Fractal filter applied to a contamination-free manufacturing signal to improve signal-to-noise ratios

• US 6,242,273 B1
• Filed: 09/29/1999
• Issued: 06/05/2001
• Est. Priority Date: 09/29/1999
• Status: Expired due to Term

• Current Assignee: Advanced Micro Devices, Inc.
• Original Assignee: Advanced Micro Devices, Inc.
• Inventors: Goodwin, Thomas J., Emami, Iraj, May, Charles E.
• Primary Examiner(s): Niebling, John F.
• Assistant Examiner(s): LUK, OLIVIA T
• Application Number:
  US09/408,232
• Time in Patent Office: 615 Days
• Field of Search: 438/14, 382/145, 382/225, 250/214, 364/468
• US Class Current: 438/14
• CPC Class Codes: H01L 22/20 Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
• CPC Class Codes: H01L 22/26 Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement endpoint detection arrangements in CMP apparatus B24B37/013, in discharge apparatus H01J37/32

Abstract

A method is provided for manufacturing, the method including processing a workpiece in a processing step and detecting defect data after the processing of the workpiece in the processing step has begun. The method also includes filtering the defect data using a fractal filter and forming an output signal corresponding to at least one type of defect based on the fractally filtered defect data. The method further includes feeding back a control signal based on the output signal to adjust the processing performed in the processing step to reduce the at least one type of defect.

Claims

1. A method of manufacturing, the method comprising:

processing a workpiece in a processing step;

detecting defect data after the processing of the workpiece in the processing step has begun;

filtering the defect data using a fractal filter;

forming an output signal corresponding to at least one type of defect based on the fractally filtered defect data; and

feeding back a control signal based on the output signal to adjust the processing performed in the processing step to reduce the at least one type of defect.

2. The method of claim 1, wherein the filtering uses a Hoshen-Kopelman method.

3. The method of claim 1, wherein the filtering uses a Ziff method.

4. The method of claim 1, wherein the formation of the output signal includes counting the number of the at least one type of defect and the feeding back of the control signal based on the output signal includes feeding back the control signal when the number of the at least one type of defect is at least about a predetermined value.

5. The method of claim 1, wherein the formation of the output signal includes determining a surface density of the at least one type of defect as a function of time and the feeding back of the control signal based on the output signal includes feeding back the control signal when the surface density of the at least one type of defect is at least about a predetermined value.

6. The method of claim 1, wherein the formation of the output signal includes counting the number of the at least one type of defect and determining a surface density of the at least one type of defect as a function of time.

7. The method of claim 6, wherein the feeding back of the control signal based on the output signal includes feeding back the control signal when the number of the at least one type of defect is at least about a first predetermined value.

8. The method of claim 6, wherein the feeding back of the control signal based on the output signal includes feeding back the control signal when the surface density of the at least one type of defect is at least about a second predetermined value.

9. The method of claim 7, wherein the feeding back of the control signal based on the output signal further includes feeding back the control signal when the surface density of the at least one type of defect is at least about a second predetermined value.

10. The method of claim 9, wherein the formation of the output signal includes counting the number of a second type of defect different than the at least one type of defect and determining a surface density of the second type of defect as a function of time and the feeding back of the control signal based on the output signal includes feeding back the control signal when the number of the second type of defect is at least about a third predetermined value and when the surface density of the second type of defect is at least about a fourth predetermined value.

11. A method of manufacturing, the method comprising:

processing a first workpiece in a processing step;

detecting defect data in an inspection step after the processing of the first workpiece in the processing step;

filtering the defect data using a fractal filter using one of a Hoshen-Kopelman method and a Ziff method;

forming an output signal corresponding to at least one type of defect based on the fractally filtered defect data; and

feeding back a control signal based on the output signal to adjust the processing performed in the processing step on a second workpiece to reduce the at least one type of defect.

12. The method of claim 11, wherein the formation of the output signal includes counting the number of the at least one type of defect and determining a surface density of the at least one type of defect as a function of time.

13. The method of claim 12, wherein the feeding back of the control signal based on the output signal includes feeding back the control signal when the number of the at least one type of defect is at least about a first predetermined value.

14. The method of claim 13, wherein the feeding back of the control signal based on the output signal further includes feeding back the control signal when the surface density of the at least one type of defect is at least about a second predetermined value.

15. The method of claim 14, wherein the formation of the output signal includes counting the number of a second type of defect different than the at least one type of defect and determining a surface density of the second type of defect as a function of time and the feeding back of the control signal based on the output signal includes feeding back the control signal when the number of the second type of defect is at least about a third predetermined value and when the surface density of the second type of defect is at least about a fourth predetermined value.

16. A method of manufacturing, the method comprising:

processing a workpiece in a processing step;

detecting defect data using an in situ sensor after the processing of the workpiece in the processing step has begun;

filtering the defect data using a fractal filter using one of a Hoshen-Kopelman method and a Ziff method;

forming an output signal corresponding to at least one type of defect based on the fractally filtered defect data; and

feeding back a control signal based on the output signal to adjust the processing performed on the workpiece in the processing step to reduce the at least one type of defect.

17. The method of claim 16, wherein the formation of the output signal includes counting the number of the at least one type of defect and determining a surface density of the at least one type of defect as a function of time.

18. The method of claim 17, wherein the feeding back of the control signal based on the output signal includes feeding back the control signal when the number of the at least one type of defect is at least about a first predetermined value.

19. The method of claim 18, wherein the feeding back of the control signal based on the output signal further includes feeding back the control signal when the surface density of the at least one type of defect is at least about a second predetermined value.

20. The method of claim 19, wherein the formation of the output signal includes counting the number of a second type of defect different than the at least one type of defect and determining a surface density of the second type of defect as a function of time and the feeding back of the control signal based on the output signal includes feeding back the control signal when the number of the second type of defect is at least about a third predetermined value and when the surface density of the second type of defect is at least about a fourth predetermined value.