Capacitance type pressure sensor with capacitive elements actuated by a diaphragm
First Claim
1. A capacitance type pressure sensor comprising:
- a diaphragm which is a monocrystal silicon substrate and which is displaced by applied pressure;
an insulating film formed on said diaphragm;
a first electrode formed on said insulating film;
a second electrode formed in opposition to said first electrode through a gap; and
means for detecting a change in capacitance between said first and second electrodes and converting the detected capacitance change into a voltage, which capacitance change occurs due to a change in the distance between said first and second electrodes caused by the pressure applied to said diaphragm.
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Abstract
In a capacitance type pressure sensor, a diaphragm is formed of a fragile material using an impurity-diffused monocrystal silicon and constitutes a stable pressure-responsive structure which does not undergo a plastic deformation. Between the diaphragm and a movable electrode is formed an oxide film to diminish stray capacitance between the movable electrode and a substrate and also between the movable electrode and a impurity-diffused layer. The oxide film and the movable electrode are each divided into plural regions so that the divided regions of the movable electrode are formed on the divided regions of the oxide film, thereby diminishing stress strain induced by a difference in therm expansion coefficient among the diaphragm, oxide film and movable electrode. The upper surface of a fixed electrode is covered with a structure for the fixed electrode which structure is formed by an insulating polycrystal silicon film not doped with impurity whereby the rigidity of the electrode is enhanced and it is possible to diminish a leak current.
129 Citations
10 Claims
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1. A capacitance type pressure sensor comprising:
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a diaphragm which is a monocrystal silicon substrate and which is displaced by applied pressure;
an insulating film formed on said diaphragm;
a first electrode formed on said insulating film;
a second electrode formed in opposition to said first electrode through a gap; and
means for detecting a change in capacitance between said first and second electrodes and converting the detected capacitance change into a voltage, which capacitance change occurs due to a change in the distance between said first and second electrodes caused by the pressure applied to said diaphragm. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A capacitance type pressure sensor comprising:
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a diaphragm which is a monocrystal silicon substrate and which is displaced by applied pressure;
a first electrode formed on said diaphragm and divided in at least two or more parts;
a second electrode formed in opposition to said first electrode through a gap; and
means for detecting a change in capacitance between said first and second electrodes and converting the detected capacitance change into a voltage, which capacitance change occurs due to a change in the distance between said first and second electrodes caused by the pressure applied to said diaphragm. - View Dependent Claims (9, 10)
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Specification
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- Resources
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Current AssigneeHitachi Car Engineering Company Limited (Hitachi, Ltd.), Hitachi, Ltd.
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Original AssigneeHITACHI, LTD. AND HITACHI CAR ENGINEERING CO., LTD.
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InventorsSaito, Akihiko, Yasukawa, Akio, Matsumoto, Masahiro, Miyazaki, Atsushi, Hanzawa, Keiji, Horie, Junichi, Shimada, Satoshi, Suzuki, Seikou, Ichikawa, Norio, Kuryu, Seiji
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Primary Examiner(s)FELBER, JOSEPH LEON
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Application NumberUS09/103,612Time in Patent Office923 DaysField of Search737/24, 361/283.4, 438/53US Class Current73/724CPC Class CodesG01L 9/0073 using a semiconductive diap...
