Apparatus and method for servicing a wafer platform

• US 6,170,496 B1
• Filed: 08/26/1998
• Issued: 01/09/2001
• Est. Priority Date: 08/26/1998
• Status: Expired due to Term

• Current Assignee: Taiwan Semiconductor Manufacturing Company Limited
• Original Assignee: Taiwan Semiconductor Manufacturing Company Limited
• Inventors: Peng, Long Hoang, Chen, Jia Rong
• Primary Examiner(s): Markoff, Alexander
• Application Number:
  US09/140,037
• Time in Patent Office: 867 Days
• Field of Search: 156/345, 134/94.1, 134/95.1, 134/98.1, 134/99.1, 134/100.1, 134/102.1, 134/102.2, 134/26, 134/30, 134/42, 134/902, 134/22.1, 134/22.11, 134/22.12, 134/21, 118/723.T, 315/111.21, 153/001, 153/03, 153/121, 153/122, 153/54, 154/05, 344/31, 344/44, 344/87, 346/11
• US Class Current: 134/102.1
• CPC Class Codes: B08B 5/02 Cleaning by the force of jets, e.g. blowing-out cavities airguns or nozzles per se B05B1/005
• CPC Class Codes: C23C 16/45521 the gas, other than thermal contact gas, being introduced the rear of the substrate to flow around its periphery
• CPC Class Codes: C23C 16/4586 Elements in the interior of the support, e.g. electrodes, heating or cooling devices
• CPC Class Codes: H01L 21/67017 Apparatus for fluid treatment H01L21/67126, H01L21/6715 take precedence
• CPC Class Codes: H01L 21/6831 using electrostatic chucks
• CPC Class Codes: H01L 21/6833 Details of electrostatic chucks
• CPC Class Codes: Y10S 134/902 Semiconductor wafer

Abstract

An apparatus for servicing a wafer chuck such as an electrostatic chuck that is equipped with vent holes for cooling the backside of a wafer positioned on the chuck and for clearing the vent holes is provided. The novel apparatus can be used either in replacing a gas supply conduit to the electrostatic chuck without having to break vacuum in the process chamber, or can be used in clearing the vent holes when servicing an electrostatic chuck. The apparatus consists of a three-way control valve and a high pressure gas supply line of a suitable inert gas.

Claims

1. An apparatus for servicing a wafer chuck comprising:

a wafer chuck situated in a chamber, said chuck having a top surface equipped with a multiplicity of apertures, said multiplicity of apertures being in fluid communication with an internal passageway provided in said chuck,

a first conduit in fluid communication with said internal passageway at one end and with a first valve opening of a three-way valve at an opposite end,

a second conduit in fluid communication with a first inert gas supply at one end and with a second valve opening of a three-way valve at an opposite end,

a three-way valve having a first valve opening connected to said first conduit, a second valve opening connected to said second conduit and a third valve opening connected to a second inert gas supply, whereby a fluid communication between said first valve opening and said third valve opening enables said second conduit to be replaced without breaking vacuum in said chamber; and

a fluid communication between said first valve opening and said second valve opening enables said multiplicity of apertures to be ventilated.

2. An apparatus for servicing a wafer chuck according to claim 1, wherein said wafer chuck is an electrostatic chuck.

3. An apparatus for servicing a wafer chuck according to claim 1, wherein said multiplicity of apertures being adapted for circulating an inert gas on the bottom surface of a wafer positioned on said chuck.

4. An apparatus for servicing a wafer chuck according to claim 1, wherein said internal passageway being adapted for providing fluid communication with said multiplicity of apertures at one end and for receiving a first conduit at an opposite end.

5. An apparatus for servicing a wafer chuck according to claim 1, wherein said second conduit being fabricated of a reinforced braided elastomeric material.

6. An apparatus for servicing a wafer chuck according to claim 1, wherein said first inert gas supply is a supply of helium and is used for purging a bottom side of a wafer situated on said chuck.

7. An apparatus for servicing a wafer chuck according to claim 1, wherein said second inert gas supply is a supply of nitrogen.