Carrier head with pressurizable bladder
First Claim
Patent Images
1. A carrier head, comprising:
- a base;
a flexible membrane extending beneath the base to form a pressurizable chamber, a lower surface of the flexible membrane providing a mounting surface on which a substrate can be positioned;
a support structure positioned in the chamber, a lower surface of the support structure movable to contact an upper surface of the flexible membrane; and
a pressurizable bladder formed between the base and the flexible membrane to control a downward pressure on the support structure, wherein at least one of the bladder and support structure is configured to provide a substantially constant contact area between the support structure and the bladder as a vertical position of the support structure relative to the base changes.
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Accused Products
Abstract
Configurations within the CMP carrier head to maintain a constant contact area through which a downward pressure can be applied and distributed to the substrate for ensuring the force pressing the substrate against the pad will remain steady for each application of pressure, and for repeated application of pressure over time.
78 Citations
27 Claims
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1. A carrier head, comprising:
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a base;
a flexible membrane extending beneath the base to form a pressurizable chamber, a lower surface of the flexible membrane providing a mounting surface on which a substrate can be positioned;
a support structure positioned in the chamber, a lower surface of the support structure movable to contact an upper surface of the flexible membrane; and
a pressurizable bladder formed between the base and the flexible membrane to control a downward pressure on the support structure, wherein at least one of the bladder and support structure is configured to provide a substantially constant contact area between the support structure and the bladder as a vertical position of the support structure relative to the base changes. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A carrier head for a chemical mechanical polishing apparatus, comprising:
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a base;
a first pressurizable chamber located below the base, the first pressurizable chamber having a first chamber wall formed of a flexible membrane with a lower surface that provides a mounting surface for a substrate;
a support structure located in the first pressurizable chamber to contact an upper surface of the flexible membrane; and
a second pressurizable chamber to apply a downward pressure to the support structure, the second pressurizable chamber having a second chamber wall configured to contact the support structure over a constant contact area as a vertical position of the support structure relative to the base changes. - View Dependent Claims (18, 19, 20, 21, 22)
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23. A carrier head for a chemical mechanical polishing apparatus, comprising:
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a base;
a retaining ring coupled to the base;
a flexible membrane extending beneath the base to form a pressurizable chamber, a lower surface of the flexible membrane providing a mounting surface on which a substrate can be positioned;
a support structure positioned in the chamber, a lower surface of the support structure movable to contact an upper surface of the flexible membrane; and
means for applying a substantially constant downward pressure to an upper surface of the support structure as the retaining ring wears and a vertical position of the support structure relative to the base changes. - View Dependent Claims (24, 25, 26, 27)
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Specification