Method of depositing a silicon oxide coating on glass and the coated glass

• US 6,248,397 B1
• Filed: 11/03/1998
• Issued: 06/19/2001
• Est. Priority Date: 11/04/1997
• Status: Expired due to Term

• Current Assignee: Pilkington PLC Incorporated In England
• Original Assignee: Pilkington PLC
• Inventors: Ye, Liang
• Primary Examiner(s): Beck, Shrive
• Assistant Examiner(s): CHEN, BRET P
• Application Number:
  US09/185,317
• Time in Patent Office: 959 Days
• Field of Search: 427/167, 427/166, 427/165, 427/164, 427/255.18, 427/255.27, 427/255.37, 65/605, 65/608, 65/605.2
• US Class Current: 427/167
• CPC Class Codes: C03C 17/245 by deposition from the vapour phase
• CPC Class Codes: C03C 2217/213 SiO2
• CPC Class Codes: C03C 2218/152 by cvd
• CPC Class Codes: C23C 16/402 Silicon dioxide

Abstract

A method of depositing a silicon oxide coating on hot glass at a temperature below 600° C. comprising contacting the hot glass with a gaseous mixture of a source of silicon and oxygen enriched with ozone. Preferably, the hot glass in the form of a hot glass ribbon is contacted with the gaseous mixture during the float glass production process downstream of the float bath. Preferred sources of silicon are silanes, alkylsilanes, alkoxysilanes and siloxanes.

Claims

1. A method of depositing a silicon oxide coating on hot glass at a temperature of below 600°

C. comprising;

providing a hot glass,

forming a gaseous mixture comprising oxygen enriched with ozone and a source of silicon selected from the group consisting of tetraethoxysilane and octamethylcyclotetrasiloxane, and contacting the hot glass with the gaseous mixture, thereby depositing a silicon oxide coating on the hot glass, wherein the deposited silicon oxide coating has a refractive index of 1.5 or less.

2. A method as claimed in claim 1 wherein the hot glass is at a temperature in the range 200°

C. to less than 600°

C.

3. A method as claimed in claim 1 wherein the hot glass is at a temperature in the range 200°

C. to 575°

C.

4. A method as claimed in claim 1 wherein the hot glass is at a temperature in the range 225°

C. to 500°

C.

5. A method as claimed in claim 1 wherein the hot glass is at a temperature in the range 375°

C. to 525°

C.

6. A method as claimed in claim 1 wherein the source of silicon comprises a mixture of two or more silicon compounds.

7. A method as claimed in claim 1 wherein the oxygen is enriched with 0.5 to 5% by weight of ozone.

8. A method as claimed in claim 1 wherein the molar ratio of ozone to the source of silicon in the gaseous mixture is in the range 0.01:

1 to 0.4;

1.

9. Glass coated with a silicon oxide coating by a method as claimed in claim 1.