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Contoured platen design for plasma immerson ion implantation

  • US 6,228,176 B1
  • Filed: 06/03/1998
  • Issued: 05/08/2001
  • Est. Priority Date: 02/11/1998
  • Status: Active Grant
First Claim
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1. A plasma treatment system for implantation, said system comprising:

  • a vacuum chamber in which a plasma is generated in said chamber; and

    p1 susceptor having a susceptor face disposed in said chamber to support a substrate comprising a substrate face, said susceptor face being substantially a same surface size as said substrate face, whereupon said susceptor face being substantially covered by said substrate face to thereby reduce exposed regions of said susceptor face, said susceptor comprising a material selected from stainless steel or aluminum, and said susceptor is coated with a silicon bearing material, said silicon bearing material being selected from amorphous silicon, polysilicon, or crystalline silicon.

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