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Target and process for its production, and method for forming a film having a highly refractive index

DC CAFC
  • US 6,193,856 B1
  • Filed: 03/12/1998
  • Issued: 02/27/2001
  • Est. Priority Date: 08/23/1995
  • Status: Expired due to Term
First Claim
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1. A sputtering target comprising a substrate and a target material formed on the substrate, whereinthe target material comprises as a main component an oxygen deficient oxide;

  • the oxygen deficient oxide comprises at least one metal oxide of a chemical formula MOx that is deficient in oxygen as compared with a stoichiometric composition of the at least one metal oxide; and

    M and x in the at least one metal oxide of the chemical formula MOx are selected from a group of M and associated values of x consisting of Nb, 2<

    x<

    2.5;

    Ta, 2<

    x<

    2.5;

    Mo, 2<

    x<

    3;

    W, 2<

    x<

    3;

    Zr, 1<

    x<

    2; and

    Hf, 1<

    x<

    2.

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