Method for patterning light emitting devices incorporating a movable mask
First Claim
Patent Images
1. A method of fabricating a device, comprising the steps of:
- (a) fabricating a standoff on a substrate;
(b) positioning a shadow mask in a first position over the substrate by placing the shadow mask onto the standoff;
(c) performing a first process on the substrate through the shadow mask;
(d) after performing the first process, moving the shadow mask to a second position over the substrate, wherein the second position is measured relative to the first position; and
(e) after moving the shadow mask to a second position, performing a second process on the substrate through the shadow mask;
wherein a first charge is applied to the standoff and a second charge having a polarity opposite to that of the first charge is applied to the shadow mask, during a step selected from the group consisting of step (c) and step (e), to facilitate intimate contact between the standoff and the shadow mask during the selected step.
1 Assignment
0 Petitions
Accused Products
Abstract
A method of fabricatng a device is provided. A shadow mask is positioned in a first position over a substrate. A first process is performed on the substrate through the shadow mask. After the first process is performed, the shadow mask is moved to a second position over the substrate, measured relative to the first position. After the shadow mask is moved to the second position, a second process is performed on the substrate through the shadow mask.
-
Citations
42 Claims
-
1. A method of fabricating a device, comprising the steps of:
-
(a) fabricating a standoff on a substrate;
(b) positioning a shadow mask in a first position over the substrate by placing the shadow mask onto the standoff;
(c) performing a first process on the substrate through the shadow mask;
(d) after performing the first process, moving the shadow mask to a second position over the substrate, wherein the second position is measured relative to the first position; and
(e) after moving the shadow mask to a second position, performing a second process on the substrate through the shadow mask;
wherein a first charge is applied to the standoff and a second charge having a polarity opposite to that of the first charge is applied to the shadow mask, during a step selected from the group consisting of step (c) and step (e), to facilitate intimate contact between the standoff and the shadow mask during the selected step.- View Dependent Claims (4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
-
-
2. A method of fabricating a device, comprising the steps of:
-
(a) fabricating a standoff on a substrate;
(b) positioning a shadow mask in a first position over the substrate by placing the shadow mask onto the standoff;
(c) performing a first process on the substrate through the shadow mask;
(d) after performing the first process, moving the shadow mask to a second position over the substrate, wherein the second position is measured relative to the first position; and
(e) after moving the shadow mask to a second position, performing a second process on the substrate through the shadow mask;
wherein a first charge is applied to the standoff and a second charge having a polarity the same as that of the first charge is applied to the shadow mask, during step (d), to facilitate the moving of the shadow mask.- View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29)
-
-
3. A method of fabricating a device, comprising the steps of:
-
(a) fabricating a standoff on a substrate;
(b) positioning a shadow mask in a first position over the substrate by placing the shadow mask onto the standoff;
(c) performing a first process on the substrate through the shadow mask;
(d) after performing the first process, moving the shadow mask to a second position over the substrate, wherein the second position is measured relative to the first position; and
(e) after moving the shadow mask to a second position, performing a second process on the substrate through the shadow mask;
wherein a lubrication layer is applied between the standoff and the shadow mask.- View Dependent Claims (30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42)
-
Specification