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Dual-band quantum-well infrared sensing array having commonly biased contact layers

  • US 6,184,538 B1
  • Filed: 10/16/1998
  • Issued: 02/06/2001
  • Est. Priority Date: 10/16/1997
  • Status: Expired due to Term
First Claim
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1. A semiconductor radiation sensing array comprising a plurality of sensing pixels formed on a semiconductor substrate, each sensing pixel including:

  • a first semiconductor contact layer doped to have a predetermined type of conductivity;

    a first quantum-well sensing stack formed over said first semiconductor contact layer and configured to have a plurality of alternating semiconductor layers which form a first number of quantum wells of a first well width and are doped at a first doping level, said first quantum-well sensing stack responsive to radiation at a first operating wavelength to produce a first amount of charged carriers;

    at least one second semiconductor contact layer doped to have said predetermined type of conductivity and formed on said first quantum-well sensing stack;

    a second quantum-well sensing stack formed over said second semiconductor contact layer and configured to have a plurality of alternating semiconductor layers which form a second number of quantum wells of a second well width and are doped at a second doping level, said second quantum-well sensing stack responsive to radiation at a second operating wavelength different than said first operating wavelength to produce a second amount of charged carriers;

    a third semiconductor contact layer doped to have said predetermined type of conductivity and formed on said second quantum-well sensing stack, wherein said first and third semiconductor contact layers are maintained at a common bias electrical potential with respect to said second semiconductor contact layer so that said first and second quantum-well sensing stacks are biased by a common voltage difference.

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