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Exposure unit, exposure system and device manufacturing method

  • US 6,185,474 B1
  • Filed: 03/02/1998
  • Issued: 02/06/2001
  • Est. Priority Date: 03/04/1997
  • Status: Expired due to Term
First Claim
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1. An exposure unit for performing exposure processing in which a pattern on a mask is print-exposed onto a substrate on the basis of exposure work information, said exposure unit comprising:

  • communication means for performing communication with external units;

    determining means for determining whether or not said exposure unit has specified work information;

    inquiring means for inquiring of an external unit via said communication means about a presence or an absence of work information when said determining means determines a non-existence of said specified work information; and

    deciding means for deciding whether or not the exposure processing based on said specified work information is executable on the basis of the result of the inquiry by said inquiring means.

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