Method of depositing a silicon oxide coating on glass and the coated glass
First Claim
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1. A method of depositing a silicon oxide coating on hot glass at a temperature of below 600°
- C. comprising;
providing a hot glass, forming a gaseous mixture comprising oxygen enriched with ozone and a source of silicon selected from the group consisting of tetraethoxysilane and octamethylcyclotetrasiloxane, and contacting the hot glass with the gaseous mixture, thereby depositing a silicon oxide coating on the hot glass, wherein the deposited silicon oxide coating has a refractive index of 1.5 or less.
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Abstract
A method of depositing a silicon oxide coating on hot glass at a temperature below 600° C. comprising contacting the hot glass with a gaseous mixture of a source of silicon and oxygen enriched with ozone. Preferably, the hot glass in the form of a hot glass ribbon is contacted with the gaseous mixture during the float glass production process downstream of the float bath. Preferred sources of silicon are silanes, alkylsilanes, alkoxysilanes and siloxanes.
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9 Claims
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1. A method of depositing a silicon oxide coating on hot glass at a temperature of below 600°
- C. comprising;
providing a hot glass, forming a gaseous mixture comprising oxygen enriched with ozone and a source of silicon selected from the group consisting of tetraethoxysilane and octamethylcyclotetrasiloxane, and contacting the hot glass with the gaseous mixture, thereby depositing a silicon oxide coating on the hot glass, wherein the deposited silicon oxide coating has a refractive index of 1.5 or less. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
- C. comprising;
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