Methods and apparatus for determining an etch endpoint in a plasma processing system

• US 6,228,278 B1
• Filed: 09/30/1998
• Issued: 05/08/2001
• Est. Priority Date: 09/30/1998
• Status: Expired due to Term

• Current Assignee: Lam Research Corporation
• Original Assignee: Lam Research Corporation
• Inventors: Hudson, Eric A., Winniczek, Jaroslaw W., Wiepking, Mark, Dassapa, M. J. Francois Chandrasekar
• Primary Examiner(s): Gulakowski, Randy
• Assistant Examiner(s): Ahmed, Shamim
• Application Number:
  US09/164,389
• Time in Patent Office: 951 Days
• Field of Search: 156/345, 156/627, 156/643, 156/626, 216/59, 216/61, 438/14, 438/17
• US Class Current: 216/61
• CPC Class Codes: H01J 37/32935 Monitoring and controlling tubes by information coming from the object and/or discharge
• CPC Class Codes: H01J 37/32963 End-point detection
• CPC Class Codes: H01L 22/26 Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement endpoint detection arrangements in CMP apparatus B24B37/013, in discharge apparatus H01J37/32

Abstract

Methods and apparatus for ascertaining the end of an etch process while etching through a target layer on a substrate in a plasma processing system which employs an electrostatic chuck. The end of the etch process is ascertained by monitoring the electric potential of the substrate to detect a pattern indicative of the end of the etch process. By the way of example, changes to this potential may be observed by monitoring the current flowing to the pole of the electrostatic chuck. Upon ascertaining the pattern indicative of the end of the etch process, for example by monitoring the current signal, a control signal is produced to terminate the etch. If a bias compensation power supply is provided to keep the currents flowing to the poles of the electrostatic chuck substantially equal but opposite in sign throughout the etch, the compensation voltage output by the bias compensation power supply may be monitored for the aforementioned pattern indicative of the end of the etch process in order to terminate the etch.

Claims

1. A method for ascertaining an end of an etch process while etching through a target layer on a substrate in a plasma processing system, said plasma processing system including an electrostatic chuck having a first pole, a first DC power supply coupled to said first pole for supplying a chucking voltage to said first pole, a first current monitoring circuit coupled between said first pole and said first DC power supply for monitoring a first current supplied to said first pole, said first current monitoring circuit outputting a first signal indicative of said first current, and a variable DC power supply configured to output a compensation voltage for biasing said first DC power supply responsive to said first signal, thereby causing said chucking voltage to vary responsive to said compensation voltage, said method comprising:

coupling an endpoint monitoring circuit to said variable DC power supply, said endpoint monitoring circuit having an endpoint monitoring input and an endpoint monitoring output;

receiving at said endpoint monitoring input said compensation voltage;

analyzing, using said endpoint monitoring circuit, said compensation voltage for a pattern characteristic of said end of said etch process; and

outputting at said endpoint monitoring output an endpoint signal indicative of said end of said etch process upon ascertaining said pattern in said compensation voltage.

2. The method of claim 1 wherein said electrostatic chuck includes a second pole coupled to said first DC power supply, said plasma processing system includes a second current monitoring circuit coupled between said second pole and said first DC power supply for monitoring a second current supplied to said second pole, wherein said compensation voltage output by said variable DC power supply is responsive to both said first signal and a second signal output by said second current monitoring circuit, said second signal being indicative of said second current.

3. The method of claim 2 wherein said plasma processing system includes a differential amplifier arrangement coupled to said first current monitoring circuit and said second current monitoring circuit, said differential amplifier arrangement receives said first signal and said second signal as input and outputs a control signal to said variable DC supply to cause said compensation voltage output by said variable DC power supply to vary responsive to both said first signal and said second signal.

4. The method of claim 2 wherein said first signal and said second signal is employed by said variable DC power supply to maintain said first current and said second current substantially constant during said etch process.

5. The method of claim 2 wherein said endpoint monitoring circuit includes a general purpose microcomputer.

6. The method of claim 2 wherein said electrostatic chuck represents a Johnsen-Rahbek chuck.

7. The method of claim 2 wherein said substrate includes a conductive layer underlying said target layer.

8. The method of claim 2 wherein said substrate includes a dielectric layer underlying said target layer.

9. The method of claim 2 wherein said target layer represents a silicon dioxide-containing layer, said substrate further includes a dielectric layer underlying said target layer.

10. The method of claim 2 wherein said target layer represents a low dielectric constant layer, said substrate further includes a dielectric layer underlying said target layer.