High magnetic flux sputter targets with varied magnetic permeability in selected regions

• US 6,190,516 B1
• Filed: 10/06/1999
• Issued: 02/20/2001
• Est. Priority Date: 10/06/1999
• Status: Expired due to Fees

• Current Assignee: Praxair S.T. Technology, Inc. (Linde Plc)
• Original Assignee: Praxair S.T. Technology, Inc. (Linde Plc)
• Inventors: Xiong, Wei, McDonald, Peter, Hoo, Hung-Lee
• Primary Examiner(s): Nguyen, Nam
• Assistant Examiner(s): VerSteeg, Steven H.
• Application Number:
  US09/413,073
• Time in Patent Office: 503 Days
• Field of Search: 204/192.12, 204/192.2, 204/298.12, 204/298.13, 148/320, 148/336, 148/425, 148/426, 148/306, 148/310, 148/311, 148/312, 148/313, 420/8, 420/435, 420/441, 420/459
• US Class Current: 204/298.13
• CPC Class Codes: C23C 14/3414 Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
• CPC Class Codes: C23C 14/35 by application of a magnetic field, e.g. magnetron sputtering C23C14/3457 takes precedence
• CPC Class Codes: H01J 37/3426 Material

Abstract

A planar ferromagnetic sputter target is provided for use as cathode in the magnetron sputtering of magnetic thin films, wherein the ferromagnetic material has localized regions of differing magnetic permeability. A solid, unitary, planar sputter target is formed from a ferromagnetic material, such as cobalt, nickel, iron or an alloy thereof, and this planar target is subjected to mechanical deformation, heat treatment, and/or thermal-mechanical treatment to create regions within the sputter target having different permeability than adjacent regions. The permeability differences in the ferromagnetic sputter target guides the path of the magnetic flux flow through the target to thereby increase the magnetic leakage flux at the target sputtering surface.

Claims

1. A planar ferromagnetic sputter target for use in magnetron cathode sputtering comprising a solid, unitary ferromagnetic material having a ring-shaped first region and a second region adjacent the first region, the ferromagnetic material selected from the group consisting of:

Co, Co-base alloys, Ni, Ni-base alloys, Fe and Fe-base alloys, the first region having at least a 0.5 lower magnetic permeability than the second region.

2. The sputter target of claim 1 wherein the ferromagnetic material has an intrinsic magnetic permeability greater than 1.0 and the first region is a deformed region having a magnetic permeability lower than the intrinsic magnetic permeability of the material.

3. The sputter target of claim 2, wherein the second region is thermally treated and has a magnetic permeability higher than the intrinsic magnetic permeability of the ferromagnetic material.

4. The sputter target of claim 1 wherein the ferromagnetic material is selected from the group consisting of:

Co, CoCr, CoCrPt, CoCrTa, CoNiCr, CoCrNiTa, CoCrPtTa, CoCrPtTaNb, CoCrPtTaB, CoCrPtTaMo, CoFe, CoNiFe, CoNb, CoNbZr, CoTaZr, CoZrCr, Ni, NiFe, NiFeCo, Fe, FeTa, FeCo and FeNi.