Exposure control apparatus and method
First Claim
1. A scanning exposure method comprising:
- moving each of a mask and a substrate independently to move the mask and the substrate synchronously;
emitting a plurality of light pulses during the synchronous movement of the mask and the substrate;
irradiating, during said synchronous movement, each of a plurality of regions on the substrate with at least one of the plurality of light pulses, wherein the plurality of regions are within an irradiation area of the light pulses, and integrated light quantities provided on said plurality of regions vary among said plurality of regions and wherein integrated numbers of pulses provided on the plurality of regions vary among the plurality of regions; and
adjusting, during synchronous movement, intensity of a next light pulse to be irradiated on the substrate, based on a light quantity of at least one of said plurality of light pulses.
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Abstract
An apparatus has a pulse light source for emitting light pulses with varying light quantities, an illumination optical system for radiating the light pulses from the source onto a predetermined illumination region on a mask on which a transfer pattern is formed, and a projection optical system for projecting an image of the pattern onto a predetermined exposure region on a substrate, and which synchronously scans the mask and the substrate during the projection. The apparatus includes a measuring device for detecting intensities of the light pulses radiated onto the substrate during the scanning and measuring an integrated light quantity on each of a plurality of partial regions in the exposure region on the substrate on the basis of a detection signal of the intensities, wherein the partial regions are defined by a scanning speed of the photosensitive substrate and an oscillation interval of the light pulses. The apparatus further includes an adjusting device for adjusting an intensity of the next light pulse to be radiated onto the mask on the basis of a difference between a target integrated light quantity and the measured integrated light quantity on each of the partial regions when some light pulses are radiated onto the mask.
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Citations
28 Claims
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1. A scanning exposure method comprising:
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moving each of a mask and a substrate independently to move the mask and the substrate synchronously;
emitting a plurality of light pulses during the synchronous movement of the mask and the substrate;
irradiating, during said synchronous movement, each of a plurality of regions on the substrate with at least one of the plurality of light pulses, wherein the plurality of regions are within an irradiation area of the light pulses, and integrated light quantities provided on said plurality of regions vary among said plurality of regions and wherein integrated numbers of pulses provided on the plurality of regions vary among the plurality of regions; and
adjusting, during synchronous movement, intensity of a next light pulse to be irradiated on the substrate, based on a light quantity of at least one of said plurality of light pulses. - View Dependent Claims (2, 3)
detecting each of the light quantities of the plurality of light pulses emitted during said synchronous movement;
calculating the integrated light quantities based on the detected light quantities; and
adjusting the intensity of the next light pulse based on the calculated integrated light quantities.
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3. A method according to claim 1, wherein the substrate is moved in a scanning direction during the synchronous movement and the plurality of regions are along the scanning direction within said irradiation area.
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4. A scanning exposure method in which a pattern of a mask is transferred onto a substrate by moving the mask and the substrate synchronously, the method comprising:
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determining a number N (N being an integer) of a plurality of light pulses for providing an appropriate exposure dose for each point on said substrate;
determining, based on the determined number N, at least one of a moving speed of said substrate, an oscillation frequency of the light pulses, and a width, in the substrate movement direction, of the light pulses incident on the substrate, wherein there are the number N of partial regions along the substrate movement direction within an irradiation area of the light pulses and wherein exposure doses provided on said partial regions vary among said partial regions during the synchronous movement and wherein integrated numbers of pulses provided on the partial regions vary among the partial regions. - View Dependent Claims (5, 6, 7)
detecting a light quantity of each light pulse emitted during the synchronous movement; and
adjusting, during the synchronous movement, an intensity of a next light pulse to be irradiated on the substrate, based on the detected light quantity of at least one of the emitted light pulses.
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6. A scanning exposure method according to claim 4, further comprising:
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detecting a light quantity of each light pulse emitted during said synchronous movement;
calculating exposure doses of the plurality of said partial regions during said synchronous movement based on the detected light quantity; and
adjusting an intensity of a next light pulse to be irradiated on the substrate, based on the calculated exposure doses.
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7. A scanning exposure method according to claim 4, wherein said number N is determined by taking into account at least one of variation of energy among the light pulses and smoothing of an interference pattern generated on said substrate.
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8. A scanning exposure method in which a pattern of a mask is transferred onto a substrate while moving the mask and the substrate synchronously, the method comprising:
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moving each of a mask and a substrate independently to move the mask and the substrate synchronously;
emitting a plurality of light pulses during the synchronous movement of the mask and the substrate;
irradiating each of a plurality of partial regions which are within an irradiation area of the light pulses on the substrate with at least one of the plurality of light pulses during said synchronous movement, wherein integrated light quantities provided on said plurality of partial regions vary among said plurality of partial regions and wherein integrated numbers of pulses provided on the plurality of partial regions vary among the plurality of partial regions; and
detecting, during said synchronous movement, a light quantity of at least one of said plurality of light pulses to control a subsequent scanning exposure operation. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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21. A scanning exposure method in which a pattern is formed on an object by moving the object relative to light pulses in a predetermined direction, the method comprising:
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emitting the light pulses at a predetermined maximum oscillation frequency, and adjusting moving speed of the object to provide an appropriate scanning exposure for the object with the light pulses emitted at the predetermined maximum oscillation frequency. - View Dependent Claims (22, 23, 24, 25, 26, 27, 28)
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Specification