Modifying a design layer of an integrated circuit using overlying and underlying design layers
First Claim
1. A computer-implemented method for performing a proximity correction on an integrated circuit layout design, comprising:
- generating an original layout design comprising a plurality of design layers representing respective levels of an integrated circuit;
determining targeted properties of first features in one design layer, wherein the targeted properties depend upon an arrangement of second features in other design layers relative to the first features;
separating the first features of the first design layer into different working layers, wherein each working layer comprises the first features that share a mutual targeted property; and
separately altering the first features in said each working layer based upon the mutual targeted property of that working layer.
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Accused Products
Abstract
A computer-implemented method is provided in which a design layer of an integrated circuit is altered by spatial definition using underlying and overlying design layers. That is, the specific layers of an integrated circuit that impact the layer being modified are taken into account. According to an embodiment, the computer-implemented method is performed using, e.g., a CAD program. First, an original layout design comprising a plurality of design layers representing respective levels of an integrated circuit is generated. The targeted properties, e.g., electrical properties, of features in one design layer are determined based upon the arrangement of features in other design layers relative to the features in that one design layer. The features in the design layer being modified are then separated into different working layers such that each working layer includes features having at least one common targeted property. The features in each working layer may then be separately modified based upon the mutual targeted property of that working layer.
83 Citations
18 Claims
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1. A computer-implemented method for performing a proximity correction on an integrated circuit layout design, comprising:
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generating an original layout design comprising a plurality of design layers representing respective levels of an integrated circuit;
determining targeted properties of first features in one design layer, wherein the targeted properties depend upon an arrangement of second features in other design layers relative to the first features;
separating the first features of the first design layer into different working layers, wherein each working layer comprises the first features that share a mutual targeted property; and
separately altering the first features in said each working layer based upon the mutual targeted property of that working layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A computer-implemented method for performing a proximity correction on an integrated circuit layout design, comprising:
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generating an original layout design comprising a plurality of design layers representing respective levels of an integrated circuit;
determining a targeted electrical property of a first feature in one design layer, wherein the targeted electrical property depends upon a position of the first feature relative to a second feature in another design layer;
attributing the first feature to a working layer comprising other features having the same targeted electrical property as the first feature; and
altering the first feature and the other features in the working layer based upon the targeted electrical property. - View Dependent Claims (14, 15, 16, 17, 18)
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Specification