Plasma generator pulsed direct current supply in a bridge configuration

• US 6,222,321 B1
• Filed: 06/08/1999
• Issued: 04/24/2001
• Est. Priority Date: 05/08/1996
• Status: Expired due to Term

• Current Assignee: Advanced Energy Industries Incorporated
• Original Assignee: Advanced Energy Industries Incorporated
• Inventors: Christie, David J., Scholl, Richard A.
• Primary Examiner(s): Bettendorf, Justin P.
• Application Number:
  US09/328,175
• Time in Patent Office: 686 Days
• Field of Search: 315/111.21, 313/231.41, 313/231.31, 118/723.E, 118/723.ER, 204/298.09, 219/121.52, 219/121.54, 219/121.57
• US Class Current: 315/111.21
• CPC Class Codes: H01J 37/32045 Circuits specially adapted for controlling the glow discharge
• CPC Class Codes: H05H 1/46 using applied electromagnetic fields, e.g. high frequency or microwave energy H05H1/26 takes precedence

Abstract

Current controlled power sources are disclosed that are capable of generating currents in low resistance, high temperature plasmas that are regulated to prevent the generation of excessive currents in the plasma. Current reversing switches are provided that control the flow of a direct current in a plasma chamber between various electrodes. Multiple power sources are provided in association with shunt switches for delivering a plurality of sources of direct current in various directions between electrodes in a plasma chamber. Inductive impedance can be provided in switch paths to cause a source of direct current to flow through a plasma chamber in various directions between electrodes.

Claims

1. A circuit that causes at least two substantially constant currents to flow to at least two electrodes in a plasma chamber, comprising:

a first power source that generates a substantially constant supply of a first direct current, said first power source having an output lead coupled to a first electrode, and a common return lead coupled to a circuit common;

a second power source that generates a substantially constant supply of a second direct current, said second power source having an output lead coupled to a second electrode and a common return lead coupled to a circuit common;

a first switch coupled between said first electrode and said circuit common that, when closed, causes current to flow from said second power source through said plasma chamber from said second electrode to said first electrode and shunts current from said first power source to said circuit common;

a second switch coupled between said second electrode and said circuit common that, when closed, causes current to flow from said first power source in a second direction through said plasma chamber from said first electrode to said second electrode, and shunts current from said second power source to said circuit common.

2. The circuit of claim 1 wherein:

at least one of said power sources includes a series connected inductor.

3. The circuit of claim 1 wherein said first direct current and said second direct current are not equal.

4. A circuit for causing two substantially constant direct currents to flow in a plasma chamber comprising:

a first current controlled power source coupled to said plasma chamber that generates a first substantially constant direct current;

a second current controlled power source coupled to said plasma chamber that generates a second substantially constant direct current;

a first switch that causes current from said second current controlled power source to flow through said plasma chamber in a first direction when closed;

a second switch that causes current from said first current controlled power source to flow through said plasma in a second direction when closed.

5. The circuit of claim 4 wherein:

said first current controlled power source includes a series connected inductor;

said second current controlled power source includes a series connected inductor.

6. The circuit of claim 4 further comprising:

at least on additional current controlled power source that generates at least one additional substantially constant direct current;

an additional switch associated with each additional current controlled power source that causes current from other current controlled power sources to flow through said plasma chamber in an additional direction.

7. A method for causing two substantially constant direct currents to flow in a plasma chamber comprising the steps of:

generating a first substantially constant direct current using a first current controlled power source;

generating a second substantially constant direct current using a second current controlled power source;

connecting said first current controlled power source to said plasma chamber to cause said first substantially constant direct current to flow through said plasma chamber in a first direction during a first state of operation;

connecting said second current controlled power source to said plasma chamber to cause said second substantially constant direct current to flow through said plasma chamber in a second direction during a second state of operation.

8. The method of claim 7 wherein said steps of generating first and second substantially constant direct currents comprises generating first and second substantially constant direct currents that are not equal in magnitude.

9. The method of claim 7 further comprising the step of:

shunting said first and second substantially constant direct current from said first and second current controlled power sources to a common return so that no current passes through said plasma chamber whenever conditions are detected in said plasma chamber that could result in an arc discharge.