Holographic patterning method and tool employing prism coupling

• US 6,185,019 B1
• Filed: 05/14/1999
• Issued: 02/06/2001
• Est. Priority Date: 05/14/1998
• Status: Expired due to Fees

• Current Assignee: DMG Technologies, Inc.
• Original Assignee: Optical Switch Corporation
• Inventors: Kelsey, Adam F., MacLeod, Bruce D., Hobbs, Douglas S.
• Primary Examiner(s): HENRY, JON W
• Application Number:
  US09/312,224
• Time in Patent Office: 634 Days
• Field of Search: 359/30, 359/34, 359/35, 359/12, 359/577, 359/558, 359/569
• US Class Current: 359/30
• CPC Class Codes: G02B 6/02133 using beam interference
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/7035 Proximity or contact printers
• CPC Class Codes: G03F 7/70408 Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
• CPC Class Codes: G03H 1/00 Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
• CPC Class Codes: G03H 1/0404 In-line recording arrangement

Abstract

A holographic lithography tool (110) for generating a light interference pattern used to expose a photosensitive medium (119) employs a refracting prism (121) in the optical path between divergent illuminating beams (127a, 127b). The prism is optically coupled to the photosensitive medium via an index matching fluid (123). By increasing the incident beam angle and the index of refraction, the prism reduces the size of features recorded in the photosensitive material. The divergent illuminating beams are generated by a beam delivery system which preferably employs easily adjustable fiber optic cables (176, 184). Use of the prism coupling technique facilitates use of fiber-optic-compatible wavelengths in the blue region of the spectrum in a variety of applications, such a distributed feedback grating fabrication.

Claims

1. A holographic lithography system for generating an interference pattern suitable for selectively exposing a photosensitive material, comprising:

a platform for mounting a workpiece having a photosensitive surface;

a beam delivery system configured to direct a plurality of illuminating beams toward said platform in an overlapping manner to form an optical interference pattern in the vicinity of the workpiece, said beam delivery system including;

a plurality of optical fibers having transmissive ends from which the illuminating beams respectively emanate divergently; and

a support structure on which the transmissive ends of the optical fibers are adjustable mounted, such that positions and angles of the illuminating beams relative to said platform can be adjusted by moving the transmissive ends of the optical fibers to different points on the support structure; and

a prism in optical contact with the photosensitive surface, said prism refracting the illuminating beams incident on said prism and transmitting the refracted illuminating beams toward the workpiece, such that the photosensitive surface of the workpiece is selectively exposed by the illuminating beams refracted by said prism.

2. The system of claim 1, wherein said prism is in optical contact with the photosensitive surface via an intervening index matching fluid having an index of refraction substantially matching the index of refraction of said prism.

3. The system of claim 2, wherein said index matching fluid is water.

4. The system of claim 3, wherein the water is distilled water.

5. The system of claim 2, wherein said index matching fluid is disposed in a gap between said prism and the photosensitive surface, the gap being in the range between approximately 1 mm and 5 mm.

6. The system of claim 5, wherein the gap is in the range between approximately 1 mm and 2 mm.

7. The system of claim 1, wherein said prism has a base facing said platform and inclined faces corresponding to the illuminating beams.

8. The system of claim 7, wherein faces of the prism are substantially flat.

9. The system of claim 7, wherein the faces of the prism are curved.

10. The system of claim 1, wherein said prism is a substantially equilateral prism.

11. The system of claim 1, wherein said prism is asymmetrical.

12. The system of claim 1, wherein the beam delivery system delivers illuminating beams having a wavelength in the blue range of the visible spectrum.

13. The system of claim 1, wherein said beam delivery system further includes:

a coherent light source generating a coherent light source beam;

a beam splitter circuit adapted to divide the coherent light source beam into a plurality of coherent beams and launch the coherent beams into input ends of the optical fibers, the coherent beams emanating from the transmissive ends of the optical fibers as the illuminating beams.

14. The system of claim 13, wherein said coherent light source is an argon-ion gas laser and the coherent light source beam is a laser beam having a wavelength in the blue range of the visible spectrum.

15. The system of claim 1, wherein said beam delivery system generates two illuminating beams that overlap, such that the optical interference pattern includes substantially parallel grating lines suitable for exposing the photosensitive surface to form a latent image corresponding to a distributed feedback grating.

16. The system of claim 15, where said prism has two faces corresponding to the two illuminating beams.

17. The system of claim 1, wherein said beam delivery system generates three illuminating beams that overlap to form the optical interference pattern, and said prism has three faces corresponding to the three illuminating beams.

18. The system of claim 1, wherein said beam delivery system generates four illuminating beams that overlap to form the optical interference pattern, and said prism has four faces corresponding to the four illuminating beams.

19. The system of claim 1, wherein a point of intersection of centers of the illuminating beams is in a reference plane lying substantially along the photosensitive surface of the workpiece.

20. The system of claim 1, wherein a point of intersection of centers of the illuminating beams is in a reference plane that is offset from the photosensitive surface of the workpiece by an offset distance.

21. The system of claim 20, wherein the offset distance is in the range between approximately five to ten centimeters.

22. The system of claim 1, wherein said platform is configured to receive a workpiece comprising a wafer having at least a substrate and a photoresist coating.

23. A method of performing holographic lithography for generating an interference pattern suitable for selectively exposing a photosensitive material, the method comprising the steps of:

(a) generating a plurality of divergent illuminating beams that are directed through an ambient environment having a known index of refraction by transmitting the illuminating beams from transmissive ends of a plurality of optical fibers and adjustably mounting the transmissive ends of the optical fibers on a support structure such that positions and angles of the illuminating beams relative to the photosensitive material can be adjusted by moving the transmissive ends of the optical fibers to different points on the support structure;

(b) passing the illuminating beams through a medium having a higher index of refraction than the known index of refraction, the illuminating beams refracted by the medium overlapping to form an optical interference pattern; and

(c) exposing the photosensitive material with the light interference pattern formed by the refracted illuminating beams.

24. The method of claim 23, wherein step (b) includes placing the medium in optical contact with the photosensitive material via an intervening index matching fluid having an index of refraction substantially matching the index of refraction of the medium.

25. The method of claim 24, wherein step (b) includes using water as the index matching fluid.

26. The method of claim 25, wherein step (b) includes using distilled water as the index matching fluid.

27. The method of claim 24, wherein step (b) includes disposing the index matching fluid in a gap between the medium and the photosensitive material.

28. The method of claim 27, wherein step (b) includes forming the gap to be in the range between approximately 1 mm and 5 mm.

29. The method of claim 28, wherein step (b) includes forming the gap to be in the range between approximately 1 mm and 2 mm.

30. The method of claim 24, wherein step (a) includes automatically positioning the illuminating beams via computer control as a function of a desired interference pattern.

31. The method of claim 23, wherein step (a) includes generating illuminating beams having a wavelength in the blue range of the visible spectrum.

32. The method of claim 23, wherein step (a) includes generating two illuminating beams that overlap, such that the optical interference pattern includes substantially parallel grating lines suitable for exposing the photosensitive material to form a latent image corresponding to a distributed feedback grating.

33. The method of claim 23, wherein step (a) includes generating three illuminating beams that overlap to form the optical interference pattern.

34. The method of claim 23, wherein step (a) includes generating four illuminating beams that overlap to form the optical interference pattern.

35. The method of claim 23, wherein a point of intersection of centers of the illuminating beams is in a reference plane lying substantially along a surface of the photosensitive material.

36. The method of claim 23, wherein a point of intersection of centers of the illuminating beams is in a reference plane that is offset from a surface of the photosensitive material by an offset distance.

37. The method of claim 36, wherein the offset distance is in the range between approximately five to ten centimeters.

38. The method of claim 23, wherein step (a) further includes:

(a3)generating a coherent light source beam;

(a4) dividing the coherent light source beam into a plurality of coherent beams; and

(a5) launching the coherent beams into input ends of the optical fibers.

39. A holographic lithography system for generating an interference pattern suitable for selectively exposing a photosensitive material, comprising:

a platform for mounting a workpiece having a photosensitive surface;

a beam delivery system configured to direct three illuminating beams toward said platform in an overlapping manner to form an optical interference pattern in the vicinity of the workpiece; and

a prism in optical contact with the photosensitive surface and having three faces corresponding to the three illuminating beams, said prism refracting the illuminating beams incident on said prism and transmitting the refracted illuminating beams toward the workpiece, such that the photosensitive surface of the workpiece is selectively exposed by the illuminating beams refracted by said prism.

40. The system of claim 39, wherein said beam delivery system generates four illuminating beams that overlap to form the optical interference pattern, and said prism has four faces corresponding to the four illuminating beams.

41. The system of claim 39, wherein said beam delivery system includes:

a plurality of optical fibers having transmissive ends from which the illuminating beams respectively emanate divergently; and

a support structure on which the transmissive ends of the optical fibers are adjustably mounted, such that positions and angles of the illuminating beams relative to said platform can be adjusted by moving the transmissive ends of the optical fibers to different points on the support structure.

42. A holographic lithography system for generating an interference pattern suitable for selectively exposing a photosensitive material, comprising:

a platform for mounting a workpiece having a photosensitive surface;

a beam delivery system configured to direct a plurality of illuminating beams toward said platform in an overlapping manner to form an optical interference pattern in the vicinity of the workpiece; and

a prism in optical contact with the photosensitive surface and having a base facing said platform and inclined curved faces corresponding to the illuminating beams, said prism refracting the illuminating beams incident on said prism and transmitting the refracted illuminating beams toward the workpiece, such that the photosensitive surface of the workpiece is selectively exposed by the illuminating beams refracted by said prism.

43. The system of claim 42, wherein said beam delivery system includes:

a plurality of optical fibers having transmissive ends from which the illuminating beams respectively emanate divergently; and

a support structure on which the transmissive ends of the optical fibers are adjustably mounted, such that positions and angles of the illuminating beams relative to said platform can be adjusted by moving the transmissive ends of the optical fibers to different points on the support structure.

44. The system of claim 42, wherein said beam delivery system generates two illuminating beams that overlap, such that the optical interference pattern includes substantially parallel grating lines suitable for exposing the photosensitive surface to form a latent image corresponding to a distributed feedback grating.

45. The system of claim 42, wherein said beam delivery system generates three illuminating beams that overlap to form the optical interference pattern, and said prism has three faces corresponding to the three illuminating beams.

46. The system of claim 42, wherein said beam delivery system generates four illuminating beams that overlap to form the optical interference pattern, and said prism has four faces corresponding to the four illuminating beams.

47. A method of performing holographic lithography for generating an interference pattern suitable for selectively exposing a photosensitive material, the method comprising the steps of:

(a) generating three divergent illuminating beams that are directed through an ambient environment having a known index of refraction;

(b) passing the illuminating beams through a medium having a higher index of refraction than the known index of refraction, the illuminating beams refracted by the medium overlapping to form an optical interference pattern; and

(c) exposing the photosensitive material with the light interference pattern formed by the refracted illuminating beams.

48. The method of claim 47, wherein step (a) includes generating four illuminating beams that overlap to form the optical interference pattern.

49. The method of claim 47, wherein step (a) includes:

(a1) transmitting the illuminating beams from transmissive ends of a plurality of optical fibers; and

(a2) adjustably mounting the transmissive ends of the optical fibers on a support structure, such that positions and angles of the illuminating beams relative to the photosensitive material can be adjusted by moving the transmissive ends of the optical fibers to different points on the support structure.

50. A method of performing holographic lithography for generating an interference pattern suitable for selectively exposing a photosensitive material, the method comprising the steps of:

(a) generating a plurality of divergent illuminating beams that are directed through an ambient environment having a known index of refraction;

(b) passing the illuminating beams through a medium having curved faces and a higher index of refraction than the known index of refraction, the illuminating beams refracted by the medium overlapping to form an optical interference pattern; and

(c) exposing the photosensitive material with the light interference pattern formed by the refracted illuminating beams.

51. The method of claim 50, wherein step (a) includes:

(a1) transmitting the illuminating beams from transmissive ends of a plurality of optical fibers; and

(a2) adjustably mounting the transmissive ends of the optical fibers on a support structure, such that positions and angles of the illuminating beams relative to the photosensitive material can be adjusted by moving the transmissive ends of the optical fibers to different points on the support structure.

52. The method of claim 50, wherein step (a) includes generating two illuminating beams that overlap, such that the optical interference pattern includes substantially parallel grating lines suitable for exposing the photosensitive material to form a latent image corresponding to a distributed feedback grating.

53. The method of claim 50, wherein step (a) includes generating three illuminating beams that overlap to form the optical interference pattern.

54. The method of claim 50, wherein step (a) includes generating four illuminating beams that overlap to form the optical interference pattern.