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Method for forming cornered images on a substrate and photomask formed thereby

  • US 6,184,151 B1
  • Filed: 03/24/1999
  • Issued: 02/06/2001
  • Est. Priority Date: 08/21/1997
  • Status: Expired due to Fees
First Claim
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1. A method of forming cornered images on a substrate comprising the steps of:

  • (a) providing a substrate having a first layer of selectively etchable material thereon;

    (b) forming a plurality of parallel edged openings in the first layer of etchable material, the openings aligned to form pairs of straight-edged first regions;

    (c) depositing a layer of selectively etchable material over the openings in said first layer of etchable material;

    (d) forming a second plurality of parallel edged openings in the layer of patternable material, said second plurality of openings intersecting adjacent pairs of said straight-edged first regions forming a plurality of second regions bounded by two edges of one of said first regions and two edges of one of said second region; and

    (e) processing the substrate in the second regions defined by said first and second openings.

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