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Gas distribution apparatus for semiconductor processing

  • US 6,245,192 B1
  • Filed: 06/30/1999
  • Issued: 06/12/2001
  • Est. Priority Date: 06/30/1999
  • Status: Expired due to Term
First Claim
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1. A gas distribution system useful for a reaction chamber used in semiconductor substrate processing, comprising:

  • a support member having a recess in a lower surface thereof, the support member having a first gas supply opening into a central area of the recess and a second gas supply opening into a peripheral area of the recess;

    a baffle arrangement located in the recess, the baffle arrangement including first and second openings arranged such that gas from the first gas supply passes through the first openings without passing through the second openings in the baffle arrangement and gas from the second gas supply passes through the second openings without passing through the first openings in the baffle arrangement; and

    a showerhead supported by the support member such that the gas passing through the first and second openings mixes together and passes through a third set of openings in the showerhead.

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