Retroreflectometer and method for measuring retroreflectivity of materials

• US 6,166,813 A
• Filed: 04/16/1998
• Issued: 12/26/2000
• Est. Priority Date: 04/18/1997
• Status: Expired due to Term

• Current Assignee: Georgia Tech Research Corporation (University System of Georgia)
• Original Assignee: Georgia Tech Research Corporation (University System of Georgia)
• Inventors: Roberts, David Wayne
• Primary Examiner(s): Font, Frank G.
• Assistant Examiner(s): STAFIRA, MICHAEL PATRICK
• Application Number:
  US09/061,732
• Time in Patent Office: 985 Days
• Field of Search: 356/445-448
• US Class Current: 356/445
• CPC Class Codes: G01N 21/55 Specular reflectivity

Abstract

A system and method for measuring the retroreflectivity of materials. The system comprises a light source and a first optical pathway along which an illumination light beam travels originating from the light source and ending at a retroreflective surface to be measured. Also, a second optical pathway is provided along which a retroreflected beam travels back from the retroreflective surface to a sensor array. A processor is electrically coupled to the sensor array with an accompanying memory on which is stored operating logic adapted to determine the intensity of a predetermined pattern of the retroreflected beam incident to the sensor array which defines the retroreflected light which propagates from the retroreflective surface at a predetermined observation angle.

Claims

1. A system for measuring retroreflectivity of materials, comprising:

a light source;

a sensor array;

a first optical pathway to direct an illumination beam from the light source to a retroreflective surface;

a second optical pathway to direct a retroreflected beam from the retroreflective surface to the sensor array;

a local interface electrically coupled to the sensor array;

a processor electrically coupled to the local interface;

a memory electrically coupled to the local interface; and

operating logic stored in the memory and executable by a processor to determine an intensity distribution of the retroreflected beam incident to the sensor array.

2. The system of claim 1, wherein an area of the retroreflected beam incident to the sensor array is smaller than a sensing surface area of the sensor array, thereby defining an incident retroreflected beam positioning tolerance.

3. The system of claim 1, wherein a predetermined portion of the retroreflected beam incident to the sensor array is smaller than a sensing surface area of the sensor array, thereby defining an incident retroreflected beam positioning tolerance.

4. The system of claim 1, wherein the operating logic further comprises logic to determine an intensity of a portion of the retroreflected beam incident to the sensor array that defines a predetermined angular separation between the illumination beam and the retroreflected beam.

5. The system of claim 3, wherein the operating logic further comprises logic to determine an intensity of the predetermined portion of the retroreflected beam incident to the sensor array that defines a predetermined angular separation between the illumination beam and the retroreflected beam.

6. The system of claim 4, wherein the logic to determine the intensity of the portion of the retroreflected beam incident to the sensor array that defines the predetermined angular separation further includes logic to determine a centroid of the retroreflected beam incident to the sensor array.

7. The system of claim 6, wherein the portion of the retroreflected beam incident to the sensor array is an annulus centered around the centroid.

8. A system for measuring the retroreflectivity of materials, comprising:

a light source;

a sensor array;

a first optical pathway to direct an illumination beam from the light source to a retroreflective surface;

a second optical pathway to direct a retroreflected beam from the retroreflective surface to the sensor array; and

a logical circuit electrically coupled to the sensor array, the logic circuit configured to determine an intensity distribution of the retroreflected beam incident to the sensor array.

9. The system of claim 8, wherein an area of the retroreflected beam incident to the sensor array is smaller than a sensing surface area of the sensor array, thereby defining an incident retroreflected beam positioning tolerance.

10. The system of claim 8, wherein a predetermined portion of the retroreflected beam incident to the sensor array is smaller than a sensing surface area of the sensor array, thereby defining an incident retroreflected beam positioning tolerance.

11. The system of claim 8, wherein the logical circuit further comprises logical circuitry to determine the intensity of a portion of the retroreflected beam incident to the sensor array that defines a predetermined angular separation between the illumination beam and the retroreflected beam.

12. The system of claim 10, wherein the logical circuit further comprises logical circuitry configured to determine the intensity of a predetermined portion of the retroreflected beam incident to the sensor array that defines a predetermined angular separation between the illumination beam and the retroreflected beam.

13. The system of claim 11, wherein the logical circuit is further configured to determine a centroid of the retroreflected beam incident to the sensor array.

14. The system of claim 13, wherein the portion of the incident retroreflected beam is an annulus centered around the centroid.

15. A system for measuring the retroreflectivity of materials, comprising:

a light source;

a sensor array;

means for directing an illumination beam from the light source to a retroreflective surface;

means for directing a retroreflected beam from the retroreflective surface to the sensor array; and

means for determining an intensity distribution of the retroreflected beam incident to the sensor array.

16. The system of claim 15, wherein an area of the retroreflected beam incident to the sensor array is smaller than a sensing surface area of the sensor array, thereby defining an incident retroreflected beam positioning tolerance.

17. The system of claim 15, wherein a predetermined portion of the retroreflected beam incident to the sensor array is smaller than a sensing surface area of the sensor array, thereby dining an incident retroreflected beam positioning tolerance.

18. The system of claim 15, wherein the means for determining the intensity distribution of the retroreflected beam incident to the sensor array further comprises means for determining the intensity of a portion of the retroreflected beam incident to the sensor array that defines a predetermined angular separation between the illumination beam and the retroreflected beam.

19. The system of claim 17, wherein the means for determining the intensity of the retroreflected beam incident to the sensor array further comprises means for determining the intensity of the predetermined portion of the retroreflected beam incident to the sensor array that defines a predetermined angular separation between the illumination beam and the retroreflected beam.

20. The system of claim 18, wherein the means for determining the intensity of the portion of the retroreflected beam incident to the sensor array that defines the predetermined angular separation further comprises means for determining a centroid of the retroreflected beam incident to the sensor array.

21. The system of claim 20, wherein the portion of the retroreflected beam incident to the sensor array is an annulus centered at the centroid.

22. A method for measuring the retroreflectivity of materials, comprising the steps of:

generating an illumination beam from a light source;

directing the illumination beam from the light source to a retroreflective surface;

directing a retroreflected beam from the retroreflective surface to a sensor array; and

determining an intensity distribution of the retroreflected beam incident to the sensor array.

23. The method of claim 22, further comprising the step of positioning the retroreflected beam incident to the sensor array within a surface area of the sensor array.

24. The method of claim 22, wherein the step of determining the intensity distribution of the retroreflected beam incident to the sensor array further comprises the step of determining the intensity of a portion of the retroreflected beam incident to the sensor array that defines a predetermined angular separation between the illumination beam and the retroreflected beam.

25. The method of claim 24, wherein the step of determining the intensity of a portion of the retroreflected beam incident to the sensor array that defines the predetermined angular separation further comprises the step of determining a centroid of the retroreflected beam incident to the sensor array.

26. The system of claim 25, wherein the step of determining the intensity of a portion of the retroreflected beam incident to the sensor array that defines the predetermined angular separation further comprises the step of defining an annulus in the retroreflected beam incident to the sensor array centered at the centroid.

27. A system for generating an intensity distribution indicating an angular separation between an illumination beam and a retroreflected beam to determine a retroreflectivity of a sample surface, comprising:

a light source to generate the illumination beam;

a sensor array to receive a retroreflected beam;

a first optical pathway extending from the light source to an exit face to direct a propagation of the illumination beam through the exit face; and

a second optical pathway extending from the exit face to the sensor array to direct a propagation of the retroreflected beam received through the exit face, the sensor array generating the intensity distribution in response to the retroreflected beam incident to the sensor array.

28. The system of claim 27, wherein an area of the retroreflected beam incident to the sensor array is smaller than a sensing surface area of the sensor array, thereby defining an incident retroreflected beam positioning tolerance.

29. The system of claim 27, wherein a predetermined portion of the retroreflected beam incident to the sensor array is smaller than a sensing surface area of the sensor array, thereby defining an incident retroreflected beam positioning tolerance.

30. The system of claim 29, wherein the predetermined portion of the retroreflected beam incident to the sensor array is an annulus centered around the centroid.

31. A system for generating an intensity distribution indicating an angular separation between an illumination beam and a retroreflected beam to determine a retroreflectivity of a sample surface, comprising:

a light source to generate the illumination beam;

a sensor array to receive a retroreflected beam;

means for directing the illumination beam from the light source to an exit face; and

means for directing the retroreflected beam received through the exit face to the sensor array, the sensor array generating the intensity distribution in response to the retroreflected beam incident to the sensor array.

32. The system of claim 31, wherein an area of the retroreflected beam incident to the sensor array is smaller than a sensing surface area of the sensor array, thereby defining an incident retroreflected beam positioning tolerance.

33. The system of claim 31, wherein a predetermined portion of the retroreflected beam incident to the sensor array is smaller than a sensing surface area of the sensor array, thereby defining an incident retroreflected beam positioning tolerance.

34. The system of claim 33, wherein the predetermined portion of the retroreflected beam incident to the sensor array is an annulus centered around the centroid.

35. A method for generating an intensity distribution indicating an angular separation between an illumination beam and a retroreflected beam to determine a retroreflectivity of a sample surface, comprising the steps of:

generating the illumination beam using a light source;

directing the illumination beam from the light source to an exit face;

directing the retroreflected beam received through the exit face to a sensor array; and

generating the intensity distribution with the sensor array in response to the retroreflected beam incident to the sensor array.