Brim and gas escape for non-contact wafer holder

• US 6,203,661 B1
• Filed: 12/07/1999
• Issued: 03/20/2001
• Est. Priority Date: 12/07/1999
• Status: Expired due to Fees

• Current Assignee: Invensas Corporation
• Original Assignee: Truss Technology L L C
• Inventors: Savastiouk, Sergey, Siniaguine, Oleg, Berger, Alex
• Primary Examiner(s): Lund, Jeffrie R.
• Assistant Examiner(s): MACARTHUR, SYLVIA
• Application Number:
  US09/457,042
• Time in Patent Office: 469 Days
• Field of Search: 156/345, 118/728, 118/721, 118/500
• US Class Current: 156/345.51
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H01J 37/32449 Gas control, e.g. control of the gas flow
• CPC Class Codes: H01L 21/67069 for drying etching

Abstract

The present invention comprises a brim surrounding a wafer or wafer-like object during plasma etching in a non-contact wafer holder, such brim facilitating uniform flow of the plasma discharge around the edge of the wafer during plasma etching. The brim of the present invention avoids plasma instability and non-uniform flow typical of conventional plasma etching near the edges of the wafer being etched. The brim of the present invention, by facilitating uniform and stable plasma flows, decreases non-uniform etching. One embodiment of the present invention permits the brim to move in the axial direction from a position substantially. This permits the etching process to be controlled for more uniform and precise wafer etching as lowering the brim tends to shadow the edge region of the wafer from the plasma, reducing etching in the edge region while not significantly affecting etching in the central regions of the wafer. Another embodiment of the wafer includes a barrier on the upper side of the brim directed upward from the brim at an oblique angle away from the wafer. This barrier contacts the upper surface of the brim so as to leave a protrusion or debris-collecting shelf on the upper interior portion of the brim. This shelf in combination with the upward oblique barrier deflects the plasma and debris from plasma etching away from the wafer. Another embodiment of the invention includes a gas-controlling baffle in which gas flow around the edge of the wafer may be controlled to compensate for mechanical imprecision in the gap between the brim and the wafer and/or to provide an additional means of controlling etching in the vicinity of the edge of the wafer.

Claims

1. A brim for a wafer-like workpiece in a non-contact holder comprising a disk encompassing the circumference of said workpiece at a substantially constant distance therefrom, having an upper surface on the side of said disk towards said holder and a lower surface on the opposite side thereof.

2. A brim as in claim 1 wherein said substantially constant distance is approximately 0.5 millimeter.

3. A brim as in claim 1 wherein said disk has a thickness from approximately 0.5 mm to approximately 1.3 millimeter.

4. A brim as in claim 1 wherein said disk is substantially annular in shape.

5. A brim as in claim 4 wherein said disk is from approximately 20 millimeters to approximately 25 millimeters in radial distance from the inner circumference to the outer circumference thereof.

6. A brim as in claim 1 surrounding said wafer-like object during etching thereof, wherein said disk is unetched.

7. A brim as in claim 6 wherein said disk is aluminum.

8. A brim as in claim 1 further comprising a continuous circumferential barrier on said upper surface of said disk, said barrier contacting the upper surface of said disk at a location displaced radially outward from the inner circumference of said disk.

9. A brim as in claim 8 wherein said barrier contacts said upper surface of said disk at a location from approximately 1 millimeter to approximately 3 millimeters from said inner circumference of said disk.

10. A brim as in claim 8 wherein said barrier extends upward at an oblique angle away from said workpiece.

11. A brim as in claim 10 wherein said oblique angle is less than about 60 degrees from vertical.

12. A brim as in claim 8 further comprising a baffle connected to said barrier, said baffle directed from said barrier in the direction of said holder providing thereby resistance to gas flow between said barrier and said holder.

13. A brim as in claim 12 wherein said baffle is movingly connected to said barrier permitting thereby said resistance to gas flow to be varied.

14. A brim as in claim 12 further comprising sealable openings through said baffle.

15. A brim as in claim 1 further comprising a displacement mechanism translating said disk in a direction substantially perpendicular to the radial direction of said disk.

16. A brim as in claim 15 wherein said displacement mechanism displaces said disk from approximately the plane of said workpiece to approximately 3 millimeters from the plane of said workpiece in the direction away from said holder.