Photosensitive paste, a plasma display, and a method for the production thereof

• US 6,197,480 B1
• Filed: 07/21/1997
• Issued: 03/06/2001
• Est. Priority Date: 06/12/1995
• Status: Expired due to Term

• Current Assignee: Toray Industries Incorporated
• Original Assignee: Toray Industries Incorporated
• Inventors: Iwanaga, Keiji, Iguchi, Yuichiro, Masaki, Takaki
• Primary Examiner(s): Baxter, Janet
• Assistant Examiner(s): Lee, Sin J.
• Application Number:
  US08/776,878
• Time in Patent Office: 1,324 Days
• Field of Search: 430/270.1, 430/281.1, 430/285.1, 430/286.1, 430/287.1, 430/288.1, 430/198, 430/28, 522/71, 522/83
• US Class Current: 430/286.1
• CPC Class Codes: C03C 3/064 containing boron
• CPC Class Codes: C03C 3/066 containing zinc
• CPC Class Codes: C03C 3/093 containing zinc or zirconium
• CPC Class Codes: C03C 8/18 containing free metals
• CPC Class Codes: C08F 228/00 Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur
• CPC Class Codes: C08F 290/04 Polymers provided for in subclasses C08C or C08F
• CPC Class Codes: C08F 290/046 Polymers of unsaturated carboxylic acids or derivatives thereof
• CPC Class Codes: C09D 4/00 Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
• CPC Class Codes: G03F 7/0007 Filters, e.g. additive colour filters; Components for display devices
• CPC Class Codes: G03F 7/001 Phase modulating patterns, e.g. refractive index patterns
• CPC Class Codes: G03F 7/004 Photosensitive materials G03F7/12, G03F7/14 take precedence
• CPC Class Codes: G03F 7/027 Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds G03F7/075 takes precedence
• CPC Class Codes: G03F 7/0388 with ethylenic or acetylenic bands in the side chains of the photopolymer
• CPC Class Codes: H01J 9/2271 by photographic processes final treatment of shadow-mask prior to or after dot deposition H01J9/144

Abstract

To provide a photosensitive paste that permits pattern formation with a high aspect ratio and a high accuracy and to provide a plasma display including the photosensitive paste, by using a photosensitive paste that includes, as essential components, an inorganic particles and an organic component that contains a photosensitive compound with the difference between the average refractive index of the organic component and the average refractive index of the inorganic particles being 0.1 or less.

Claims

1. A photosensitive paste comprising inorganic particles comprising glass particles and an organic component comprising a photosensitive compound,

wherein an average refractive index of the inorganic particles, N1, and an average refractive index of the organic component, N2, satisfy the following equation:

2. A photosensitive paste according to claim 1, wherein the average refractive index of the inorganic particles satisfy the following equation:

3. A photosensitive paste comprising inorganic particles comprising glass particles and an organic component comprising a photosensitive compound,

wherein an average refractive index of the inorganic particles, N1, and an average refractive index of the organic component, N2, satisfy the following equation:

4. A photosensitive paste comprising inorganic particles comprising glass particles and an organic component comprising a photosensitive compound,

wherein an average refractive index of the inorganic particles, N1, and an average refractive index of the organic component, N2, satisfy the following equation:

5. A plasma display panel production method wherein barrier ribs are produced by:

(1) coating a glass substrate with a photosensitive paste and

(2) exposing said paste to light,

said paste comprising inorganic particles and an organic component comprising a photosensitive compound, wherein an average refractive index of the inorganic particles, N1, and an average refractive index of the organic component, N2, satisfy the following equation;

6. The plasma display panel production method according to claim 5, wherein the light exposure process is performed in one step.

7. A plasma display panel production method according to claim 5, further comprising developing and firing the paste.

8. A plasma display panel production method of claim 5, wherein an average refractive index of the inorganic particles, N1, and an average refractive index of the organic component, N2, satisfy the following equation:

9. A plasma display panel production method of claims 5 or 8, wherein the average refractive index of the inorganic particles is in the range of 1.5-1.7.

10. A plasma display panel production method of claims 5 or 8, wherein the inorganic particles contain 60 wt.% or more of glass particles.

11. A plasma display panel production method of claim 10, wherein the glass particles contain at least one oxide of lithium, sodium or potassium and the total content of said at least one oxide is 3-20 wt.%.

12. A plasma display panel production method of claim 10, wherein the glass particles contain 3-20 wt.% of lithium oxide.

13. A plasma display panel production method of claim 10, wherein the glass particles contain 3-60 wt.% of silicon oxide and 5-50 wt.% of boron oxide.

14. A plasma display panel production method of claim 5 or 8, comprising 50-98 parts by weight of inorganic particles and 5-50 parts by weight of the organic component.

15. A plasma display panel production method according of claims 5 or 8, wherein the average refractive index of the inorganic particles is in the range of 1.55-1.65.

16. A plasma display panel production method of claim 5 or 8, wherein the inorganic particles comprise glass particles containing at least one oxide of bismuth or lead and the total content of said at least one oxide is 5-50 wt.%.

17. A plasma display panel production method of claim 5, wherein the organic component contains 0.05-5 wt.% of a compound that can absorb ultraviolet rays.

18. A plasma display panel production method wherein barrier ribs are produced by:

(1) coating a glass substrate with a photosensitive paste and

(2) exposing said paste to light,

said paste comprising inorganic particles and an organic component comprising a photosensitive compound, wherein an average refractive index of the inorganic particles is in the range of 1.5-1.7.

19. The plasma display panel production method according to claim 18, wherein the light exposure process is performed in one step.

20. A plasma display panel production method according to claim 18, further comprising developing and firing the paste.

21. A plasma display panel production method of claim 18, wherein an average refractive index of the inorganic particles, N1, and an average refractive index of the organic component, N2, satisfy the following equation:

22. A plasma display panel production method of claim 18, wherein the average refractive index of the inorganic particles is in the range of 1.55-1.65.

23. A plasma display panel production method of claims 18 or 22, wherein the inorganic particles contain 60 wt.% or more of glass particles.

24. A plasma display panel production method of claim 23, wherein the glass particles contain at least one oxide of lithium, sodium or potassium and the total content of said at least one oxide is 3-20 wt.%.

25. A plasma display panel production method of claim 23, wherein the glass particles contain 3-20 wt.% of lithium oxide.

26. A plasma display panel production method of claim 23, wherein the glass particles contain 3-60 wt.% of silicone oxide and 5-50 wt.% of boron oxide.

27. A plasma display panel production method of claims 18 or 22, comprising 50-98 parts by weight of inorganic particles and 5-50 parts by weight of the organic component.

28. A plasma display panel production method of claim 18, wherein the organic component contains 0.05-5 wt.% of a compound that can absorb ultraviolet rays.

29. A photosensitive paste comprising inorganic particles comprising glass particles and an organic component comprising a photosensitive compound,

wherein an average refractive index of the inorganic particles is in the range of 1.5-1.7,

wherein the inorganic particles contain the glass particles at 60 wt.% or more, and

wherein the glass particles contain at least one oxide of bismuth or lead and the total content of said at least one oxide is 5-50 wt.%.

30. A photosensitive paste according to claim 29, wherein the average refractive index of the inorganic particles is in the range of 1.55-1.65.

31. A photosensitive paste comprising inorganic particles comprising glass particles and an organic component comprising a photosensitive compound,

wherein an average refractive index of the inorganic particles is in the range of 1.5-1.7,

wherein the inorganic particles contain the glass particles at 60 wt.% or more, and

wherein the glass particles contain at least one oxide of bismuth or lead with a total content of said at least one oxide of 5-30 wt.% and wherein the particles also contain at least one additional oxide of lithium, sodium or potassium with a total content of said at least one additional oxide of 3-15 wt.%.

32. A photosensitive paste comprising inorganic particles comprising glass particles and an organic component comprising a photosensitive compound,

wherein an average refractive index of the inorganic particles is in the range of 1.5-1.7,

wherein the inorganic particles contain the glass particles at 60 wt.% or more, and

wherein the organic component contains 10-90 wt.% of an oligomer or a polymer having a weight-average molecular weight of 500-100,000, which oligomer or polymer has a carboxyl group in the molecular structure.