Apparatus and method for measuring an aerial image using transmitted light and reflected light

• US 6,184,976 B1
• Filed: 10/09/1997
• Issued: 02/06/2001
• Est. Priority Date: 10/10/1996
• Status: Expired due to Term

• Current Assignee: Samsung Electronics Co. Ltd.
• Original Assignee: Samsung Electronics Co. Ltd.
• Inventors: Yu, Young-hun, Park, Jin-hong
• Primary Examiner(s): Font, Frank G.
• Assistant Examiner(s): MERLINO, AMANDA H
• Application Number:
  US08/948,057
• Time in Patent Office: 1,216 Days
• Field of Search: 356/237.4, 356/237.5, 356/239.3, 356/239.7, 356/239.8, 356/237.1, 250/372
• US Class Current: 356/237.4
• CPC Class Codes: G01N 21/95607 using a comparative method

Abstract

Apparatus and method for measuring an aerial image whereby influences of various defects existing on patterns formed on a photomask as well as the surface of the photomask substrate can be inspected. The aerial image measuring apparatus includes an optical transmitting device, an optical reflecting device and an aerial image forming device. The optical reflecting device includes a beam splitter and a reflecting mirror. The reflecting mirror switches the path of light so that the light transmitted along the reflected light path is irradiated to the surface of the photomask on which the patterns are formed. According to an aerial image measuring method of the present invention, either transmitted light or reflected light is selected for analysis, the selected light is converted into an electrical signal to form an aerial image, and the aerial image is measured.

Claims

1. An aerial image measuring apparatus for inspecting effects of defects on a photomask on which predetermined patterns are formed on an upper surface thereof, the apparatus comprising:

an optical transmitting section for irradiating light emitted from an optical source to a lower surface of the photomask and forming transmitted light passing through the photomask;

an optical reflecting section for irradiating the light emitted from the optical source to the upper surface of the photomask and forming reflected light reflected from the upper surface on which the patterns are formed. the optical reflecting section comprising;

a beam splitter for splitting the light emitted from the optical source into a transmitted light path along which the transmitted light is advanced and a reflected light path along which the reflected light is advanced, and

a reflecting mirror, installed in the reflected light path between the optical source and the upper surface of the photomask, for altering the reflected light path to irradiate the reflected light to the upper surface of the photomask on which the patterns are formed; and

an aerial image forming device for forming an aerial image by converting one of the transmitted light and the reflected light into an electrical signal.

2. The apparatus of claim 1, further comprising:

an on/off device installed along the transmitted light path between the optical source and the lower surface of the photomask for selectively blocking or passing the transmitted light advanced along the transmitted light path; and

another on/off device installed along the reflected light path between the optical source and the reflecting mirror for selectively blocking or passing the reflected light advanced along the reflected light path.

3. The apparatus of claim 2, further comprising an aperture installed between the optical source and the beam splitter for controlling a numerical aperture and a coherency of the light emitted from the optical source.

4. The apparatus of claim 3, wherein the optical source is a deep ultraviolet (DUV) or I-line optical source.

5. A method of measuring an aerial image to inspect effects of defects on the photomask on which a predetermined pattern is formed on an upper surface thereof, the method comprising:

(a) providing light emitted from a first optical path to a lower surface of the photomask and forming transmitted light passing through the photomask;

(b) providing light emitted from a second optical path to the upper surface of the photomask and forming reflected light reflected from the upper surface on which the patterns are formed;

(c) selecting one of the transmitted light and the reflected light for analysis;

(d) converting the selected light into an electrical signal to form an aerial image; and

(e) measuring the aerial image, wherein the first optical path and the second optical path are generated by a single light source during the providing steps (a) and (b).

6. The method of claim 5, further comprising a step of splitting said single light source into the first optical path and the second optical path during said providing steps (a) and (b).

7. The method of claim 5, wherein the first optical path and the second optical path are respectively generated by two separate light sources during the providing steps (a) and (b).

8. The method of claim 5, said selecting step (c) including a step of selectively blocking one of the transmitted light and the reflected light.

9. The method of claim 5, wherein a DUV or I-line optical source is used as the optical source.