Master plate transporting system

• US 6,184,970 B1
• Filed: 10/22/1997
• Issued: 02/06/2001
• Est. Priority Date: 11/22/1996
• Status: Expired due to Fees

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Nishikata, Akio, Endo, Yutaka, Nakahara, Kanefumi
• Primary Examiner(s): Adams, Russell
• Assistant Examiner(s): NGUYEN, HUNG
• Application Number:
  US08/955,949
• Time in Patent Office: 1,203 Days
• Field of Search: 355/47, 355/53, 355/67, 355/72, 355/77, 355/75, 355/133, 356/399, 356/400, 356/401, 430/5, 430/30, 250/548, 250/492.22, 414/225, 414/331, 414/321, 414/749
• US Class Current: 355/53
• CPC Class Codes: G03F 1/66 Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
• CPC Class Codes: G03F 7/70541 Tagging, i.e. hardware or software tagging of features or components, e.g. using tagging scripts or tagging identifier codes for identification of chips, shots or wafers
• CPC Class Codes: G03F 7/70741 Handling masks outside exposure position, e.g. reticle libraries

Abstract

A master plate transporting system automatically detects the presence/absence of master plates accommodated in a container and also detects the position of each master plate in the container as well as the type of the container being used. In this arrangement, the master plate transporting system executes the automatic transporting operation without transport errors. Containers each holding one or more reticles, are positioned in a semiconductor manufacturing apparatus. A reticle detection sensor detects the presence and the position of the reticle in each container. A controller controls the transporting operation of a reticle transporting mechanism based on the detection results of the detection sensor to reliably retrieve the reticle, transport it to an exposure system, and return it to the container.

Claims

1. An exposure apparatus for exposing an image pattern formed on a reticle onto an object, the exposure apparatus comprising:

an exposure system located between the reticle and the object to expose the image pattern onto the object;

a reticle storing system including an upper unit, a lower unit and a moving unit to store one or more reticles, said moving unit moving said one or more reticles between said upper unit and said lower unit;

a reticle transporting system cooperating with the reticle storing system, the reticle transporting system transporting the reticle between the reticle storing system and the exposure system; and

an edge detector disposed facing a location where an edge of the reticle should be if present, the edge detector being positioned to detect the edge of the reticle in a non-contact manner while said moving unit moves said one or more reticles between said upper unit and said lower unit.

2. The exposure apparatus according to claim 1, further comprising a controller communicating with the edge detector, the controller controlling the transporting according to a detection result of the edge detector.

3. The exposure apparatus according to claim 1, wherein the edge detector comprises:

a light-emitting system that emits a light to the edge of the reticle;

a light-receiving system that receives the light reflected from the edge of the reticle; and

a detection unit communicating with the light-receiving system, the detection unit detecting the presence of the reticle in the reticle storing system in accordance with a signal from the light receiving system.

4. The exposure apparatus according to claim 1, wherein the edge detector is a reflection-type sensor.

5. An object on which said image pattern has been transferred by the exposure apparatus according to claim 1.

6. The exposure apparatus according to claim 1, wherein said moving unit comprises a holding surface that holds said one or more reticles, and wherein said edge detector is substantially perpendicular to the holding surface.

7. The exposure apparatus according to claim 1, wherein said upper unit is detachable from said lower unit.

8. A method for making an exposure apparatus that exposes a pattern of a reticle onto an object, the method comprising:

providing an exposure system that exposes the pattern onto the object;

providing a reticle storing system including an upper unit, a lower unit and a moving unit to store one or more reticles, said moving unit moving said one or more reticles between said upper unit and said lower unit;

providing a reticle transporting system cooperating with the reticle storing system, the reticle transporting system transporting the reticle between the reticle storing system and the exposure system; and

providing an edge detector disposed facing a location where an edge of the reticle should be if present, the edge detector detecting a side surface of the reticle in a non-contact manner while said moving unit moves said one or more reticles between said upper unit and said lower unit.

9. The method according to claim 8, further comprising providing a controller that communicates with the edge detector, the controller controlling the reticle transporting system according to a detection result of the edge detector.

10. The method according to claim 8, wherein the edge detector is a reflection-type sensor.

11. The method according to claim 8, wherein said moving unit comprises a holding surface that holds said one or more reticles, and wherein said edge detector is substantially perpendicular to the holding surface.

12. The method according to claim 8, wherein said upper unit is detachable from said lower unit.