×

In-line sputter deposition system

  • US 6,217,272 B1
  • Filed: 09/23/1999
  • Issued: 04/17/2001
  • Est. Priority Date: 10/01/1998
  • Status: Expired due to Term
First Claim
Patent Images

1. An apparatus for simultaneously transporting and processing substrates, the apparatus comprising:

  • a) a load lock that stores at least one substrate prior to processing and that stores at least one substrate after processing;

    b) a first transport mechanism that transports at least one substrate into and out of the load lock;

    c) a multi-stage elevator that is adapted to receive the first transport mechanism; and

    d) a first process chamber vertically disposed from the multi-stage elevator, wherein the multi-stage elevator vertically transports at least one substrate into and out of the first process chamber.

View all claims
  • 12 Assignments
Timeline View
Assignment View
    ×
    ×