Strength coil for ionized copper plasma deposition

• US 6,244,210 B1
• Filed: 10/29/1999
• Issued: 06/12/2001
• Est. Priority Date: 10/29/1999
• Status: Expired due to Fees

• Current Assignee: Advanced Micro Devices, Inc.
• Original Assignee: Advanced Micro Devices, Inc.
• Inventors: Besser, Paul R., Iacoponi, John A.
• Primary Examiner(s): Mills, Gregory
• Assistant Examiner(s): ALEJANDRO MULERO, LUZ L
• Application Number:
  US09/430,452
• Time in Patent Office: 592 Days
• Field of Search: 118/723.I, 118/723.IR, 118/723.AN, 156/345, 204/298.06, 204/298.34, 315/111.51, 343/700.R, 343/731, 343/732, 343/741
• US Class Current: 118/723.00I
• CPC Class Codes: C23C 14/358 Inductive energy
• CPC Class Codes: H01J 37/321 the radio frequency energy being inductively coupled to the plasma

Abstract

A new type of plasma coil for use in ionized metal plasma deposition systems. This new coil provides significant added strength to prevent sagging or other mechanical deformation. The improved coil consists of a core of a high strength material such as Titanium, for example. The rigid core is surrounded on all sides by a layer of pure copper. The rigid core could be made of other refractory metals. A Titanium copper alloy core could be used and would bind the Titanium to the copper within the core to prevent it from diffusing or reacting with the pure copper outer layer.

Claims

1. A coil for use in an ion metal plasma physical vapor deposition chamber, said coil being made of a metallic strip formed into a one-turn loop, said metallic strip comprising a rigid core bonded to an outer layer of copper.

2. A coil as defined in claim 1 in which said rigid core is made of Titanium.

3. A coil as defined in claim 1 in which said rigid core is made of Tantalum.

4. A coil as defined in claim 1 in which said rigid core is made of Tungsten.

5. A coil as defined in claim 1 in which said rigid core is made of Aluminum.

6. A coil as defined in claim 1 in which said rigid core is made of Aluminum alloy.

7. A coil as defined in claim 1 in which said rigid core is made of stainless steel.

8. A coil as defined in claim 1 in which said rigid core is made of an iron alloy.

9. A coil as defined in claim 1 in which said rigid core is made of a nickel based alloy.

10. A coil as defined in claim 1 in which said rigid core is made of Titanium and Tantalum.

11. A coil as defined in claim 1 in which said rigid core is made of Titanium and Tungsten.

12. A coil as defined in claim 1 in which said rigid core is made of Titanium and copper.

13. A coil as defined in claim 1 in which said rigid core is bonded to said outer layer of copper by a diffusion bonding process in which the rigid core and the outer layer are pressed together at high pressure and ultrasonic energy is applied thereto.

14. A coil as defined in claim 1 in which said coil is made of a metallic strip approximately 30″

×

1.5″

×

0.25″

, formed into a loop.

15. A machine for applying copper deposition to a semiconductor substrate, said machine comprising:

a) a deposition chamber; and

b) a coil disposed in said chamber, said coil said coil being made of a metallic strip formed into a one-turn loop, said metallic strip comprising a rigid core bonded to an outer layer of copper.

16. A coil for use in an ion metal plasma physical vapor deposition chamber, said coil being made of a metallic strip approximately 30″

×

1.5″

×

0.25″

, said metallic strip being formed into a one-turn loop, said metallic strip comprising a rigid core surrounded by an outer layer of copper, said rigid core being made, at least in part, of a material selected from one of the following refractory metals;

Titanium, Tantalum or Tungsten, said rigid core being bonded to said outer layer of copper by a diffusion bonding process in which the rigid core and the outer layer are pressed together at high pressure and ultrasonic energy is applied thereto.