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Hollow cathode for plasma doping system

  • US 6,182,604 B1
  • Filed: 10/27/1999
  • Issued: 02/06/2001
  • Est. Priority Date: 10/27/1999
  • Status: Expired due to Term
First Claim
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1. A pulsed plasma processing system, comprising:

  • an anode;

    a target cathode on which a first target is to be placed, the target cathode spaced apart from the anode; and

    a hollow cathode disposed adjacent to each of the anode and the target cathode, wherein the hollow cathode surrounds a portion of a space between the anode and the target cathode, and wherein the entire hollow cathode is at one potential.

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