Transparent substrate provided with a thin-film stack
First Claim
1. Transparent substrate provided with a thin-film stack including at least one low-emissivity metallic layer with infrared reflection properties arranged between underlying and overlying dielectric-based coatings, the underlying coating having a wetting layer based on zinc oxide ZnO, or aluminum-doped zinc oxide ZnO:
- Al, which is directly in contact with the metallic layer, wherein each of the two coatings based on the dielectric material comprises at least one layer with a high refractive index of greater than or equal to 2.2, and wherein the overlying dielectric-based coating has the following sequence of layers deposited in the order stated;
a) first layer(s) of material(s) having a refractive index ni-2 of less than 2.2;
b) intermediate layer(s) of material(s) having a refractive index ni-2;
c) last layer(s) of material(s) having a refractive index ni substantially equal to ni-2. wherein ni-1 of the intermediate layer is at least 0.3 less than ni of the last layer; and
further comprising a layer with refractive index that is greater than or equal to 2.2 arranged between the reflective metallic layer and the sequence of layers the overlying dielectric-based coating.
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Abstract
The invention relates to a transparent substrate, in particular made of glass, provided with a thin-film stack including at least one metallic layer with infrared reflection properties, in particular a low-emission. layer, arranged between two dielectric-based coatings, the underlying coating having a wetting layer based on zinc oxide ZnO, optionally doped with aluminium ZnO:Al, directly in contact with the metallic layer.
According to the invention, each of the two coatings based on the dielectric material comprises at least one layer with high refractive index, greater than or equal to 2.2.
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Citations
22 Claims
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1. Transparent substrate provided with a thin-film stack including at least one low-emissivity metallic layer with infrared reflection properties arranged between underlying and overlying dielectric-based coatings, the underlying coating having a wetting layer based on zinc oxide ZnO, or aluminum-doped zinc oxide ZnO:
- Al, which is directly in contact with the metallic layer, wherein each of the two coatings based on the dielectric material comprises at least one layer with a high refractive index of greater than or equal to 2.2, and wherein the overlying dielectric-based coating has the following sequence of layers deposited in the order stated;
a) first layer(s) of material(s) having a refractive index ni-2 of less than 2.2;
b) intermediate layer(s) of material(s) having a refractive index ni-2;
c) last layer(s) of material(s) having a refractive index ni substantially equal to ni-2. wherein ni-1 of the intermediate layer is at least 0.3 less than ni of the last layer; and
further comprising a layer with refractive index that is greater than or equal to 2.2 arranged between the reflective metallic layer and the sequence of layers the overlying dielectric-based coating.- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
Glass/TiO2 or Nb2O5 or ZnTiOx/ZnO/Ag/Ti or Nb/TiO2 or Nb2O5 or ZnTiOx/SnO2 or Si3N4 or (ZnO/Si3N4).
- Al, which is directly in contact with the metallic layer, wherein each of the two coatings based on the dielectric material comprises at least one layer with a high refractive index of greater than or equal to 2.2, and wherein the overlying dielectric-based coating has the following sequence of layers deposited in the order stated;
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14. Substrate according to claim 1, wherein the substrate has an emissivity of at most 0.025.
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15. Low-emission or solar-protection multiple glazing, in particular double glazing, having the substrate according to claim 1, with the thin-film stack being at faces 2 and/or 3 and at face 5.
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16. Low-emission double glazing having at least one substrate according to claim 1, wherein said glazing has an optical transmission TL of at least 72%.
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17. Double glazing according to claim 16, having two panes of glass, wherein said glazing has a coefficient K less than or equal to 1.4 W/K.m2 when the two panes of glass are separated by a layer of air, or less than or equal to 1.1 W/K.m2 when the two panes of glass are separated by a layer of argon.
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18. Substrate according to claim 1, wherein the metallic layer with infrared reflection properties has a geometrical thickness which is either between 9 and 15 nanometers, so as to give it low-emissivity properties, or between 20 and 25 nanometers so as to give it solar-protection properties.
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19. Substrate of claim 1 wherein the wetting layer has a geometrical thickness of between 15 and 30 nanometers.
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20. Substrate of claim 1 wherein the refractive index of layer a) is between 1.9 and 2.1.
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21. Substrate of claim 1 wherein the refractive index of layer b) is less than 1.8.
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22. Transparent substrate provided with a thin-film stack including at least one metallic layer with infrared reflection properties, in particular a low-emissivity layer, arranged between underlying and overlying dielectric-based coatings, the underlying coating having a wetting layer based on zinc oxide ZnO, or aluminum-doped zinc oxide, ZnO:
- Al, directly in contact with the metallic layer, characterized in that each of the two coatings based on the dielectric material comprises at least one layer with high refractive index which is greater than or equal to 2.2, wherein each of the layers with high refractive index is based on a material selected from niobium oxide Nb2O5, manganese-doped bismuth oxide Bi2O3;
Mn, a mixed oxide of zinc and titanium ZnTiOx, titanium oxide TiO2, a mixed oxide of tantalum and titanium TaTiOx, or a mixed oxide of zirconium and titanium ZrTiOx.
- Al, directly in contact with the metallic layer, characterized in that each of the two coatings based on the dielectric material comprises at least one layer with high refractive index which is greater than or equal to 2.2, wherein each of the layers with high refractive index is based on a material selected from niobium oxide Nb2O5, manganese-doped bismuth oxide Bi2O3;
Specification