Specification