Device manufacturing method and apparatus utilizing concentric fan-shaped pattern mask

• US 6,221,541 B1
• Filed: 05/15/2000
• Issued: 04/24/2001
• Est. Priority Date: 06/27/1997
• Status: Expired due to Term

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Saitoh, Kenji, Ogusu, Makoto
• Primary Examiner(s): Young, Christopher G.
• Application Number:
  US09/570,936
• Time in Patent Office: 344 Days
• Field of Search: 430/22, 430/302, 430/311, 430/321, 430/5, 430/30, 430/9, 355/18
• US Class Current: 430/5
• CPC Class Codes: G03F 7/70425 Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
• CPC Class Codes: G03F 7/70433 Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
• CPC Class Codes: G03F 9/70 for microlithography measuring printed patterns for monitoring overlay G03F7/70633 or focus G03F7/70641; projection system adjustment G03F7/70258; position control G03F7/70775

Abstract

A method of manufacturing an element with a concentric pattern by use of a photolithographic process is disclosed, wherein the method includes preparing masks having segment patterns corresponding to fan-shaped regions, respectively, of the pattern which fan-shaped regions can be defined by dividing the pattern by at least one circle concentric with the pattern to provide plural zones and then by dividing each zone equiangularly, and exposing regions of a substrate corresponding to the plural zones, respectively, by using the masks corresponding to the zones, respectively, while rotating the substrate by regular angles.

Claims

1. An element manufactured in accordance with a method of manufacturing an element with a concentric pattern by use of a photolithographic process, said method comprising the steps of:

preparing masks having segment patterns corresponding to fan-shaped regions, respectively, of the pattern which fan-shaped regions can be defined by dividing the pattern by at least one circle concentric with the pattern to provide plural zones and then by dividing each zone equiangularly; and

exposing regions of a substrate corresponding to said plural zones, respectively, by using the masks corresponding to said zones, respectively, while rotating the substrate by regular angles.

2. An element according to claim 1, wherein said element is an optical element.

3. An element according to claim 2, wherein the optical element is a diffractive optical element.

4. An element according to claim 3, wherein the diffractive optical element is a binary optical element.

5. An element according to claim 1, wherein said exposing step includes aligning, before illuminating a mask, an area of the substrate which is in a portion of a region of the fan-shaped region, with respect to the mask.

6. An element according to claim 5, wherein, at a boundary of two adjacent fan-shaped regions, the two adjacent fan-shaped regions include overlapping portions of an amount larger than the precision of alignment.

7. An element according to claim 5, wherein the substrate is formed with alignment marks which are formed in a region, outside the fan-shaped regions, and which are rotationally displaced by the regular angles, respectively, in a direction opposite to the direction of rotation of the substrate.

8. An optical system having an element manufactured according to a method manufacturing an element with a concentric pattern by use of a photolithographic process, said method comprising the steps of:

preparing masks having segment patterns corresponding to fan-shaped regions, respectively, of the pattern which fan-shaped regions can be defined by dividing the pattern by at least one circle concentric with the pattern to provide plural zones and then by dividing each zone equiangularly; and

exposing regions of a substrate corresponding to said plural zones, respectively, by using the masks corresponding to said zones, respectively, while rotating the substrate by regular angles.

9. An optical system according to claim 8, wherein said element is an optical element.

10. An optical system according to claim 9, wherein the optical element is a diffractive optical element.

11. An optical system according to claim 10, wherein the diffractive optical element is a binary optical element.

12. An optical system according to claim 8, wherein said exposing step includes aligning, before illuminating a mask, an area of the substrate which is in a portion of a region of the fan-shaped region, with respect to the mask.

13. An optical system according to claim 12, wherein, at a boundary of two adjacent fan-shaped regions, the two adjacent fan-shaped regions include overlapping portions of an amount larger than the precision of alignment.

14. An optical system according to claim 12, wherein the substrate is formed with alignment marks which are formed in a region, outside the fan-shaped regions, and which are rotationally displaced by the regular angles, respectively, in a direction opposite to the direction of rotation of the substrate.

15. An exposure apparatus comprising:

an optical system having an element manufactured according to a method manufacturing an element with a concentric pattern by use of a photolithographic process, said method comprising the steps of;

preparing masks having segment patterns corresponding to fan-shaped regions, respectively, of the pattern which fan-shaped regions can be defined by dividing the pattern by at least one circle concentric with the pattern to provide plural zones and then by dividing each zone equiangularly; and

exposing regions of a substrate corresponding to said plural zones, respectively, by using the masks corresponding to said zones, respectively, while rotating the substrate by regular angles; and

an exposure device configured and positioned to expose an object to light using said optical system.

16. An exposure apparatus according to claim 15, wherein said element is an optical element.

17. An exposure apparatus according to claim 16, wherein the optical element is a diffractive optical element.

18. An exposure apparatus according to claim 17, wherein the diffractive optical element is a binary optical element.

19. An exposure apparatus according to claim 15, wherein said exposing step includes aligning, before illuminating a mask, an area of the substrate which is in a portion of a region of the fan-shaped region, with respect to the mask.

20. An exposure apparatus according to claim 19, wherein, at a boundary of two adjacent fan-shaped regions, the two adjacent fan-shaped regions include overlapping portions of an amount larger than the precision of alignment.

21. An exposure apparatus according to claim 19, wherein the substrate is formed with alignment marks which are formed in a region, outside the fan-shaped regions, and which are rotationally displaced by the regular angles, respectively, in a direction opposite to the direction of rotation of the substrate.

22. A device manufacturing method comprising the step of:

manufacturing a device by performing an exposure process performed by use of an exposure apparatus comprising;

an optical system having an element manufactured according to a method manufacturing an element with a concentric pattern by use of a photolithographic process, said method comprising the steps of;

preparing masks having segment patterns corresponding to fan-shaped regions, respectively, of the pattern which fan-shaped regions can be defined by dividing the pattern by at least one circle concentric with the pattern to provide plural zones and then by dividing each zone equiangularly; and

exposing regions of a substrate corresponding to said plural zones, respectively, by using the masks corresponding to said zones, respectively, while rotating the substrate by regular angles; and

an exposure device configured and positioned to expose an object to light using said optical system,

said exposure process comprising the step of exposing the object to light using the optical system.

23. A device manufacturing method according to claim 22, wherein said element is an optical element.

24. A device manufacturing method according to claim 23, wherein the optical element is a diffractive optical element.

25. A device manufacturing method according to claim 24 wherein the diffractive optical element is a binary optical element.

26. A device manufacturing method according to claim 22, wherein said region exposing step includes aligning, before illuminating a mask, an area of the substrate which is in a portion of a region of the fan-shaped region, with respect to the mask.

27. A device manufacturing method according to claim 26, wherein, at a boundary of two adjacent fan-shaped regions, the two adjacent fan-shaped regions include overlapping portions of an amount larger than the precision of alignment.

28. A device manufacturing method according to claim 26, wherein the substrate is formed with alignment marks which are formed in a region, outside the fan-shaped regions, and which are rotationally displaced by the regular angles, respectively, in a direction opposite to the direction of rotation of the substrate.