Flexographic element having an infrared ablatable layer

• US 6,238,837 B1
• Filed: 05/01/1995
• Issued: 05/29/2001
• Est. Priority Date: 05/01/1995
• Status: Expired due to Term

• Current Assignee: E. I. du Pont de Nemours and Company (Corteva, Inc.)
• Original Assignee: E. I. du Pont de Nemours and Company (Corteva, Inc.)
• Inventors: Fan, Roxy Ni
• Primary Examiner(s): Weiner, Laura
• Application Number:
  US08/432,450
• Time in Patent Office: 2,220 Days
• Field of Search: 430/273.1, 430/306, 430/271.1, 430/944, 430/945
• US Class Current: 430/273.1
• CPC Class Codes: G03F 7/202 Masking pattern being obtained by thermal means, e.g. laser ablation
• CPC Class Codes: Y10S 430/145 Infrared
• CPC Class Codes: Y10S 430/146 Laser beam

Abstract

A photosensitive element for use as a photopolymer printing plate comprising a support, a layer of a photopolymerizable material on the support, and an infrared ablation layer which is ablatable by infrared radiation and substantially opaque to actinic radiation on the photopolymerizable material. The infrared ablation layer comprises at least one infrared absorbing material, a radiation opaque material, and at least one binder which is substantially incompatible with low molecular weight materials in the photopolymerizable layer. The infrared ablation layer is tack-free or substantially tack-free on the photopolymerizable layer. The infrared ablation layer is ablatable from the surface of the photopolymerizable layer upon exposure to infrared laser radiation.

Claims

1. A photosensitive element for use as a photopolymer printing plate, comprising:

(a) a support;

(b) at least one layer of a photopolymerizable material on the support, the photopolymerizable material comprising at least one elastomeric binder, at least one monomer, at least one initiator having sensitivity to non-infrared actinic radiation, and optionally at least one plasticizer, wherein at least one of the monomer and the optional plasticizer is a low molecular weight material having a weight average molecular weight of 30,000 or less; and

(c) at least one infrared ablation layer which is ablatable by infrared radiation and opaque to non-infrared actinic radiation and wherein the infrared ablation layer is in direct contact with the at least one photopolymerizable layer (b), and has a surface opposite the photopolymerizable layer (b) capable of being exposed to laser oblation, the infrared ablation layer comprising;

(i) at least one infrared absorbing material;

(ii) a radiation opaque material, wherein (i) and (ii) can be the same or different; and

(iii) at least one binder which is incompatible or substantially incompatible with at least one of the low molecular weight materials of layer (b);

wherein the infrared ablation layer is tack-free or substantially tack-free such that the surface of the infrared sensitive layer adjacent to the photopolymerizable layer is tack-free or only slightly tacky, sticky or oily to the touch and is ablatable from the surface of the photopolymerizable layer upon exposure to infrared laser radiation.

2. The element of claim 1, wherein the at least one binder (iii) is selected from the group consisting of polyamides, polyvinyl alcohol, amphoteric interpolymers, alkylcellulose, hydroxyalkyl cellulose, nitrocellulose, copolymers of ethylene and vinyl acetate, cellulose acetate butyrate, polybutyrals, cyclic rubbers, and combinations thereof.

3. The element of claim 1, wherein the at least one binder (iii) is tack-free or substantially tack-free.

4. The element of claim 1, wherein the infrared ablation layer further comprises a secondary binder selected from the group consisting of copolymers of styrene and acrylic acid, copolymers of polyvinylpyrollidone and vinyl acetate, and polyvinylpyrollidone.

5. The element of claim 1, wherein the infrared absorbing material or the radiation opaque material or both the radiation opaque material and the radiation opaque material are non-migratory.

6. The element of claim 1, wherein the infrared absorbing material (i) is the same as the radiation opaque material (ii) and is 10 to 60 % by weight based on the total weight of the infrared ablation layer.

7. The element of claim 6, wherein the infrared absorbing material is selected from the group consisting of carbon black, graphite, and mixtures thereof.

8. The element of claim 7, wherein the binder (iii) is selected from the group consisting of polyamides and a mixture of polyamides and amphoteric interpolymers.

9. The element of claim 1, wherein the at least one plasticizer is present and wherein the binder (iii) is substantially incompatible with the at least one monomer and the at least one plasticizer.

10. The element of claim 1, wherein the low molecular weight is a weight average molecular weight and is less than 5000.

11. A photosensitive element for use as a photopolymer printing plate, comprising:

(a) a support;

(b) at least one layer of a photopolymerizable material on the support, the photopolymerizable material comprising at least one elastomeric binder, at least one monomer, at least one initiator having sensitivity to non-infrared actinic radiation, and optionally at least one plasticizer, wherein at least one of the monomer and the optional plasticizer is a low molecular weight material having a weight average molecular weight of 30,000 or less; and

(c) at least one infrared ablation layer which is ablatable by infrared radiation and opaque to non-infrared actinic radiation on at least one layer of photopolymerizable material (b) such that the infrared ablation layer is in direct contact with the at least one photopolymerizable layer (b), and has a surface opposite the photopolymerizable layer (b) capable of being exposed to laser ablation, the infrared ablation layer comprising;

(i) at least one infrared absorbing material;

(ii) a radiation opaque material, wherein (i) and (ii) can be the same or different; and

(iii) at least one binder which is incompatible with at least one of the low molecular weight materials of layer (b), wherein the infrared ablation layer is tack-free or substantially tack-free when on the photopolymerizable layer; and

(d) a temporary coversheet which must be removed before the photosensitive element is exposed imagewise to infrared radiation wherein the adhesion between the temporary coversheet and layer (c) is so low that layer (c) remains intact upon removal of the temporary coversheet.

12. A photosensitive element according to claim 11 wherein the temporary coversheet comprises a material selected from polyester, polystyrene, polyethylene, polypropylene, polycarbonate, fluoropolymers or polyamide and wherein the temporary coversheet is optionally subbed with a release layer.