Method of fabricating ridge waveguide semiconductor light-emitting device
First Claim
1. A method of fabricating a ridge waveguide semiconductor light-emitting device comprising the steps of:
- (i) sequentially forming a first conductivity type cladding layer over a substrate, a first undoped confinement layer over the first conductivity type cladding layer, an active layer over the first undoped confinement layer, a second undoped confinement layer over the active layer, a second conductivity type cladding layer over the second undoped confinement layer, a second conductivity type barrier reduction layer over the second conductivity type cladding layer, and a second conductivity type cap layer over the second conductivity type barrier reduction layer;
(ii) partially etching the second conductivity type cap layer, the second conductivity type barrier reduction layer and the second conductivity type cladding layer to a position near the second confinement layer to form a ridge waveguide;
(iii) forming a photoresist layer to mask the ridge waveguide;
(iv) removing the second conductivity type cap layer which is not covered by the photoresist layer, and then removing the photoresist layer; and
(v) forming a metal oxide and a metal layer thereon.
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Abstract
A method of fabricating a ridge waveguide semiconductor light-emitting device is provided in which an oxide semiconductor having a heavy carrier concentration serves as the interface of the metal layer and the epitaxial layer to make the current flow through the ridge waveguide. This invention forms an oxide semiconductor having a heavy carrier concentration thereon after finishing the basic structure of a ridge waveguide semiconductor light-emitting device, then forms a metal layer to conduct current. Since the carrier concentration at the surface of the ridge waveguide is higher than that at the inner portion, the current primarily flows through the interface of the oxide semiconductor having a heavy carrier concentration and the vertex of the ridge waveguide. Thus the current is restricted to only flow through the vertex of the ridge waveguide.
16 Citations
20 Claims
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1. A method of fabricating a ridge waveguide semiconductor light-emitting device comprising the steps of:
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(i) sequentially forming a first conductivity type cladding layer over a substrate, a first undoped confinement layer over the first conductivity type cladding layer, an active layer over the first undoped confinement layer, a second undoped confinement layer over the active layer, a second conductivity type cladding layer over the second undoped confinement layer, a second conductivity type barrier reduction layer over the second conductivity type cladding layer, and a second conductivity type cap layer over the second conductivity type barrier reduction layer;
(ii) partially etching the second conductivity type cap layer, the second conductivity type barrier reduction layer and the second conductivity type cladding layer to a position near the second confinement layer to form a ridge waveguide;
(iii) forming a photoresist layer to mask the ridge waveguide;
(iv) removing the second conductivity type cap layer which is not covered by the photoresist layer, and then removing the photoresist layer; and
(v) forming a metal oxide and a metal layer thereon. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification