Method and apparatus for vaporizing liquid precursors and system for using same

• US 6,244,575 B1
• Filed: 10/02/1996
• Issued: 06/12/2001
• Est. Priority Date: 10/02/1996
• Status: Expired due to Term

• Current Assignee: Micron Technology, Inc.
• Original Assignee: Micron Technology, Inc.
• Inventors: Vaartstra, Brian A., Atwell, David
• Primary Examiner(s): BUEKER, RICHARD R
• Application Number:
  US08/720,710
• Time in Patent Office: 1,714 Days
• Field of Search: 118/726, 118/708, 118/712, 261/141, 261/142, 261/115, 392/396, 392/397, 392/398, 392/399
• US Class Current: 261/141
• CPC Class Codes: C23C 16/4486 by producing an aerosol and subsequent evaporation of the droplets or particles

Abstract

A vaporizing apparatus for providing a vaporized liquid precursor to a process chamber in a vapor deposition process includes a microdroplet forming device for generating microdroplets from a liquid precursor and a heated housing defining a vaporization zone having a vapor flow path from the microdroplet forming device to the process chamber. The vaporization zone receives the microdroplets and a heated carrier gas. The heated carrier gas has a temperature so as to provide the primary source of heat for vaporizing the microdroplets. A method of vaporizing liquids for vapor deposition processes includes generating microdroplets and utilizing a heated carrier gas as the primary source of heat for vaporizing the microdroplets. A vapor deposition system carrying out the method includes a heated carrier gas and a heated housing defining a heated vaporization zone. The heated housing receives the heated carrier gas. An atomizer for generating microdroplets from a liquid source dispenses the microdroplets in the heated vaporization zone. The heated carrier gas has a temperature so as to provide the primary source of heat for vaporizing the microdroplets in the vaporization zone. The vaporized liquid precursor is then directed to the process chamber from the heated vaporization zone.

Claims

1. A vaporizing apparatus for providing a vaporized liquid precursor to a process chamber in a vapor deposition process, the apparatus comprising:

a microdroplet forming device configured to generate microdroplets from a liquid precursor;

a heated housing defining a vaporization zone having a vapor flow path from the microdroplet forming device to the process chamber, the vaporization zone for receiving the microdroplets and a heated carrier gas, the heated carrier gas for vaporizing at least a portion of the microdroplets;

a detection device for detecting the concentration of unvaporized microdroplets and generating a signal representative thereof; and

a controller responsive to the signal representative of the detected concentration for initiating modification of a parameter of the vaporizing apparatus.

2. The apparatus according to claim 1, wherein the heated carrier gas is an inert gas with high thermal conductivity.

3. The apparatus according to claim 2, wherein the heated carrier gas is helium.

4. The apparatus according to claim 1, wherein the microdroplet forming device includes a dispensing device sealingly positioned in the vaporization zone to dispense the microdroplets into the vaporization zone, the heated housing having a carrier gas port for receiving the heated carrier gas to vaporize the microdroplets in the vaporization zone, and further wherein the heated housing includes a directing device to direct the vaporized microdroplets into the process chamber.

5. The apparatus according to claim 4, wherein the apparatus further includes:

a gas flow controller for controlling a flow rate of the heated carrier gas to the vaporization zone, the heated carrier gas being provided to the vaporization zone through a heated gas line connected to the heated carrier gas port; and

a liquid flow controller for providing the liquid to the microdroplet forming device at a desired flow rate.

6. The apparatus according to claim 4, wherein the dispensing device includes an opening for dispensing the microdroplets, the opening being positioned in close proximity to the carrier gas port.

7. The apparatus according to claim 1, wherein the microdroplets formed include droplets having a diameter of less than 1000 micrometers.

8. The apparatus according to claim 1, wherein the microdroplet forming device preheats the liquid precursor prior to generating microdroplets to be introduced into the vaporization zone.

9. The apparatus according to claim 1, wherein the heated vaporization zone is physically separate from the process chamber.

10. The apparatus according to claim 9, wherein the heated vaporization zone is located at least in part within the process chamber but is physically separate therefrom.

11. The apparatus according to claim 1, wherein the heated housing includes at least one wall, the at least one wall being heated by at least one heating element to maintain a substantially constant temperature along the vapor flow path.

12. The apparatus according to claim 11, wherein the apparatus includes at least one monitor for detecting the temperature along the vapor flow path, the at least one heating element changing the temperature of the vapor flow path in response to the detected temperature.

13. The apparatus according to claim 1, wherein the microdroplet forming device includes one of an electrostatic sprayer and an ultrasonic nebulizer.

14. The apparatus according to claim 1, wherein the apparatus further comprises a detector for detecting undesired particulates in the vapor flow path.

15. The apparatus according to claim 1, wherein the apparatus further includes means for modifying a length of the vapor flow path in response to the signal from the controller.

16. The apparatus according to claim 15, wherein the modifying means includes means for repositioning an opening of the microdroplet forming device within the vaporization zone.

17. The apparatus according to claim 15, wherein the modifying means includes means for modifying a length of the heated housing.

18. The apparatus according to claim 1, wherein the apparatus further includes means for changing the temperature along the vapor flow path in response to a signal from the controller.

19. A method of vaporizing liquid precursors for vapor deposition processes, the method comprising the steps of:

generating microdroplets;

vaporizing at least a portion of the microdroplets using a heated carrier gas;

detecting a concentration of unvaporized microdroplets; and

controlling the vaporization step as a function of the detected concentration.

20. The method according to claim 19, wherein the heated carrier gas is an inert gas with high thermal conductivity.

21. The method according to claim 20, wherein the heated carrier gas is helium.

22. The method according claim 19, wherein the generating step includes generating microdroplets electrostatically.

23. The method according to claim 19, wherein the generating step includes generating the microdroplets ultrasonically.

24. The method according to claim 19, wherein the generating step includes generating the microdroplets having a diameter less than about 1000 micrometers.

25. The method according to claim 19, wherein the generating step includes dispensing the microdroplets in a heated vaporization zone;

and further wherein the vaporization step includes mixing the heated carrier gas with the microdroplets in the heated vaporization zone.

26. The method according to claim 25, wherein the vaporization step further includes the step of providing the heated carrier gas to the vaporization zone at a flow rate to substantially prevent decomposition of the microdroplets at heated walls defining the vaporization zone.

27. The method according to claim 19, wherein the vaporization step includes maintaining a substantially constant temperature of the mixture of the heated carrier gas and the microdroplets throughout the vaporization zone.

28. The method according to claim 25, further including the step of directing the mixture of the heated carrier gas and vaporized microdroplets in the vaporization zone to one or more process chambers having a deposition surface positioned therein.

29. The method according to claim 19, wherein the generating step includes preheating liquid precursor prior to generating the microdroplets using such preheated liquid precursor.

30. The method according to claim 19, wherein the vaporization step is performed in a heated vaporization zone, and further wherein the controlling step includes controlling the temperature of the heated vaporization zone.

31. The method according to claim 19, wherein the controlling step includes controlling the temperature of the heated carrier gas.

32. The method according to claim 19, wherein the vaporization step is performed in a heated vaporization zone, and further wherein the controlling step includes controlling a time period the microdroplets are in the heated vaporization zone.

33. The method according to claim 32, wherein the time period controlling step includes changing a size of the vaporization zone.

34. The method according to claim 32, wherein the time period controlling step includes changing a position in the vaporization zone at which the microdroplets are introduced therein.

35. The method according to claim 19, wherein the method further comprises the step of detecting undesired particulates in the vaporized liquid.

36. A method of controlling the vaporization of liquid precursors for vapor deposition processes, the method comprising the steps of:

using a heated carrier gas to vaporize microdroplets;

detecting the concentration of unvaporized microdroplets; and

controlling the use of the heated carrier gas to vaporize the microdroplets as a function of the detected concentration.

37. The method according to claim 36, wherein the vaporization of microdroplets by using the heated carrier gas is performed in a heated vaporization zone, and further wherein the controlling step includes controlling the temperature of the heated vaporization zone.

38. The method according to claim 36, wherein the controlling step includes controlling the temperature of the heated carrier gas.

39. The method according to claim 36, wherein the vaporization of microdroplets by using the heated carrier gas is performed in a heated vaporization zone, and further wherein the controlling step includes controlling a time period the microdroplets are in the heated vaporization zone.

40. The method according to claim 39, wherein the time period controlling step includes changing a size of the vaporization zone.

41. The method according to claim 39, wherein the time period controlling step includes changing a position in the vaporization zone at which the microdroplets are introduced therein.

42. The method according to claim 36, wherein the method further comprises the step of detecting undesired particulates in the vaporized liquid.

43. A vaporizing apparatus for providing a vaporized liquid precursor to a process chamber in a vapor deposition process, the apparatus comprising:

a microdroplet forming device configured to generate microdroplets from a liquid precursor;

a heated housing defining a vaporization zone having a vapor flow path from the microdroplet forming device to the process chamber, the vaporization zone for receiving the microdroplets and a carrier gas;

a detection device for detecting a concentration of unvaporized microdroplets and generating a signal representative thereof; and

a controller responsive to the signal representative of the detected concentration for initiating modification of a parameter of the vaporizing apparatus.

44. The apparatus according to claim 43, wherein the carrier gas is a heated carrier gas provided to the vaporization zone.

45. The apparatus according to claim 43, wherein the heated housing includes at least one wall, the at least one wall being heated by at least one heating element to maintain a substantially constant temperature along the vapor flow path.

46. The apparatus according to claim 43, wherein the apparatus includes at least one monitor for detecting the temperature along the vapor flow path, the at least one heating element changing the temperature of the vapor flow path in response to the detected temperature.

47. The apparatus according to claim 43, wherein the microdroplet forming device includes one of an electrostatic sprayer and an ultrasonic nebulizer.

48. The apparatus according to claim 43, wherein the apparatus further includes means for modifying a length of the vapor flow path in response to the signal from the controller.

49. The apparatus according to claim 48, wherein the modifying means includes means for repositioning an opening of the microdroplet forming device within the vaporization zone.

50. The apparatus according to claim 48, wherein the modifying means includes means for modifying a length of the heated housing.

51. The apparatus according to claim 43, wherein the apparatus further includes means for changing the temperature along the vapor flow path in response to the signal from the controller.

52. The apparatus according to claim 43, wherein the apparatus further comprises a detector for detecting undesired particulates in the vapor flow path.

53. A method of vaporizing liquid precursors for vapor deposition processes, the method comprising the steps of:

generating microdroplets;

providing the microdroplets and a carrier gas into a heated housing defining a vaporization zone;

vaporizing at least a portion of the microdroplets;

detecting a concentration of unvaporized microdroplets; and

controlling the vaporization step as a function of the detected concentration.

54. The method according to claim 53, wherein the carrier gas is a heated carrier gas, and further wherein vaporizing the at least a portion of the microdroplets includes vaporizing at least a portion of the microdroplets using the heated carrier gas.

55. The method according to claim 53, wherein the generating step includes generating the microdroplets electrostatically.

56. The method according to claim 53, wherein the generating step includes generating the microdroplets ultrasonically.

57. The method according to claim 53, wherein the vaporization step includes maintaining a substantially constant temperature of the mixture of the carrier gas and the microdroplets throughout the vaporization zone.

58. The method according to claim 53, wherein the vaporization step is performed in a heated vaporization zone, and further wherein the controlling step includes controlling the temperature of the heated vaporization zone.

59. The method according to claim 53, wherein the vaporization step is performed in a heated vaporization zone, and further wherein the controlling step includes controlling a time period the microdroplets are in the heated vaporization zone.

60. The method according to claim 59, wherein the time period controlling step includes changing a size of the vaporization zone.

61. The method according to claim 59, wherein the time period controlling step includes changing a position in the vaporization zone at which the microdroplets are introduced therein.

62. The method according to claim 53, wherein the method further comprises the step of detecting undesired particulates in the vaporized liquid.