Target and process for its production, and method for forming a film having a highly refractive index
DC CAFCFirst Claim
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1. A sputtering target comprising a substrate and a target material formed on the substrate, whereinthe target material comprises as a main component an oxygen deficient oxide;
- the oxygen deficient oxide comprises at least one metal oxide of a chemical formula MOx that is deficient in oxygen as compared with a stoichiometric composition of the at least one metal oxide; and
M and x in the at least one metal oxide of the chemical formula MOx are selected from a group of M and associated values of x consisting of Nb, 2<
x<
2.5;
Ta, 2<
x<
2.5;
Mo, 2<
x<
3;
W, 2<
x<
3;
Zr, 1<
x<
2; and
Hf, 1<
x<
2.
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Abstract
A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.
92 Citations
16 Claims
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1. A sputtering target comprising a substrate and a target material formed on the substrate, wherein
the target material comprises as a main component an oxygen deficient oxide; -
the oxygen deficient oxide comprises at least one metal oxide of a chemical formula MOx that is deficient in oxygen as compared with a stoichiometric composition of the at least one metal oxide; and
M and x in the at least one metal oxide of the chemical formula MOx are selected from a group of M and associated values of x consisting of Nb, 2<
x<
2.5;
Ta, 2<
x<
2.5;
Mo, 2<
x<
3;
W, 2<
x<
3;
Zr, 1<
x<
2; and
Hf, 1<
x<
2.- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A process for producing a sputtering target, the process comprising
forming an undercoat made of a metal or alloy on a substrate, and forming a target material on the undercoat by plasma spraying a ceramic powder in a semi-molten state in a high temperature plasma gas in a reducing atmosphere onto the undercoat, wherein the target material comprises as a main component an oxygen deficient oxide; -
the oxygen deficient oxide comprises at least one metal oxide of a chemical formula MOx that is deficient in oxygen as compared with a stoichiometric composition of the at least one metal oxide; and
M and x in the at least one metal oxide of the chemical formula MOx are selected from a group of M and associated values of x consisting of Ti, 1<
x<
2;
Nb, 2<
x<
2.5;
Ta, 2<
x<
2.5;
Mo, 2<
x<
3;
W, 2<
x<
3;
Zr, 1<
x<
2; and
Hf, 1<
x<
2.- View Dependent Claims (12, 13, 14, 15)
a layer having a thermal expansion coefficient intermediate between a thermal expansion coefficient of the target material and a thermal expansion coefficient of the substrate and a layer having a thermal expansion coefficient close to the thermal expansion coefficient of the target material. -
13. The process according to claim 11, wherein the plasma spraying is water plasma spraying.
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14. The process according to claim 11, wherein a cylindrical substrate is used as the substrate.
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15. The process according to claim 11, wherein a surface-roughened substrate is used as the substrate.
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16. A sputtering target comprising a substrate and a target material formed on the substrate, wherein
the target material comprises as a main component an oxygen deficient oxide; -
the oxygen deficeint oxide comprises at least one metal oxide of a chemical formula TiOx that is deficient in oxygen as compared with a stoichiometric composition of the at least one metal oxide; and
1<
×
<
2.
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Specification