Method for fabrication of multi-step structures using embedded etch stop layers

• US 6,187,211 B1
• Filed: 12/15/1998
• Issued: 02/13/2001
• Est. Priority Date: 12/15/1998
• Status: Expired due to Term

• Current Assignee: Xerox Corporation (Xerox Holdings Corp.)
• Original Assignee: Xerox Corporation (Xerox Holdings Corp.)
• Inventors: Lim, Martin G., Smith, Donald L., Hadimioglu, Babur B., Mikkelsen, James C. Jr.
• Primary Examiner(s): Mills, Gregory
• Assistant Examiner(s): HASSANZADEH, PARVIZ
• Application Number:
  US09/211,781
• Time in Patent Office: 791 Days
• Field of Search: 216/26, 216/24, 216/67, 216/72, 216/79, 216/2, 216/41, 216/47, 216/16, 216/27, 430/321, 430/323, 359/584, 359/355, 359/742, 427/569, 427/585, 427/588, 427/96, 427/99
• US Class Current: 216/26
• CPC Class Codes: G03F 7/0005 Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor

Abstract

A method of fabrication is provided for multi-step microlithographic structures including Fresnel lenses whereby the process includes the formation of intermediate etch stop layers that are embedded with the structure material. This is accomplished in one aspect of the invention by depositing Fresnel lens material using known techniques and the selectively altering the chemistry of the material being deposited to form the intermediate etch stop layers at suitable positions without interrupting the deposition process. In another aspect, etch stop layers are patterned on layers of the lens material and embedded between such layers. The structure, or lens, is then formed using masking, patterning and etching techniques.

Claims

1. A method of forming a four-phase Fresnel lens for use in acoustic printing, the method comprising steps of:

depositing a first layer of a first material comprised of a plurality of compounds supplied in first proportions, the first material being etchable at a first rate;

altering the first proportions of the plurality of compounds to obtain a second material comprised of the plurality of compounds supplied in second proportions, the second material being etchable at a second rate less than the first rate;

depositing a first layer of the second material on the first layer;

altering the second proportions to obtain the first material;

depositing a second layer of the first material on the first layer of the second material;

altering the first proportions to obtain the second material;

depositing a second layer of the second material on the second layer of the first material;

altering the second proportions to obtain the first material;

depositing a third layer of the first material on the second layer of the second material, the first, second and third layers of the first material and the first and second layers of the second material comprising a block; and

,

selectively masking and etching the block to form the lens.

2. The method of claim 1 wherein the first material is silicon oxynitride.

3. The method of claim 2 wherein the compounds are silane, nitrous oxide and ammonia.

4. The method of claim 3 wherein altering the first proportions includes increasing an amount of silane.

5. The method of claim 1 wherein the selective masking and etching includes

masking a first pattern on the third layer of first material leaving areas of the first material exposed;

etching portions of the first material corresponding to the exposed areas and underlying portions of the second layer of the second material until all of the first material corresponding to the exposed areas is removed;

masking a second pattern on the third layer of the first material and the second layer of the second material leaving areas of the second layer of the second material exposed;

etching portions of the second material corresponding to the exposed areas, underlying portions of the second layer of the first material, and underlying portions of the first layer of the second material until all of the second material corresponding to the exposed areas and the underlying first material is removed;

masking a third pattern on the third layer of the first material, the second layer of the second material, the second layer of the first material and the first layer of the second material leaving areas of the first layer of the second material exposed; and

,

etching portions of the second material corresponding to the exposed areas and underlying portions of the first layer of the first material until all of the underlying first material is removed.

6. A method of forming a four-phase Fresnel lens for use in acoustic printing, the method comprising steps of:

depositing a first layer of a first material comprised of a plurality of compounds supplied in first proportions, the first material being etchable at a first rate;

altering the first proportions of the plurality of compounds to obtain a second material comprised of the plurality of compounds supplied in second proportions, the second material being etchable at a second rate less than the first rate;

depositing a first layer of the second material on the first layer;

altering the second proportions to obtain the first material;

depositing a second layer of the first material on the first layer of the second material;

altering the first proportions to obtain the second material;

depositing a second layer of the second material on the second layer of the first material;

altering the second proportions to obtain the first material;

depositing a third layer of the first material on the second layer of the second material, the first, second and third layers of the first material and the first and second layers of the second material comprising a block;

masking a first pattern on the third layer of first material leaving areas of the first material exposed;

etching portions of the first material corresponding to the exposed areas and underlying portions of the second layer of the second material until all of the first material corresponding to the exposed areas is removed;

masking a second pattern on the third layer of the first material and the second layer of the second material leaving areas of the second layer of the second material exposed;

etching portions of the second material corresponding to the exposed areas, underlying portions of the second layer of the first material, and underlying portions of the first layer of the second material until all of the second material corresponding to the exposed areas and the underlying first material is removed;

masking a third pattern on the third layer of the first material, the second layer of the second material, the second layer of the first material and the first layer of the second material leaving areas of the first layer of the second material exposed; and

,

etching portions of the second material corresponding to the exposed areas and underlying portions of the first layer of the first material until all of the underlying first material is removed.

7. The method of claim 6 wherein the first material is silicon oxynitride.

8. The method of claim 7 wherein the compounds are silane, nitrous oxide and ammonia.

9. The method of claim 8 wherein altering the first proportions includes increasing an amount of silane.

10. A method of forming an n-phase Fresnel lens for use in acoustic printing, the method comprising steps of:

(a) depositing a layer of a first material comprised of a plurality of compounds supplied in first proportions, the first material being etchable at a first rate;

(b) altering the first proportions of the plurality of compounds to obtain a second material comprised of the plurality supplied in second proportions, the second material being etchable at a second rate less than the first rate;

(c) depositing a layer of the second material on the first layer;

(d) altering the second proportions to obtain the first material;

(e) depositing another layer of the first material on the layer of the second material;

(f) repeating steps (b) through (e) (n−

3) times to form a block; and

,

(g) selectively masking and etching the block to form the n-phase lens.

11. The method of claim 10 wherein the first material is silicon oxynitride.

12. The method of claim 11 wherein the compounds are silane, nitrous oxide and ammonia.

13. The method of claim 12 wherein altering the first proportions includes increasing an amount of silane.

14. A method of forming a Fresnel lens for use in acoustic printing, the method comprising steps of:

depositing a first layer of a first material, the first material being etchable at a first rate;

forming a first patterned layer of a second material on the first layer, the second material being etchable at a second rate less than the first rate;

depositing a second layer of the first material over the first patterned layer of the second material;

forming a second patterned layer of the second material on the second layer of the first material;

depositing a third layer of the first material on the second patterned layer of the second material, the first, second and third layers of the first material and the first and second patterned layers of the second material comprising a block; and

,

selectively masking and etching the block to form the lens.

15. The method of claim 14 wherein the first and second patterned layers comprise generally annular portions of the second material.

16. The method of claim 15 wherein the annular portions of the first patterned layer are vertically offset from the annular portions of the second patterned layer.

17. The method of claim 14 wherein the second rate is substantially less than the first rate.

18. The method of claim 14 wherein forming the first and second patterned layers comprises masking.

19. The method of claim 14 wherein depositing the first, second, and third layers of the first material comprise one of plasma enhanced chemical vapor deposition techniques, sputter deposition techniques and vacuum evaporation techniques.

20. The method of claim 14 wherein the selective masking requires application of only a single mask to the block to form the lens.

21. A method of forming an n-phase microlithographic structure, the method comprising steps of:

(a) depositing a layer of a first material comprised of a plurality of compounds supplied in first proportions, the first material being etchable at a first rate;

(b) altering the first proportions of the plurality of compounds to obtain a second material comprised of the plurality supplied in second proportions, the second material being etchable at a second rate less than the first rate;

(c) depositing a layer of the second material on the first layer;

(d) altering the second proportions to obtain the first material;

(e) depositing another layer of the first material on the layer of the second material;

(f) repeating steps (b) through (e) (n−

3) times to form a block; and

,

(g) selectively masking and etching the block to form the n-phase structure.

22. A method of forming a multi-step microlithographic structure, the method comprising steps of:

depositing a first layer of a first material, the first material being etchable at a first rate;

forming a first patterned layer of a second material on the first layer, the second material being etchable at a second rate less than the first rate;

depositing a second layer of the first material over the first patterned layer of the second material;

forming a second patterned layer of the second material on the second layer of the first material;

depositing a third layer of the first material on the second patterned layer of the second material, the first, second and third layers of the first material and the first and second patterned layers of the second material comprising a block; and

,

selectively masking and etching the block to form the structure.