CVD film forming method in which a film formation preventing gas is supplied in a direction from a rear surface of an object to be processed
First Claim
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1. A CVD film forming apparatus comprising:
- a process chamber;
a susceptor, provided in the process chamber, having a surface of an area smaller than that of an object to be processed, the surface being entirely covered by a first surface of the object to be processed mounted on the susceptor;
process gas supplying means for supplying a process gas to a second surface of the object to be processed mounted on the susceptor, thereby forming a film on the second surface; and
film formation preventing gas supplying means for supplying film formation preventing gas in a direction from the first surface of the object to be processed toward a peripheral edge thereof at a flow rate which can prevent the process gas from flowing to the first surface of the object to be processed, wherein;
the object to be processed is adapted to be mounted on the susceptor so as to have a projected portion in a peripheral portion of the object to be processed, which is projected from the susceptor;
the film formation preventing gas supplying means has a ring-shaped member constituting a passage through which the film formation preventing gas flows toward the peripheral edge of the object to be processed on a side of the first surface in the projected portion of the object to be processed; and
the ring-shaped member has an inner flange portion on an inner circumferential surface thereof, the inner flange portion having a surface adapted to oppose, with a predetermined gap, the first surface of the object to be processed mounted on the susceptor in the projected portion, thus defining a first part of the passage between the surface of the inner flange portion and the first surface of the object to be processed.
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Abstract
A CVD film forming apparatus includes a susceptor, provided in a process chamber, having a surface of an area smaller than that of a wafer. A process gas is supplied to a top surface of the wafer mounted on the susceptor, thereby forming a CVD film on the top surface. A film formation preventing gas is supplied in a direction from the rear surface of the wafer toward a peripheral edge thereof at a flow rate which prevents the process gas from flowing to the rear surface of the wafer.
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Citations
6 Claims
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1. A CVD film forming apparatus comprising:
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a process chamber;
a susceptor, provided in the process chamber, having a surface of an area smaller than that of an object to be processed, the surface being entirely covered by a first surface of the object to be processed mounted on the susceptor;
process gas supplying means for supplying a process gas to a second surface of the object to be processed mounted on the susceptor, thereby forming a film on the second surface; and
film formation preventing gas supplying means for supplying film formation preventing gas in a direction from the first surface of the object to be processed toward a peripheral edge thereof at a flow rate which can prevent the process gas from flowing to the first surface of the object to be processed, wherein;
the object to be processed is adapted to be mounted on the susceptor so as to have a projected portion in a peripheral portion of the object to be processed, which is projected from the susceptor;
the film formation preventing gas supplying means has a ring-shaped member constituting a passage through which the film formation preventing gas flows toward the peripheral edge of the object to be processed on a side of the first surface in the projected portion of the object to be processed; and
the ring-shaped member has an inner flange portion on an inner circumferential surface thereof, the inner flange portion having a surface adapted to oppose, with a predetermined gap, the first surface of the object to be processed mounted on the susceptor in the projected portion, thus defining a first part of the passage between the surface of the inner flange portion and the first surface of the object to be processed. - View Dependent Claims (2, 3, 4, 5, 6)
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Specification