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High magnetic flux sputter targets with varied magnetic permeability in selected regions

  • US 6,190,516 B1
  • Filed: 10/06/1999
  • Issued: 02/20/2001
  • Est. Priority Date: 10/06/1999
  • Status: Expired due to Fees
First Claim
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1. A planar ferromagnetic sputter target for use in magnetron cathode sputtering comprising a solid, unitary ferromagnetic material having a ring-shaped first region and a second region adjacent the first region, the ferromagnetic material selected from the group consisting of:

  • Co, Co-base alloys, Ni, Ni-base alloys, Fe and Fe-base alloys, the first region having at least a 0.5 lower magnetic permeability than the second region.

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