Non-volatile memory structure and corresponding manufacturing process
First Claim
1. A semiconductor non-volatile memory device comprising:
- a plurality of memory cells each including a floating gate transistor having an active area, source and drain regions, a floating gate, and a control gate, a contact to the control gate being located above the active area; and
a plurality of selection transistors, each of the floating gate transistors being serially coupled to one of the selection transistors, wherein each memory cell is coupled to a bit line that is formed by at least a second metal interconnection layer, the bit line being electrically connected to the drain region, and the electrical connection of the bit line to the drain region is realized by a stacked contact that is active to a first metal interconnection layer and another contact between the first metal interconnection layer and the second metal interconnection layer.
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Accused Products
Abstract
A semiconductor non-volatile memory device that includes memory cells and selection transistors. The memory cells each include a floating gate transistor having an active area, source and drain regions, a floating gate, and a control gate, and each of the floating gate transistors is serially coupled to one of the selection transistors. A contact to the control gate is located above the active area. In a preferred embodiment, the contact is substantially aligned with a central portion of the active area. A method for manufacturing a non-volatile memory device on a semiconductor substrate is also provided. According to the method, a poly1 layer is deposited, an interpoly dielectric layer is deposited above the poly1 layer, and a poly2 layer is deposited above the interpoly dielectric layer. A mask is provided to define the control gate, and a Self-Aligned poly2/interpoly/poly1 stack etching is used to define a gate stack structure that includes the control gate and the floating gate. The floating gate is defined using only the mask and the Self-Aligned poly2/interpoly/poly1 stack etching. In one preferred method, a contact to the control gate is formed above the active area.
4 Citations
13 Claims
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1. A semiconductor non-volatile memory device comprising:
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a plurality of memory cells each including a floating gate transistor having an active area, source and drain regions, a floating gate, and a control gate, a contact to the control gate being located above the active area; and
a plurality of selection transistors, each of the floating gate transistors being serially coupled to one of the selection transistors, wherein each memory cell is coupled to a bit line that is formed by at least a second metal interconnection layer, the bit line being electrically connected to the drain region, and the electrical connection of the bit line to the drain region is realized by a stacked contact that is active to a first metal interconnection layer and another contact between the first metal interconnection layer and the second metal interconnection layer. - View Dependent Claims (2, 3, 4, 5)
wherein the floating gate and control gate are formed with double-poly wings that are symmetric with respect to the active area, and the contact to the control gate is located above the double-poly wings. -
4. The memory device as defined in claim 1, wherein the memory device is formed by a process that includes the step of:
defining the floating gate using only a POLY2 mask and a Self-Aligned poly2/interpoly/poly1 stack etching.
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5. The memory device as defined in claim 1, wherein the device is a Flash-EEPROM.
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6. A semiconductor non-volatile memory device comprising:
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a plurality of memory cells each including a floating gate transistor having an active area, source and drain regions, a floating gate, and a control gate, a contact to the control gate being located above a field oxide region and not above the active area; and
a plurality of selection transistors, each of the floating gate transistors being serially coupled to one of the selection transistors, wherein each memory cell is coupled to a bit line that is formed by at least a second metal interconnection layer, the bit line being electrically connected to the drain region, and the electrical connection of the bit line to the drain region is realized by a stacked contact that is active to a first metal interconnection layer and another contact between the first metal interconnection layer and the second metal interconnection layer.
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7. A semiconductor non-volatile memory device comprising:
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at least one memory cell including a floating gate transistor that has an active area source and drain regions, a floating gate, and a control gate;
at least one selection transistor serially coupled to the floating gate transistor;
a control gate line formed by at least a first metal interconnection layer, the control gate line being electrically connected to the control gate of the memory cell by a contact that is located above the active area; and
a bit line formed by at least a second metal interconnection layer, the bit line being electrically connected to the drain region, wherein the electrical connection of the bit line to the drain region is realized by a stacked contact that is active to the first metal interconnection layer and another contact between the first metal interconnection layer and the second metal interconnection layer. - View Dependent Claims (8, 9, 10)
the contact to the control gate is located above the double-poly wings. -
10. The memory device as defined in claim 7, wherein a metal layer island is provided around the other contact.
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11. An information handling system including at least one semiconductor non-volatile memory device, said memory device comprising:
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a plurality of memory cells each including a floating gate transistor having an active area, source and drain regions, a floating gate, and a control gate, a contact to the control gate being located above the active area; and
a plurality of selection transistors, each of the floating gate transistors being serially coupled to one of the selection transistors, wherein each memory, cell is coupled to a bit line that is formed by at least a second metal interconnection layer, the bit line being electrically connected to the drain region, and the electrical connection of the bit line to the drain region is realized by a stacked contact that is active to a first metal interconnection layer and another contact between the first metal interconnection layer and the second metal interconnection layer. - View Dependent Claims (12, 13)
wherein the floating gate and control gate are formed with double-poly wings that are symmetric with respect to the active area, and the contact to the control gate is located above the double-poly wings.
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Specification